Abstract: The present invention relates to a heat-sensitive lithographic printing plate requiring no on-press development or no water development, which provides clear printed image, has sufficient printing wear resistance, and has improved scumming, more specifically to a heat-sensitive lithographic printing plate comprising, on a water-resistant support, an image-forming layer containing a thermoplastic resin, a water-soluble polymer compound, and at least one selected from a compound of the following formulae (1), (2), (3) and (4). The present invention also relates to a direct heat-sensitive lithographic printing plate by which the generation of sticking phenomenon has been reduced.

Abstract: The present invention relates to a heat-sensitive lithographic printing plate requiring no on-press development or no water development, which provides clear printed image, has sufficient printing wear resistance, and has improved scumming, more specifically to a heat-sensitive lithographic printing plate comprising, on a water-resistant support, an image-forming layer containing a thermoplastic resin, a water-soluble polymer compound, and at least one selected from a compound of the following formulae (1), (2), (3) and (4). The present invention also relates to a direct heat-sensitive lithographic printing plate by which the generation of sticking phenomenon has been reduced.

Abstract: There is disclosed a lithographic printing plate which comprises a grained and anodized aluminum support, a silver halide emulsion layer and a physical development nuclei layer between the aluminum support and the silver halide emulsion layer, and at least one selected from the group consisting of a phosphoric acid compound having a polyoxyalkylene unit and a water-soluble vinyl polymer having a carboxylic acid ester group being contained between the aluminum support and the silver halide emulsion layer.

Abstract: There is disclosed a process for making a lithographic printing plate having physical development nuclei between an aluminum support and a silver halide emulsion layer to which, after exposure, a treatment using at least a developing solution, a washing solution and a finishing solution is applied in this order,the improvement wherein at least one of the above processing solutions contains at least one compound selected from the groups (A) and (B) mentioned below:(A) at least one compound selected from the group consisting of an amine compound having a propyleneoxy group and an ethyleneoxy group, an aliphatic acid amide compound having a propyleneoxy group and an ethyleneoxy group, and a quaternary ammonium compound having a propyleneoxy group and an ethyleneoxy group; and(B) at least one compound selected from the group consisting of urea and a derivative thereof.