Patents by Inventor Yoshiaki Moro

Yoshiaki Moro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7800386
    Abstract: Provided is a method for producing a contact device, including a step of forming a first conductive film; a step of forming a second conductive film containing a metal or an alloy of the metal on the first conductive film; a step of forming a third conductive film on the second conductive film; and a step of forming a surface layer on the third conductive film, the surface layer containing an oxidative product of the metal in the second conductive film, which metal has been diffused to be precipitated out from the surface of the third conductive film and oxidized.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: September 21, 2010
    Assignee: Advantest Corporation
    Inventors: Kiyoto Nakamura, Hiroshi Arikawa, Yoshiaki Moro, Hirokazu Sampei
  • Publication number: 20090184728
    Abstract: Provided is a method for producing a contact device, including a step of forming a first conductive film; a step of forming a second conductive film containing a metal or an alloy of the metal on the first conductive film; a step of forming a third conductive film on the second conductive film; and a step of forming a surface layer on the third conductive film, the surface layer containing an oxidative product of the metal in the second conductive film, which metal has been diffused to be precipitated out from the surface of the third conductive film and oxidized.
    Type: Application
    Filed: July 17, 2008
    Publication date: July 23, 2009
    Applicant: ADVANTEST CORPORATION
    Inventors: Kiyoto Nakamura, Hiroshi Arikawa, Yoshiaki Moro, Hirokazu Sampei
  • Patent number: 7554136
    Abstract: A micro device that is manufactured by semiconductor process and is electrically connected to outside for its operation. The micro device includes a circuit board, an electrode pad being provided on the circuit board, a lead substrate being provided substantially parallel to the circuit board, and a lead of conductive member being electrically connected to the electrode pad by being bent in a direction away from a surface of the lead substrate, one end of the lead being adhered to the lead substrate and the other end being a free end.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: June 30, 2009
    Assignee: Advantest Corporation
    Inventors: Fumikazu Takayanagi, Yoshiaki Moro, Hirokazu Sanpei
  • Publication number: 20080061922
    Abstract: A microswitch that switches a signal path of a high-frequency signal is provided. The microswitch includes a circuit board; a pair of first feedthrough lines spaced from each other on a circuit board that electrically connect the first surface and the second surface of the circuit board, respectively; a pair of first signal lines which are faced to each other with a gap therebetween on a straight line connecting the pair of first feedthrough lines on the first surface of the circuit board and electrically connected to the pair of first feedthrough lines, respectively; and a movable section which can switch between being in contact with and being spaced from the first surface of the circuit board and electrically connects the pair of signal lines with each other when the it is in contact with the first surface of the circuit board.
    Type: Application
    Filed: March 18, 2007
    Publication date: March 13, 2008
    Applicant: ADVANTEST CORPORATION
    Inventors: KIYOTO NAKAMURA, MASAZUMI YASUOKA, HIROKAZU SANPEI, YOSHIAKI MORO
  • Patent number: 7276707
    Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.
    Type: Grant
    Filed: August 4, 2005
    Date of Patent: October 2, 2007
    Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.
    Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
  • Publication number: 20050263713
    Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.
    Type: Application
    Filed: August 4, 2005
    Publication date: December 1, 2005
    Applicants: CANON KABUSHIKI KAISHA, Hitachi, Ltd.
    Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
  • Patent number: 6953938
    Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: October 11, 2005
    Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.
    Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
  • Publication number: 20050218530
    Abstract: A micro device that is manufactured by semiconductor process and is electrically connected to outside for its operation. The micro device includes a circuit board, an electrode pad being provided on the circuit board, a lead substrate being provided substantially parallel to the circuit board, and a lead of conductive member being electrically connected to the electrode pad by being bent in a direction away from a surface of the lead substrate, one end of the lead being adhered to the lead substrate and the other end being a free end.
    Type: Application
    Filed: March 11, 2005
    Publication date: October 6, 2005
    Applicant: Advantest Corporation
    Inventors: Fumikazu Takayanagi, Yoshiaki Moro, Hirokazu Sanpei
  • Publication number: 20050035300
    Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
    Type: Application
    Filed: September 26, 2003
    Publication date: February 17, 2005
    Applicants: Canon Kabushiki Kaisha, Hitachi, Ltd.
    Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
  • Patent number: 6818911
    Abstract: This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.
    Type: Grant
    Filed: April 4, 2003
    Date of Patent: November 16, 2004
    Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.
    Inventors: Kenji Tamamori, Masato Muraki, Yuichi Iwasaki, Yoshinori Nakayama, Kouji Asano, Yoshiaki Moro, Masayoshi Esashi
  • Publication number: 20030218140
    Abstract: This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.
    Type: Application
    Filed: April 4, 2003
    Publication date: November 27, 2003
    Applicants: CANON KABUSHIKI KAISHA, HITACHI, LTD.
    Inventors: Kenji Tamamori, Masato Muraki, Yuichi Iwasaki, Yoshinori Nakayama, Kouji Asano, Yoshiaki Moro, Masayoshi Esashi