Patents by Inventor Yoshihiro Oka
Yoshihiro Oka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11935731Abstract: A measurement part controls power supplied to a heater such that a temperature of the heater becomes constant by using a heater controller, and measures the supplied power in an unignited state in which plasma is not ignited and a transient state in which the power supplied to the heater decreases after plasma is ignited. A parameter calculator performs fitting on a calculation model, which includes a heat input amount from the plasma as a parameter, for calculating the power supplied in the transient state by using the power supplied in the unignited state and the transient state and measured by the measurement part, and calculates the heat input amount. An output part configured to output information based on the heat input amount calculated by the parameter calculator.Type: GrantFiled: June 17, 2019Date of Patent: March 19, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Daisuke Hayashi, Yoshihiro Umezawa, Shinsuke Oka
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Publication number: 20230225327Abstract: To provide a sterilizing liquid and a method of producing the same that have no restrictions on application methods and usage and can be widely used for sterilization, a sterilizing liquid including water containing reactive oxygen species and a nanoparticle catalyst in a stationary state is produced by causing cavitation in water having a conductivity of 2000 ?S/cm or less and COD of 2000 ppm or less while causing the water to flow by a stirrer 2, and causing generation of plasma by a plasma generation mechanism 3 in which a pulse voltage is applied across electrodes 31 in the water including air bubbles mainly containing water vapor generated by the cavitation.Type: ApplicationFiled: June 2, 2021Publication date: July 20, 2023Inventors: Yoshihiro OKA, Tomohiro HASHIMOTO
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Publication number: 20230200289Abstract: Provided is a seed germination promoting liquid and a seed germination promoting method using the same that can be widely used for applications of promoting seed germination without restrictions on approaches or targets to be applied, wherein water containing reactive oxygen species and a nanoparticle catalyst in a stationary state is used to lubricate seeds.Type: ApplicationFiled: December 1, 2021Publication date: June 29, 2023Inventors: Yoshihiro OKA, Tomohiro HASHIMOTO
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Patent number: 11541361Abstract: In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.Type: GrantFiled: July 31, 2017Date of Patent: January 3, 2023Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGO, KABUSHIKI KAISHA DAINICHI SEISAKUSHOInventors: Keiichi Asami, Yoshihiro Oka, Yoshimi Nishimura, Tomohiro Hashimoto, Katsuhiko Yonezawa
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Patent number: 11458445Abstract: Nanoparticles are synthesized by suctioning a liquid under a negative pressure with a negative-pressure suction force caused by the rotation of a rotary blade, causing cavitation by stirring the suctioned liquid by the rotary blade, generating plasma generated by a plasma generation mechanism in air bubbles generated in the liquid, and in that case, consuming an electrode containing elements constituting the nanoparticles to be synthesized.Type: GrantFiled: June 27, 2017Date of Patent: October 4, 2022Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGOInventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
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Publication number: 20190382874Abstract: The present invention relates to a ferritic stainless steel containing 0.03% by mass or less of C; from 0.1 to 0.8% by mass of Si; 1.0% by mass or less of Mn; 0.04% by mass or less of P; 0.01% by mass or less of S; 0.5% by mass or less of Ni; from 12.0 to 15.0% by mass of Cr; 0.03% by mass or less of N; from 0.1 to 0.5% by mass of Nb; from 0.8 to 1.5% by mass of Cu; and 0.1% by mass or less of Al, the balance being Fe and unavoidable impurities, the ferritic stainless steel having a ? max of 55 or less, as represented by the following equation (1): ? max=420C?11.5Si+7Mn+23Ni?11.5Cr+470N+9Cu?52Al+189??(1), in which C, Si, Mn, Ni, Cr, N, Cu and Al mean % by mass of the corresponding elements.Type: ApplicationFiled: September 5, 2017Publication date: December 19, 2019Inventors: Yoshihiro OKA, Yoshitomo FUJIMURA, Kazunari IMAKAWA
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Patent number: 10494274Abstract: Sterilization of a liquid substance is performed by causing cavitation in the liquid substance by stirring the liquid substance with a rotary blade of a suction stirring pump and generating plasma with a plasma generation mechanism in air bubbles generated in the liquid substance by the cavitation.Type: GrantFiled: March 24, 2017Date of Patent: December 3, 2019Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGOInventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
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Publication number: 20180050317Abstract: Nanoparticles are synthesized by suctioning a liquid under a negative pressure with a negative-pressure suction force caused by the rotation of a rotary blade, causing cavitation by stirring the suctioned liquid by the rotary blade, generating plasma generated by a plasma generation mechanism in air bubbles generated in the liquid, and in that case, consuming an electrode containing elements constituting the nanoparticles to be synthesized.Type: ApplicationFiled: June 27, 2017Publication date: February 22, 2018Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
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Publication number: 20170341040Abstract: In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.Type: ApplicationFiled: July 31, 2017Publication date: November 30, 2017Inventors: Keiichi Asami, Yoshihiro Oka, Yoshimi Nishimura, Tomohiro Hashimoto, Katsuhiko Yonezawa
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Publication number: 20170275187Abstract: Sterilization of a liquid substance is performed by causing cavitation in the liquid substance by stirring the liquid substance with a rotary blade of a suction stirring pump and generating plasma with a plasma generation mechanism in air bubbles generated in the liquid substance by the cavitation.Type: ApplicationFiled: March 24, 2017Publication date: September 28, 2017Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
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Publication number: 20160243209Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.Type: ApplicationFiled: April 5, 2016Publication date: August 25, 2016Applicant: International Institute of Cancer Immunology, Inc.Inventors: Haruo SUGIYAMA, Yoshihiro Oka
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Patent number: 9403886Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.Type: GrantFiled: July 29, 2008Date of Patent: August 2, 2016Assignee: INTERNATIONAL INSTITUTE OF CANCER IMMUNOLOGY, INC.Inventors: Haruo Sugiyama, Yoshihiro Oka
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Patent number: 9355955Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.Type: GrantFiled: May 1, 2015Date of Patent: May 31, 2016Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Naohito Suzumura, Yoshihiro Oka
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Publication number: 20150235943Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.Type: ApplicationFiled: May 1, 2015Publication date: August 20, 2015Inventors: Naohito SUZUMURA, Yoshihiro OKA
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Patent number: 9070690Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.Type: GrantFiled: June 4, 2013Date of Patent: June 30, 2015Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Naohito Suzumura, Yoshihiro Oka
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Publication number: 20130341793Abstract: To improve reliability of a semiconductor device by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.Type: ApplicationFiled: June 4, 2013Publication date: December 26, 2013Inventors: Naohito SUZUMURA, Yoshihiro OKA
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Publication number: 20130139493Abstract: A heat transfer element for manifold prevents thermal fatigue of a manifold main body and has good high-temperature strength and oxidation resistance. At least one part of the heat transfer element for manifold is formed from ferritic stainless steel. The ferritic stainless steel contains at least one element, in terms of mass %, of: C: 0.03% or less; Si: 2.0% or less; Mn: 2.0% or less; Cr: 10 to 30%; Nb: 0.8% or less; and Ti: 0.8% or less, and N: 0.03% or less, and the remaining part thereof is formed from Fe and inevitable impurities. _Further, an alloy content of the ferritic stainless steel is adjusted so that an A value in equation (1), where A value=Nb+Ti?4(C+N), is 0.10 or more, and a B value in equation (2), where B value=Cr+15Si, is 18 or more.Type: ApplicationFiled: August 8, 2011Publication date: June 6, 2013Applicant: NISSHIN STEEL CO., LTD.Inventors: Kazunari Imakawa, Yoshihiro Oka, Sadayuki Nakamura, Manabu Oku
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Patent number: 8390135Abstract: The reliability of a porous Low-k film is improved. The mean diameter of first pores and second pores in an interlayer insulation film of a second fine layer including a porous Low-k film is set at 1.0 nm or more and less than 1.45 nm. This prevents the formation of a modified layer over the surface of the interlayer insulation film by process damages. Further, the formation of the moisture-containing modified layer is inhibited to prevent oxidation of a barrier film and a main conductor film forming respective wirings. This prevents deterioration of breakdown voltage between respective wirings. This prevents deterioration of the EM lifetime of wirings formed adjacent to the interlayer insulation film and the inter-wiring TDDB lifetime of the wirings.Type: GrantFiled: May 18, 2011Date of Patent: March 5, 2013Assignee: Renesas Electronics CorporationInventors: Yoshihiro Oka, Kinya Goto
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Publication number: 20110298133Abstract: The reliability of a porous Low-k film is improved. The mean diameter of first pores and second pores in an interlayer insulation film of a second fine layer including a porous Low-k film is set at 1.0 nm or more and less than 1.45 nm. This prevents the formation of a modified layer over the surface of the interlayer insulation film by process damages. Further, the formation of the moisture-containing modified layer is inhibited to prevent oxidation of a barrier film and a main conductor film forming respective wirings. This prevents deterioration of breakdown voltage between respective wirings. This prevents deterioration of the EM lifetime of wirings formed adjacent to the interlayer insulation film and the inter-wiring TDDB lifetime of the wirings.Type: ApplicationFiled: May 18, 2011Publication date: December 8, 2011Applicant: RENESAS ELECTRONICS CORPORATIONInventors: Yoshihiro OKA, Kinya GOTO
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Patent number: 7807792Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.Type: GrantFiled: February 5, 2009Date of Patent: October 5, 2010Assignee: International Institute of Cancer Immunology, Inc.Inventors: Haruo Sugiyama, Yoshihiro Oka