Abstract: Provided are a method and an apparatus for cooling a high-temperature exhaust gas, capable of cooling effectively the high-temperature exhaust gas with a small amount of water, as well as, a combustion treatment equipment provided with the cooling apparatus. According to this method, a water curtain is formed orthogonal to the flow of the exhaust gas within a passage through which the high-temperature exhaust gas flows, and the high-temperature exhaust gas is allowed to pass through the water curtain to be cooled thereby. The cooling apparatus is provided with cylindrical cooling chamber (53) having at an upper position a high-temperature exhaust gas inlet (51) and at a lower position a cooled exhaust gas outlet (52); and a plurality of water spray pipes (54) arranged near the high-temperature exhaust gas inlet.

Abstract: A combustion type detoxifying apparatus which carries out detoxifying treatment of a raw gas containing toxic components injected through a burner (2) into a combustion chamber (1) by allowing the toxic components to burn or undergo pyrolysis. The combustion chamber (1) having a double-wall structure consisting of an outer barrel (11) and an inner barrel (12) which is made of a porous material. The combustion chamber (1) is provided with a gas introducing nozzle (4) for introducing a pressure gas to the space defined between the outer barrel (11) and the inner barrel (12).

Abstract: The present invention relates to a method of detecting harmful components selected from the group consisting of volatile inorganic hydrides, volatile inorganic halides and organometallic compounds. The harmful components can be detecting by bringing it into contact with a crystalline cupric hydroxide. The harmful components can be detected based on the color change of the copper hydroxide.

Abstract: The present invention relates to a method of removing harmful components selected from the group consisting of volatile inorganic hydrides, volatile inorganic halides and organometallic compounds and a method of detecting the same, apparatus employed according to these methods. The harmful components can be removed by bringing it into contact with a crystalline cupric hydroxide. The harmful components can be detected based on the color change of the copper hydroxide.

Abstract: An absorbent and process for removing materials for semiconductor products, such as SiH.sub.4, B.sub.2 H.sub.6, SeH.sub.2, AsH.sub.3, PH.sub.3, GeH.sub.4, SiH.sub.2 Cl.sub.2, SiHCl.sub.3, (CH.sub.3).sub.3 Al, (CH.sub.3).sub.3 Ga, etc. from a gas containing above toxic components. The absorbent includes a first and second dry absorbent. The first absorbent induces a solid carrier containing a large proportion of a porous inorganic silicate and impregnated with an aqueous solution of an alkali. The second absorbent has a solid carrier, similar to that in the first absorbent, being impregnated with an aqueous solution of an alkali and an aqueous solution of an oxidizing agent capable of oxidizing germane. When used separately, these two absorbent are not capable of treating certain volatile inorganic hydrides or lose their capacity of absorption in a relatively short period for such hydrides.

Abstract: An absorbent and process for removing materials for semiconductor products, such as SiH.sub.4, B.sub.2 H.sub.6, SeH.sub.2, AsH.sub.3, PH.sub.3, GeH.sub.4, SiH.sub.2 Cl.sub.2, SiHCl.sub.3, (CH.sub.3).sub.3 Al, (CH.sub.3).sub.3 Ga, etc. from a gas containing above toxic components. The absorbent includes a first and second dry absorbent. The first absorbent induces a solid carrier containing a large proportion of a porous inorganic silicate and impregnated with an aqueous solution of an alkali. The second absorbent has a solid carrier, similar to that in the first absorbent, being impregnated with an aqueous solution of an alkali and an aqueous solution of an oxidizing agent capable of oxidizing german. When used separately, these two absorbents are not capable of treating certain volatile inorganic hydrides or lose their capacity of absorption in a relatively short period for such hydrides.