Patents by Inventor Yoshihiro Oka

Yoshihiro Oka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11935731
    Abstract: A measurement part controls power supplied to a heater such that a temperature of the heater becomes constant by using a heater controller, and measures the supplied power in an unignited state in which plasma is not ignited and a transient state in which the power supplied to the heater decreases after plasma is ignited. A parameter calculator performs fitting on a calculation model, which includes a heat input amount from the plasma as a parameter, for calculating the power supplied in the transient state by using the power supplied in the unignited state and the transient state and measured by the measurement part, and calculates the heat input amount. An output part configured to output information based on the heat input amount calculated by the parameter calculator.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: March 19, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Daisuke Hayashi, Yoshihiro Umezawa, Shinsuke Oka
  • Publication number: 20230225327
    Abstract: To provide a sterilizing liquid and a method of producing the same that have no restrictions on application methods and usage and can be widely used for sterilization, a sterilizing liquid including water containing reactive oxygen species and a nanoparticle catalyst in a stationary state is produced by causing cavitation in water having a conductivity of 2000 ?S/cm or less and COD of 2000 ppm or less while causing the water to flow by a stirrer 2, and causing generation of plasma by a plasma generation mechanism 3 in which a pulse voltage is applied across electrodes 31 in the water including air bubbles mainly containing water vapor generated by the cavitation.
    Type: Application
    Filed: June 2, 2021
    Publication date: July 20, 2023
    Inventors: Yoshihiro OKA, Tomohiro HASHIMOTO
  • Publication number: 20230200289
    Abstract: Provided is a seed germination promoting liquid and a seed germination promoting method using the same that can be widely used for applications of promoting seed germination without restrictions on approaches or targets to be applied, wherein water containing reactive oxygen species and a nanoparticle catalyst in a stationary state is used to lubricate seeds.
    Type: Application
    Filed: December 1, 2021
    Publication date: June 29, 2023
    Inventors: Yoshihiro OKA, Tomohiro HASHIMOTO
  • Patent number: 11541361
    Abstract: In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: January 3, 2023
    Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGO, KABUSHIKI KAISHA DAINICHI SEISAKUSHO
    Inventors: Keiichi Asami, Yoshihiro Oka, Yoshimi Nishimura, Tomohiro Hashimoto, Katsuhiko Yonezawa
  • Patent number: 11458445
    Abstract: Nanoparticles are synthesized by suctioning a liquid under a negative pressure with a negative-pressure suction force caused by the rotation of a rotary blade, causing cavitation by stirring the suctioned liquid by the rotary blade, generating plasma generated by a plasma generation mechanism in air bubbles generated in the liquid, and in that case, consuming an electrode containing elements constituting the nanoparticles to be synthesized.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: October 4, 2022
    Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGO
    Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
  • Publication number: 20190382874
    Abstract: The present invention relates to a ferritic stainless steel containing 0.03% by mass or less of C; from 0.1 to 0.8% by mass of Si; 1.0% by mass or less of Mn; 0.04% by mass or less of P; 0.01% by mass or less of S; 0.5% by mass or less of Ni; from 12.0 to 15.0% by mass of Cr; 0.03% by mass or less of N; from 0.1 to 0.5% by mass of Nb; from 0.8 to 1.5% by mass of Cu; and 0.1% by mass or less of Al, the balance being Fe and unavoidable impurities, the ferritic stainless steel having a ? max of 55 or less, as represented by the following equation (1): ? max=420C?11.5Si+7Mn+23Ni?11.5Cr+470N+9Cu?52Al+189??(1), in which C, Si, Mn, Ni, Cr, N, Cu and Al mean % by mass of the corresponding elements.
    Type: Application
    Filed: September 5, 2017
    Publication date: December 19, 2019
    Inventors: Yoshihiro OKA, Yoshitomo FUJIMURA, Kazunari IMAKAWA
  • Patent number: 10494274
    Abstract: Sterilization of a liquid substance is performed by causing cavitation in the liquid substance by stirring the liquid substance with a rotary blade of a suction stirring pump and generating plasma with a plasma generation mechanism in air bubbles generated in the liquid substance by the cavitation.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: December 3, 2019
    Assignees: NIHON SPINDLE MANUFACTURING CO., LTD., UNIVERSITY OF HYOGO
    Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
  • Publication number: 20180050317
    Abstract: Nanoparticles are synthesized by suctioning a liquid under a negative pressure with a negative-pressure suction force caused by the rotation of a rotary blade, causing cavitation by stirring the suctioned liquid by the rotary blade, generating plasma generated by a plasma generation mechanism in air bubbles generated in the liquid, and in that case, consuming an electrode containing elements constituting the nanoparticles to be synthesized.
    Type: Application
    Filed: June 27, 2017
    Publication date: February 22, 2018
    Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
  • Publication number: 20170341040
    Abstract: In order to provide a dispersion method and a dispersion apparatus capable of mixing a material to be processed and a dispersion medium having no affinity with each other using a single apparatus without using a dispersant, there are provided a quantitative supply mechanism quantitatively supplying a material to be processed, a suction stirring mechanism primarily including a suction stirring pump in which the material to be processed and a dispersion medium are subjected to negative pressure suction by a negative pressure suction force generated by rotation of a rotating blade and the suctioned material to be processed and the dispersion medium are stirred and mixed by the rotating blade and are allowed to pass through a throttle passage to cause cavitation, and a plasma generating mechanism generating a plasma in bubbles formed due to cavitation in a mixed liquid of the material to be processed and the dispersion medium.
    Type: Application
    Filed: July 31, 2017
    Publication date: November 30, 2017
    Inventors: Keiichi Asami, Yoshihiro Oka, Yoshimi Nishimura, Tomohiro Hashimoto, Katsuhiko Yonezawa
  • Publication number: 20170275187
    Abstract: Sterilization of a liquid substance is performed by causing cavitation in the liquid substance by stirring the liquid substance with a rotary blade of a suction stirring pump and generating plasma with a plasma generation mechanism in air bubbles generated in the liquid substance by the cavitation.
    Type: Application
    Filed: March 24, 2017
    Publication date: September 28, 2017
    Inventors: Keiichi Asami, Keiichiro Onishi, Yoshihiro Oka
  • Publication number: 20160243209
    Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.
    Type: Application
    Filed: April 5, 2016
    Publication date: August 25, 2016
    Applicant: International Institute of Cancer Immunology, Inc.
    Inventors: Haruo SUGIYAMA, Yoshihiro Oka
  • Patent number: 9403886
    Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: August 2, 2016
    Assignee: INTERNATIONAL INSTITUTE OF CANCER IMMUNOLOGY, INC.
    Inventors: Haruo Sugiyama, Yoshihiro Oka
  • Patent number: 9355955
    Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: May 31, 2016
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Naohito Suzumura, Yoshihiro Oka
  • Publication number: 20150235943
    Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.
    Type: Application
    Filed: May 1, 2015
    Publication date: August 20, 2015
    Inventors: Naohito SUZUMURA, Yoshihiro OKA
  • Patent number: 9070690
    Abstract: A semiconductor device is provided in which reliability of the semiconductor device is improved by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: June 30, 2015
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Naohito Suzumura, Yoshihiro Oka
  • Publication number: 20130341793
    Abstract: To improve reliability of a semiconductor device by improving an EM characteristic, a TDDB characteristic, and a withstand voltage characteristic of the semiconductor device. An average diameter of first vacancies in a lower insulating layer which configures an interlayer insulating film of a porous low-k film for embedding a wiring therein, is made smaller than an average diameter of second vacancies in an upper insulating layer, and thereby an elastic modulus is increased in the lower insulating layer. Further, a side wall insulating layer which is a dense layer including the first vacancies having an average diameter smaller than the second vacancies is formed on the surface of the interlayer insulating film exposed on a side wall of a wiring trench.
    Type: Application
    Filed: June 4, 2013
    Publication date: December 26, 2013
    Inventors: Naohito SUZUMURA, Yoshihiro OKA
  • Publication number: 20130139493
    Abstract: A heat transfer element for manifold prevents thermal fatigue of a manifold main body and has good high-temperature strength and oxidation resistance. At least one part of the heat transfer element for manifold is formed from ferritic stainless steel. The ferritic stainless steel contains at least one element, in terms of mass %, of: C: 0.03% or less; Si: 2.0% or less; Mn: 2.0% or less; Cr: 10 to 30%; Nb: 0.8% or less; and Ti: 0.8% or less, and N: 0.03% or less, and the remaining part thereof is formed from Fe and inevitable impurities. _Further, an alloy content of the ferritic stainless steel is adjusted so that an A value in equation (1), where A value=Nb+Ti?4(C+N), is 0.10 or more, and a B value in equation (2), where B value=Cr+15Si, is 18 or more.
    Type: Application
    Filed: August 8, 2011
    Publication date: June 6, 2013
    Applicant: NISSHIN STEEL CO., LTD.
    Inventors: Kazunari Imakawa, Yoshihiro Oka, Sadayuki Nakamura, Manabu Oku
  • Patent number: 8390135
    Abstract: The reliability of a porous Low-k film is improved. The mean diameter of first pores and second pores in an interlayer insulation film of a second fine layer including a porous Low-k film is set at 1.0 nm or more and less than 1.45 nm. This prevents the formation of a modified layer over the surface of the interlayer insulation film by process damages. Further, the formation of the moisture-containing modified layer is inhibited to prevent oxidation of a barrier film and a main conductor film forming respective wirings. This prevents deterioration of breakdown voltage between respective wirings. This prevents deterioration of the EM lifetime of wirings formed adjacent to the interlayer insulation film and the inter-wiring TDDB lifetime of the wirings.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: March 5, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Yoshihiro Oka, Kinya Goto
  • Publication number: 20110298133
    Abstract: The reliability of a porous Low-k film is improved. The mean diameter of first pores and second pores in an interlayer insulation film of a second fine layer including a porous Low-k film is set at 1.0 nm or more and less than 1.45 nm. This prevents the formation of a modified layer over the surface of the interlayer insulation film by process damages. Further, the formation of the moisture-containing modified layer is inhibited to prevent oxidation of a barrier film and a main conductor film forming respective wirings. This prevents deterioration of breakdown voltage between respective wirings. This prevents deterioration of the EM lifetime of wirings formed adjacent to the interlayer insulation film and the inter-wiring TDDB lifetime of the wirings.
    Type: Application
    Filed: May 18, 2011
    Publication date: December 8, 2011
    Applicant: RENESAS ELECTRONICS CORPORATION
    Inventors: Yoshihiro OKA, Kinya GOTO
  • Patent number: 7807792
    Abstract: A tumor antigen that comprises, as an active ingredient, a product of the Wilms' tumor suppressor gene WT1 or a peptide composed of 7-30 contiguous amino acids containing an anchor amino acid for binding to major histocompatibility complex (MHC) class I in said amino acid sequence, and a vaccine comprising said antigen.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: October 5, 2010
    Assignee: International Institute of Cancer Immunology, Inc.
    Inventors: Haruo Sugiyama, Yoshihiro Oka