Patents by Inventor Yoshiaki Moro
Yoshiaki Moro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7800386Abstract: Provided is a method for producing a contact device, including a step of forming a first conductive film; a step of forming a second conductive film containing a metal or an alloy of the metal on the first conductive film; a step of forming a third conductive film on the second conductive film; and a step of forming a surface layer on the third conductive film, the surface layer containing an oxidative product of the metal in the second conductive film, which metal has been diffused to be precipitated out from the surface of the third conductive film and oxidized.Type: GrantFiled: July 17, 2008Date of Patent: September 21, 2010Assignee: Advantest CorporationInventors: Kiyoto Nakamura, Hiroshi Arikawa, Yoshiaki Moro, Hirokazu Sampei
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Publication number: 20090184728Abstract: Provided is a method for producing a contact device, including a step of forming a first conductive film; a step of forming a second conductive film containing a metal or an alloy of the metal on the first conductive film; a step of forming a third conductive film on the second conductive film; and a step of forming a surface layer on the third conductive film, the surface layer containing an oxidative product of the metal in the second conductive film, which metal has been diffused to be precipitated out from the surface of the third conductive film and oxidized.Type: ApplicationFiled: July 17, 2008Publication date: July 23, 2009Applicant: ADVANTEST CORPORATIONInventors: Kiyoto Nakamura, Hiroshi Arikawa, Yoshiaki Moro, Hirokazu Sampei
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Patent number: 7554136Abstract: A micro device that is manufactured by semiconductor process and is electrically connected to outside for its operation. The micro device includes a circuit board, an electrode pad being provided on the circuit board, a lead substrate being provided substantially parallel to the circuit board, and a lead of conductive member being electrically connected to the electrode pad by being bent in a direction away from a surface of the lead substrate, one end of the lead being adhered to the lead substrate and the other end being a free end.Type: GrantFiled: March 11, 2005Date of Patent: June 30, 2009Assignee: Advantest CorporationInventors: Fumikazu Takayanagi, Yoshiaki Moro, Hirokazu Sanpei
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Publication number: 20080061922Abstract: A microswitch that switches a signal path of a high-frequency signal is provided. The microswitch includes a circuit board; a pair of first feedthrough lines spaced from each other on a circuit board that electrically connect the first surface and the second surface of the circuit board, respectively; a pair of first signal lines which are faced to each other with a gap therebetween on a straight line connecting the pair of first feedthrough lines on the first surface of the circuit board and electrically connected to the pair of first feedthrough lines, respectively; and a movable section which can switch between being in contact with and being spaced from the first surface of the circuit board and electrically connects the pair of signal lines with each other when the it is in contact with the first surface of the circuit board.Type: ApplicationFiled: March 18, 2007Publication date: March 13, 2008Applicant: ADVANTEST CORPORATIONInventors: KIYOTO NAKAMURA, MASAZUMI YASUOKA, HIROKAZU SANPEI, YOSHIAKI MORO
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Patent number: 7276707Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.Type: GrantFiled: August 4, 2005Date of Patent: October 2, 2007Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
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Publication number: 20050263713Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member which are formed by plating. The second conductive member is formed on a surface of the first conductive member and is essentially made of a material that is more difficult to oxidize than the first conductive member.Type: ApplicationFiled: August 4, 2005Publication date: December 1, 2005Applicants: CANON KABUSHIKI KAISHA, Hitachi, Ltd.Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
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Patent number: 6953938Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.Type: GrantFiled: September 26, 2003Date of Patent: October 11, 2005Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
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Publication number: 20050218530Abstract: A micro device that is manufactured by semiconductor process and is electrically connected to outside for its operation. The micro device includes a circuit board, an electrode pad being provided on the circuit board, a lead substrate being provided substantially parallel to the circuit board, and a lead of conductive member being electrically connected to the electrode pad by being bent in a direction away from a surface of the lead substrate, one end of the lead being adhered to the lead substrate and the other end being a free end.Type: ApplicationFiled: March 11, 2005Publication date: October 6, 2005Applicant: Advantest CorporationInventors: Fumikazu Takayanagi, Yoshiaki Moro, Hirokazu Sanpei
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Publication number: 20050035300Abstract: A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.Type: ApplicationFiled: September 26, 2003Publication date: February 17, 2005Applicants: Canon Kabushiki Kaisha, Hitachi, Ltd.Inventors: Yuichi Iwasaki, Masato Muraki, Kenji Tamamori, Kouji Asano, Masayoshi Esashi, Yoshinori Nakayama, Shinichi Hashimoto, Yoshiaki Moro
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Patent number: 6818911Abstract: This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.Type: GrantFiled: April 4, 2003Date of Patent: November 16, 2004Assignees: Canon Kabushiki Kaisha, Hitachi, Ltd.Inventors: Kenji Tamamori, Masato Muraki, Yuichi Iwasaki, Yoshinori Nakayama, Kouji Asano, Yoshiaki Moro, Masayoshi Esashi
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Publication number: 20030218140Abstract: This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.Type: ApplicationFiled: April 4, 2003Publication date: November 27, 2003Applicants: CANON KABUSHIKI KAISHA, HITACHI, LTD.Inventors: Kenji Tamamori, Masato Muraki, Yuichi Iwasaki, Yoshinori Nakayama, Kouji Asano, Yoshiaki Moro, Masayoshi Esashi