Patents by Inventor Yoshifumi Nakakoji

Yoshifumi Nakakoji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method
    Patent number: 10845720
    Abstract: A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: November 24, 2020
    Assignee: NIKON CORPORATION
    Inventors: Shigeki Egami, Yoshifumi Nakakoji
  • MARK DETECTION APPARATUS, MARK DETECTION METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
    Publication number: 20190171121
    Abstract: A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.
    Type: Application
    Filed: May 30, 2017
    Publication date: June 6, 2019
    Applicant: NIKON CORPORATION
    Inventors: Shigeki EGAMI, Yoshifumi NAKAKOJI
  • Lithography apparatus and method utilizing pendulum interferometer system
    Patent number: 7466396
    Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: December 16, 2008
    Assignee: Nikon Corporation
    Inventors: Michael B. Binnard, Douglas C. Watson, W. Thomas Novak, Hiroto Horikawa, Yoshifumi Nakakoji, Hideaki Sakamoto
  • Lithography apparatus and method utilizing pendulum interferometer system
    Publication number: 20070139635
    Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
    Type: Application
    Filed: October 12, 2006
    Publication date: June 21, 2007
    Applicant: NIKON CORPORATION
    Inventors: Michael Binnard, Douglas Watson, W. Novak, Hiroto Horikawa, Yoshifumi Nakakoji, Hideaki Sakamoto