Abstract: A method for manufacturing a micro-nano imprint mould and an imprinting process are described. The method for manufacturing a micro-nano imprint mould includes: providing a mould body including a first surface and a second surface on opposite sides, wherein the mould body includes an imprinting pattern structure set in the first surface, and the imprinting pattern structure includes a plurality of concaves and a plurality of convexes between the concaves; and performing a surface treatment step on the first surface of the mould body to make a first contact angle form between an imprint fluid and the concaves and a second contact angle form between the imprint fluid and the convexes, wherein the first contact angle is different from the second contact angle.

Abstract: A micro-nano imprint mould and an imprinting process are described. The micro-nano imprint mould includes: a porous body including a first surface and a second surface on opposite sides, wherein the porous body includes a plurality of holes, and a fluid can flow between the first surface and the second surface through the holes; and an imprint pattern structure set in the first surface of the porous body, wherein the imprint pattern structure includes a plurality of convexes and a plurality of concaves between the convexes.

Abstract: A pretreatment process of a substrate in a micro/nano imprinting technology is disclosed, comprising deposing the substrate on a holder and performing a plasma treatment or an ion treatment on the substrate. In the plasma treatment of the substrate, a reactive gas is first injected into the chamber to form a plasma, such that the plasma causes a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface. When the ion treatment is performed on the substrate, an ion source is placed into the chamber and ions and neutral atoms generated by the ion source bombard the substrate, causing a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface.

Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.

Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.