Patents by Inventor Yoshihihro Ezawa

Yoshihihro Ezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POLISHING COMPOSITION AND POLISHING METHOD
    Publication number: 20140014872
    Abstract: Disclosed is a polishing composition containing a pH-lowering substance and a pH-buffering agent. The difference in absolute value between the pH of the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 g of the polishing composition and the pH of the polishing composition after leaving to stand for eight days therefrom is 0.5 or less. Also disclosed is another polishing composition containing a pH-lowering substance and a pH-controlling agent. In comparison to the amount of a basic substance in the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 ml of the polishing composition, the amount of a basic substance in the polishing composition after leaving to stand for eight days therefrom is increased by no less than 0.1 mM.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 16, 2014
    Applicant: FUJIMI INCORPORATED
    Inventors: Shuichi Tamada, Tatsuhiko Hirano, Yoshihihro Ezawa, Shogo Onishi