Patents by Inventor Yoon-Sik Chung

Yoon-Sik Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer for chemically amplified resist and a resist composition using the same
    Patent number: 6767687
    Abstract: The present invention relates to a polymer for a chemically amplified resist and a resist composition using the same. The present invention provides a polymer represented by the Formula (1) and a chemically resist composition for extreme ultraviolet light comprising the same. The chemically amplified resist composition comprising the polymer represented by the formula (1) of the present invention responds to mono wavelength in a micro-lithography process and can embody a micro-pattern of high resolution on a substrate.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: July 27, 2004
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Deog-Bae Kim, Hyun-Jin Kim, Yong-Joon Choi, Yoon-Sik Chung
  • Chemically amplified resist and a resist composition
    Patent number: 6743881
    Abstract: The present invention relates to a polymer for a chemically amplified resist and a resist composition using the same. The present invention provides a polymer represented by the Formula (1) and a chemically resist composition for deep ultraviolet light comprising the same, The chemically amplified resist composition comprising the polymer represented by the formula (1) of the present invention responds process and can embody a micro-paten of high resolution on a substrate.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: June 1, 2004
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Deog-Bae Kim, Hyeon-Jin Kim, Yong-Joon Choi, Yoon-Sik Chung
  • Chemically amplified resist and a resist composition
    Publication number: 20030181629
    Abstract: The present invention relates to a polymer for a chemically amplified resist and a resist composition using the same. The present invention provides a polymer represented by the Formula (1) and a chemically resist composition for deep ultraviolet light comprising the same. The chemically amplified resist composition comprising the polymer represented by the formula (1) of the present invention responds to mono wavelength in a micro-lithography process and can embody a micro-pattern of high resolution on a substrate.
    Type: Application
    Filed: April 16, 2003
    Publication date: September 25, 2003
    Inventors: Deog- Bae Kim, Hyeon-Jin Kim, Yong-Joon Choi, Yoon-sik Chung