Patents by Inventor Yoshiaki Zenno

Yoshiaki Zenno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor oxidation apparatus and method of producing semiconductor element
    Patent number: 7981700
    Abstract: A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.
    Type: Grant
    Filed: February 13, 2006
    Date of Patent: July 19, 2011
    Assignee: Ricoh Company, Ltd.
    Inventors: Shunichi Sato, Naoto Jikutani, Akihiro Itoh, Shinya Umemoto, Yoshiaki Zenno, Takatoshi Yamamoto
  • Semiconductor Oxidation Apparatus and Method of Producing Semiconductor Element
    Publication number: 20080233017
    Abstract: A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.
    Type: Application
    Filed: February 13, 2006
    Publication date: September 25, 2008
    Inventors: Shunichi Sato, Naoto Jikutani, Akihiro Itoh, Shinya Umemoto, Yoshiaki Zenno, Takatoshi Yamamoto