Abstract: There is provided a technique capable of stably form the film on a substrate regardless of machine difference or processing conditions. According to an aspect of the present disclosure, there is provided a technique that includes: (a) setting correction coefficients for correcting an output level of microwave; (b) storing correction tables containing the correction coefficients set in (a); (c) acquiring one or more correction coefficients from at least one correction table periodically from a start of outputting of the microwave; (d) calculating a correction value for an output preset level of the microwave from the one or more correction coefficients acquired in (c); (e) correcting the output preset level of the microwave by using the correction value calculated in (d); and (f) processing a substrate by supplying the microwave into a process chamber with the output preset level of the microwave corrected in (e).

Abstract: A substrate processing apparatus includes a process chamber configured to process a substrate, a carrier mounting part configured to mount a carrier which accommodates the substrate, the substrate capable of being brought into and out of the carrier when a door of the carrier mounted on the carrier mounting part is opened, a carrier opener configured to open and close the door of the carrier mounted on the carrier mounting part, a purge gas supply part configured to supply an inert gas into the carrier with the door kept opened, and a control part configured to perform control so as to carry out at least one inert gas purge among a load purge, an unload purge and a standby purge.

Abstract: A substrate processing apparatus includes a process chamber configured to process a substrate, a carrier mounting part configured to mount a carrier which accommodates the substrate, the substrate capable of being brought into and out of the carrier when a door of the carrier mounted on the carrier mounting part is opened, a carrier opener configured to open and close the door of the carrier mounted on the carrier mounting part, a purge gas supply part configured to supply an inert gas into the carrier with the door kept opened, and a control part configured to perform control so as to carry out at least one inert gas purge among a load purge, an unload purge and a standby purge.

Abstract: To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Abstract: A substrate processing apparatus gives a user notice to prevent removal of a storage medium and provides a screen for determining whether the storage medium is removable. The apparatus controls display of the screen for manipulating substrate processing information and includes a part to which an external storage device is attached. The screen includes: a title panel displayed at an upper region of the screen; an information panel controlling or monitoring a task; and a navigation panel at a lower region of the screen. When the external storage device is attached to the part, an external storage device remove button is enabled by displaying the remove button on the navigation panel to indicate the external storage device is attached to the part. When the external storage device is not attached to the part, the remove button is disabled by displaying the remove button in a like color as the background.

Abstract: Provided are a substrate processing apparatus, a semiconductor device manufacturing method, and a temperature controlling method, which are adapted to improve equipment operational rate. A calculation parameter computing unit computes a calculation parameter using at least a first calculation parameter correction value determined by a first calculation parameter setting unit based on an accumulated film thickness on a reaction vessel, a second calculation parameter correction value determined by a second calculation parameter setting unit based on an accumulated film thickness on a filler wafer, and a third calculation parameter correction value determined by a third calculation parameter setting unit based on the number of filler wafers.

Abstract: To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Abstract: To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Abstract: A substrate processing apparatus is capable of giving notice to a user to prevent an improper removal of a removable storage medium and providing a manipulation screen through which it can be determined whether the removable storage medium can be removed. The substrate processing apparatus comprising: a controller configured to control display of a manipulation screen through which substrate processing information is manipulated; and an attachment/detachment part to which a removable external storage device is attached, wherein when an external storage device is attached to the attachment/detachment part, the controller disposes and enables an external storage device remove button, and when an external storage device is not attached to the attachment/detachment part, the controller disables the button.

Abstract: Provided are a substrate processing apparatus, a semiconductor device manufacturing method, and a temperature controlling method, which are adapted to improve equipment operational rate. A calculation parameter computing unit computes a calculation parameter using at least a first calculation parameter correction value determined by a first calculation parameter setting unit based on an accumulated film thickness on a reaction vessel, a second calculation parameter correction value determined by a second calculation parameter setting unit based on an accumulated film thickness on a filler wafer, and a third calculation parameter correction value determined by a third calculation parameter setting unit based on the number of filler wafers.

Abstract: To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Abstract: An image processing program creates a gradation of a sharp edge shadow and a gradation of subtle colors. The program causes a computer to perform a step in which a diffuse reflection from a first and second object and a shadow of the first object on the second object in a lighting information texture which are generated by a virtual light hitting the first and second object are superimposed onto a base texture which represents details of the object so that a target object is mapped; a step in which a mirror reflection which is generated by the virtual light hitting the first and second object is calculated so that a specular reflection is generated to surfaces of the first and second object; and a step in which the specular reflection is masked based on mask information provided in the lighting information texture which is mapped to the second object.

Abstract: An image processing program which can create a gradation of a sharp edge shadow and a gradation of subtle colors. The program comprises, a step in which a diffuse reflection from a first and second object and a shadow of the first object on the second object in a lighting information texture which are generated by a virtual light hitting the first and second object are superimposed onto a base texture which represents details of the object so that a target object is mapped; a step in which a mirror reflection which is generated by the virtual light hitting the first and second object is calculated so that a specular reflection is generated to surfaces of the first and second object; and a step in which the specular reflection is masked based on mask information provided in the lighting information texture which is mapped to the second object.

Abstract: An antipruritic plaster prepared by spreading a medicament-containing adhesive mass on a backing, said medicament-containing adhesive mass being obtained by dissolving glycyrrhetinic acids in at least one solvent selected from benzyl alcohol, phenethyl alcohol, diphenhydramine, chlorpheniramine, N-methyl-2-pyrrolidone, crotamiton, and lauric acid diethanolamide and uniformly mixing the solution with a plaster base composed of a rubber compound adhesive plaster base, a tackifying agent, and a softener as the necessary components of a plaster base composed of an acrylic resin as the necessary component.

Abstract: A method of manufacturing an insulated gate type field effect semiconductor device, wherein before an oxide film for the gate is formed, the surface portion of the silicon substrate is removed which includes defect such as scar, crack, distortion, dislocation or the like which tends to cause pin-holes to be formed in said oxide film.