Patents by Inventor Yoshikazu Furusawa
Yoshikazu Furusawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11585649Abstract: A shift drum angle detecting device includes: a first angle sensor configured to output a first sensor output value corresponding to a shaft rotational angle of a first sensor shaft integrally rotating with a shift drum; and a second angle sensor configured to output a second sensor output value corresponding to a shaft rotational angle of a second sensor shaft rotating at an increased speed as a result of a speed increasing mechanism increasing the rotation of the first sensor shaft. A first sensor switching angle where the maximum value and the minimum value of the first sensor output value are switched and a second sensor switching angle where the maximum value and the minimum value of the second sensor output value are switched are set to be different from each other in rotational angle of the shift drum. Such device precisely detects any rotational angle of the shift drum.Type: GrantFiled: September 24, 2020Date of Patent: February 21, 2023Assignee: Honda Motor Co., Ltd.Inventors: Jun Adachi, Hiroyuki Kojima, Akira Tokito, Yoshikazu Furusawa
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Publication number: 20210095951Abstract: A shift drum angle detecting device includes: a first angle sensor configured to output a first sensor output value corresponding to a shaft rotational angle of a first sensor shaft integrally rotating with a shift drum; and a second angle sensor configured to output a second sensor output value corresponding to a shaft rotational angle of a second sensor shaft rotating at an increased speed as a result of a speed increasing mechanism increasing the rotation of the first sensor shaft. A first sensor switching angle where the maximum value and the minimum value of the first sensor output value are switched and a second sensor switching angle where the maximum value and the minimum value of the second sensor output value are switched are set to be different from each other in rotational angle of the shift drum. Such device precisely detects any rotational angle of the shift drum.Type: ApplicationFiled: September 24, 2020Publication date: April 1, 2021Inventors: Jun ADACHI, Hiroyuki KOJIMA, Akira TOKITO, Yoshikazu FURUSAWA
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Patent number: 10619247Abstract: There is provided a substrate processing apparatus, including: a process vessel configured to accommodate a plurality of substrates; a gas supply part configured to supply a gas into the process vessel; an exhaust part configured to exhaust the gas in the process vessel; and a scavenging part configured to scavenge an interior of the gas supply part, wherein the gas supply part is connected to the scavenging part.Type: GrantFiled: November 16, 2017Date of Patent: April 14, 2020Assignee: TOKYO ELECTRON LIMITEDInventor: Yoshikazu Furusawa
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Patent number: 10573518Abstract: A method of performing a film formation on target substrates in a state where a substrate holder for holding the target substrates in a shelf shape is loaded into a vertical reaction container from a lower opening thereof and the lower opening is closed by a lid. The method includes: performing the film formation on the target substrates by supplying a processing gas into the reaction container; opening the lid and unloading the substrate holder from the reaction container; performing the film formation on a bottom portion of the reaction container including an inner surface of the lid by closing the lower opening with the lid and supplying a coating gas different from the processing gas into the reaction container; and performing the film formation on the target substrates by opening the lid, loading the substrate holder into the reaction container, and supplying the processing gas into the reaction container.Type: GrantFiled: March 23, 2018Date of Patent: February 25, 2020Assignee: TOKYO ELECTRON LIMITEDInventor: Yoshikazu Furusawa
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Publication number: 20180286665Abstract: A method of performing a film formation on target substrates in a state where a substrate holder for holding the target substrates in a shelf shape is loaded into a vertical reaction container from a lower opening thereof and the lower opening is closed by a lid. The method includes: performing the film formation on the target substrates by supplying a processing gas into the reaction container; opening the lid and unloading the substrate holder from the reaction container; performing the film formation on a bottom portion of the reaction container including an inner surface of the lid by closing the lower opening with the lid and supplying a coating gas different from the processing gas into the reaction container; and performing the film formation on the target substrates by opening the lid, loading the substrate holder into the reaction container, and supplying the processing gas into the reaction container.Type: ApplicationFiled: March 23, 2018Publication date: October 4, 2018Inventor: Yoshikazu FURUSAWA
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Publication number: 20180142357Abstract: There is provided a substrate processing apparatus, including: a process vessel configured to accommodate a plurality of substrates; a gas supply part configured to supply a gas into the process vessel; an exhaust part configured to exhaust the gas in the process vessel; and a scavenging part configured to scavenge an interior of the gas supply part, wherein the gas supply part is connected to the scavenging part.Type: ApplicationFiled: November 16, 2017Publication date: May 24, 2018Inventor: Yoshikazu FURUSAWA
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Patent number: 9758865Abstract: The present disclosure provides a silicon film forming method for forming a silicon film on a workpiece having a processed surface, including: forming a seed layer by supplying a high-order aminosilane-based gas containing two or more silicon atoms in a molecular formula onto the processed surface and by having silicon adsorbed onto the processed surface; and forming a silicon film by supplying a silane-based gas not containing an amino group onto the seed layer and by depositing silicon onto the seed layer, wherein, when forming a seed layer, a process temperature is set within a range of 350 degrees C. or lower and a room temperature or higher.Type: GrantFiled: July 30, 2014Date of Patent: September 12, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuhide Hasebe, Kazuya Takahashi, Katsuhiko Komori, Yoshikazu Furusawa, Mitsuhiro Okada, Hiroyuki Hayashi, Akinobu Kakimoto
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Patent number: 9540743Abstract: There is provided a method of crystallizing amorphous silicones, which includes: forming a stacked structure of a second amorphous silicon film followed by a first amorphous silicon film on an underlay film, the second amorphous silicon film having a faster crystal growth rate than the first amorphous silicon film; and performing a crystallization treatment on the stacked structure to crystallize silicones contained in at least the second amorphous silicon film.Type: GrantFiled: December 10, 2014Date of Patent: January 10, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuya Takahashi, Yoshikazu Furusawa, Mitsuhiro Okada, Hiromasa Yonekura
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Patent number: 9478423Abstract: A method of vapor-diffusing impurities into a diffusion region of a target substrate to be processed using a dummy substrate is provided. The method includes loading the target substrate and the dummy substrate in a substrate loading jig, accommodating the substrate loading jig loaded with the target substrate and the dummy substrate in a processing chamber of a processing apparatus, and vapor-diffusing impurities into the diffusion region of the target substrate in the processing chamber having the accommodated substrate loading jig. The vapor-diffused impurities are boron, an outer surface of the dummy substrate includes a material having properties not allowing boron adsorption.Type: GrantFiled: July 30, 2013Date of Patent: October 25, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuya Takahashi, Yoshikazu Furusawa, Mitsuhiro Okada
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Patent number: 9171722Abstract: A method of vapor-diffusing impurities into a diffusion region of a target substrate to be processed using a dummy substrate is provided. The method includes loading the target substrate and the dummy substrate in a substrate loading jig, accommodating the substrate loading jig loaded with the target substrate and the dummy substrate in a processing chamber of a processing apparatus, and vapor-diffusing impurities into the diffusion region of the target substrate in the processing chamber having the accommodated substrate loading jig. The vapor-diffused impurities are boron, an outer surface of the dummy substrate includes a material having properties not allowing boron adsorption.Type: GrantFiled: July 30, 2013Date of Patent: October 27, 2015Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuya Takahashi, Yoshikazu Furusawa, Mitsuhiro Okada
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Publication number: 20150159295Abstract: There is provided a method of crystallizing amorphous silicones, which includes: forming a stacked structure of a second amorphous silicon film followed by a first amorphous silicon film on an underlay film, the second amorphous silicon film having a faster crystal growth rate than the first amorphous silicon film; and performing a crystallization treatment on the stacked structure to crystalize silicones contained in at least the second amorphous silicon film.Type: ApplicationFiled: December 10, 2014Publication date: June 11, 2015Inventors: Kazuya TAKAHASHI, Yoshikazu FURUSAWA, Mitsuhiro OKADA, Hiromasa YONEKURA
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Publication number: 20150037970Abstract: The present disclosure provides a silicon film forming method for forming a silicon film on a workpiece having a processed surface, including: forming a seed layer by supplying a high-order aminosilane-based gas containing two or more silicon atoms in a molecular formula onto the processed surface and by having silicon adsorbed onto the processed surface; and forming a silicon film by supplying a silane-based gas not containing an amino group onto the seed layer and by depositing silicon onto the seed layer, wherein, when forming a seed layer, a process temperature is set within a range of 350 degrees C. or lower and a room temperature or higher.Type: ApplicationFiled: July 30, 2014Publication date: February 5, 2015Inventors: Kazuhide HASEBE, Kazuya TAKAHASHI, Katsuhiko KOMORI, Yoshikazu FURUSAWA, Mitsuhiro OKADA, Hiroyuki HAYASHI, Akinobu KAKIMOTO
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Patent number: 8906792Abstract: The impurity diffusion method includes: transferring an object on which the thin film is formed into a processing chamber (operation 1); raising a temperature of the object to a vapor diffusion temperature in the processing chamber (operation 3); and supplying an impurity-containing gas that contains the impurities into the processing chamber, together with an inert gas and diffusing the impurities in the thin film formed on the object of which the temperature is raised to the vapor diffusion temperature (operation 4), wherein in the operation 4, an impurity diffusion acceleration gas for accelerating the diffusion of the impurities into the thin film is supplied into the processing chamber, together with the impurity-containing gas and the inert gas.Type: GrantFiled: April 26, 2013Date of Patent: December 9, 2014Assignee: Tokyo Electron LimitedInventors: Kazuya Takahashi, Yoshikazu Furusawa, Mitsuhiro Okada
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Publication number: 20140030879Abstract: A method of vapor-diffusing impurities into a diffusion region of a target substrate to be processed using a dummy substrate is provided. The method includes loading the target substrate and the dummy substrate in a substrate loading jig, accommodating the substrate loading jig loaded with the target substrate and the dummy substrate in a processing chamber of a processing apparatus, and vapor-diffusing impurities into the diffusion region of the target substrate in the processing chamber having the accommodated substrate loading jig. The vapor-diffused impurities are boron, an outer surface of the dummy substrate includes a material having properties not allowing boron adsorption.Type: ApplicationFiled: July 30, 2013Publication date: January 30, 2014Applicant: Tokyo Electron LimitedInventors: Kazuya TAKAHASHI, Yoshikazu FURUSAWA, Mitsuhiro OKADA
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Publication number: 20130288470Abstract: The impurity diffusion method includes: transferring an object on which the thin film is formed into a processing chamber (operation 1); raising a temperature of the object to a vapor diffusion temperature in the processing chamber (operation 3); and supplying an impurity-containing gas that contains the impurities into the processing chamber, together with an inert gas and diffusing the impurities in the thin film formed on the object of which the temperature is raised to the vapor diffusion temperature (operation 4), wherein in the operation 4, an impurity diffusion acceleration gas for accelerating the diffusion of the impurities into the thin film is supplied into the processing chamber, together with the impurity-containing gas and the inert gas.Type: ApplicationFiled: April 26, 2013Publication date: October 31, 2013Applicant: TOKYO ELECTRON LIMITEDInventors: Kazuya TAKAHASHI, Yoshikazu FURUSAWA, Mitsuhiro OKADA
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Patent number: 8518488Abstract: A method for using an apparatus configured to form a germanium-containing film includes performing a first film formation process for forming a first product film containing germanium by CVD on a product target object placed inside a reaction container, a first cleaning process for etching the film formation by-product, a second cleaning process for removing residual germanium from inside the reaction container, and a second film formation process for forming a second product film containing no germanium by CVD on a product target object placed inside the reaction container, in this order. The second cleaning process is performed by exhausting gas from inside the reaction container with no product target object placed therein, supplying a second cleaning gas containing an oxidizing gas and hydrogen gas into the reaction container, and heating an interior of the reaction container thereby activating the second cleaning gas.Type: GrantFiled: February 17, 2010Date of Patent: August 27, 2013Assignee: Tokyo Electron LimitedInventors: Yoshikazu Furusawa, Mitsuhiro Okada
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Publication number: 20100210094Abstract: A method for using an apparatus configured to form a germanium-containing film includes performing a first film formation process for forming a first product film containing germanium by CVD on a product target object placed inside a reaction container, a first cleaning process for etching the film formation by-product, a second cleaning process for removing residual germanium from inside the reaction container, and a second film formation process for forming a second product film containing no germanium by CVD on a product target object placed inside the reaction container, in this order. The second cleaning process is performed by exhausting gas from inside the reaction container with no product target object placed therein, supplying a second cleaning gas containing an oxidizing gas and hydrogen gas into the reaction container, and heating an interior of the reaction container thereby activating the second cleaning gas.Type: ApplicationFiled: February 17, 2010Publication date: August 19, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshikazu FURUSAWA, Mitsuhiro Okada
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Patent number: 7648895Abstract: A vertical CVD apparatus is arranged to process a plurality of target substrates all together to form a silicon germanium film. The apparatus includes a reaction container having a process field configured to accommodate the target substrates, and a common supply system configured to supply a mixture gas into the process field. The mixture gas includes a first process gas of a silane family and a second process gas of a germane family. The common supply system includes a plurality of supply ports disposed at different heights.Type: GrantFiled: December 22, 2008Date of Patent: January 19, 2010Assignee: Tokyo Electron LimitedInventors: Masaki Kurokawa, Katsuhiko Komori, Norifumi Kimura, Kazuhide Hasebe, Takehiko Fujita, Akitake Tamura, Yoshikazu Furusawa
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Publication number: 20090104760Abstract: A vertical CVD apparatus is arranged to process a plurality of target substrates all together to form a silicon germanium film. The apparatus includes a reaction container having a process field configured to accommodate the target substrates, and a common supply system configured to supply a mixture gas into the process field. The mixture gas includes a first process gas of a silane family and a second process gas of a germane family. The common supply system includes a plurality of supply ports disposed at different heights.Type: ApplicationFiled: December 22, 2008Publication date: April 23, 2009Applicant: TOKYO ELECTON LIMITEDInventors: Masaki KUROKAWA, Katsuhiko Komori, Norifumi Kimura, Kazuhide Hasebe, Takehiko Fujita, Akitake Tamura, Yoshikazu Furusawa
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Patent number: D588078Type: GrantFiled: December 15, 2006Date of Patent: March 10, 2009Assignee: Tokyo Electron LimitedInventors: Mitsuhiro Okada, Yoshikazu Furusawa, Daisuke Suzuki