Abstract: A display apparatus that displays handwritten data includes a display, a memory, and a processor configured to execute receiving as input the handwritten data; detecting one or more secondary display apparatuses; displaying, in a case where the one or more secondary display apparatuses are detected by the detecting, on the display of the display apparatus, an operation command related to a function of displaying data by using the display apparatus and the one or more secondary display apparatuses, based on the handwritten data received by the receiving; and predetermined processing related to the function, in response to receiving an operation performed by a user with respect to the operation command.

Abstract: A display apparatus includes circuitry. The circuitry receives an input of hand drafted data. The circuitry displays, as an object, the hand drafted data or text converted from the hand drafted data. The circuitry adjusts attribute values of multiple objects being displayed, the multiple objects including the object displayed based on the input.

Abstract: A display apparatus includes circuitry to accept input of handwriting data, perform recognition processing of the handwriting data, and control frequency of the recognition processing in accordance with a power supply state of the display apparatus.

Abstract: A display apparatus includes circuitry to receive an operation of changing a direction of display of a character string displayed in a first direction on a display, and control the display to display a converted character string in a second direction corresponding to the operation of changing. The converted character string is converted from the character string into a target language associated with the second direction.

Abstract: A display apparatus that displays handwritten data includes a display, a memory, and a processor configured to execute receiving as input the handwritten data; detecting one or more secondary display apparatuses; displaying, in a case where the one or more secondary display apparatuses are detected by the detecting, on the display of the display apparatus, an operation command related to a function of displaying data by using the display apparatus and the one or more secondary display apparatuses, based on the handwritten data received by the receiving; and predetermined processing related to the function, in response to receiving an operation performed by a user with respect to the operation command.

Abstract: A display apparatus includes circuitry to accept input of handwriting data, perform recognition processing of the handwriting data, and control frequency of the recognition processing in accordance with a power supply state of the display apparatus.

Abstract: A position detection device for detecting positions of a non-emitter and an emitter in a detection area includes one or more reflective members disposed around the detection area, illumination light sources to emit light toward the reflective member, light receiving sensors to receive light from the reflective member and light from the light emitter, and a control device to control the illumination light sources and the light emitter. Based on previous detection statuses of the non-light emitter and the light emitter, the control device sets a time ratio of a time of a non-light emitter detection mode to a time of a light emitter detection mode, and sets timings of the non-light emitter detection mode and the light emitter detection mode.

Abstract: A coordinate detecting apparatus includes: a plurality of light-emitting and -receiving units arranged along an outer edge of the coordinate input area, the plurality of light-emitting and -receiving units each including a light-emitting part and a light-receiving part; at least one retroreflective member arranged along the outer edge of the coordinate input area; and a control unit to control the plurality of light-emitting and -receiving units to detect coordinates of a position of input made with a designation input unit in a first detection state or a second detection state.

Abstract: A position detection device for detecting positions of a non-emitter and an emitter in a detection area includes one or more reflective members disposed around the detection area, illumination light sources to emit light toward the reflective member, light receiving sensors to receive light from the reflective member and light from the light emitter, and a control device to control the illumination light sources and the light emitter. Based on previous detection statuses of the non-light emitter and the light emitter, the control device sets a time ratio of a time of a non-light emitter detection mode to a time of a light emitter detection mode, and sets timings of the non-light emitter detection mode and the light emitter detection mode.

Abstract: A coordinate detecting apparatus includes: a plurality of light-emitting and -receiving units arranged along an outer edge of the coordinate input area, the plurality of light-emitting and -receiving units each including a light-emitting part and a light-receiving part; at least one retroreflective member arranged along the outer edge of the coordinate input area; and a control unit to control the plurality of light-emitting and -receiving units to detect coordinates of a position of input made with a designation input unit in a first detection state or a second detection state.

Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.

Abstract: The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a ?CV value of 0 to 10% and water.

Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.

Abstract: Provided is a process for producing a polishing liquid composition with which it is possible to give a polished work that has a reduced surface roughness and a reduced amount of particles. The process for producing a polishing liquid composition involves a step in which a raw silica dispersion containing colloidal silica having an average primary-particle diameter of 1-100 nm is filtered through a filter including a filter aid, the filter aid having an average pore diameter, as measured by the mercury intrusion method, of 0.1-3.5 ?m.

Abstract: The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a ? CV value of 0 to 10% and water.

Abstract: To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.

Abstract: To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.

Abstract: A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles in the range of particle sizes of from 40 to 100 nm satisfy the following formula (1): V?0.5×R+40 (1), wherein the particle size is determined by observation with a transmission electron microscope (TEM). The polishing composition of the present invention can be even more suitably used for the manufacture of a substrate for precision parts such as substrates for memory hard disks.

Abstract: A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.

Abstract: A roll-off reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; and a roll-off reducing agent composition comprising a roll off-reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; an abrasive; and water.