Patents by Inventor Yoshikazu Saitoh

Yoshikazu Saitoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9530485
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: August 14, 2015
    Date of Patent: December 27, 2016
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20150357026
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: August 14, 2015
    Publication date: December 10, 2015
    Inventors: Kenichi OSADA, Koichiro ISHIBASHI, Yoshikazu SAITOH, Akio NISHIDA, Masaru NAKAMICHI, Naoki KITAI
  • Patent number: 9111636
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: August 18, 2015
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20150155031
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: July 3, 2014
    Publication date: June 4, 2015
    Inventors: Kenichi OSADA, Koichiro ISHIBASHI, Yoshikazu SAITOH, Akio NISHIDA, Masaru NAKAMICHI, Naoki KITAI
  • Patent number: 8797791
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: April 18, 2013
    Date of Patent: August 5, 2014
    Assignee: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20130229860
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: April 18, 2013
    Publication date: September 5, 2013
    Applicant: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 8437179
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: May 7, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20120257443
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: June 20, 2012
    Publication date: October 11, 2012
    Applicant: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 8232589
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: July 31, 2012
    Assignee: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20120113709
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: January 17, 2012
    Publication date: May 10, 2012
    Applicant: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 8125017
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: May 13, 2011
    Date of Patent: February 28, 2012
    Assignee: Renesas Electronics Corporation
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20110215414
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: May 13, 2011
    Publication date: September 8, 2011
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 7964484
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: June 21, 2011
    Assignees: Renesas Electronics Corporation, Hitachi ULSI Systems Co., Ltd.
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20090269899
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: June 25, 2009
    Publication date: October 29, 2009
    Inventors: Kenichi OSADA, Koichiro ISHIBASHI, Yoshikazu SAITOH, Akio NISHIDA, Masaru NAKAMICHI, Naoki KITAI
  • Patent number: 7585981
    Abstract: The present invention provides an industrial method that allows to produce an indole derivative trimer with high purity in mass, as well as novel indole derivative trimers obtainable by the method, having high conductivity, high oxidation-reduction potential, high oxidation-reduction capacity, and the excellent cycle characteristics. The present invention relates to a method of producing an indole derivative trimer comprising the step of oxidizing an indole derivative in a reaction solution containing an organic solvent and to the novel trimers produced by the method.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: September 8, 2009
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Shinichi Maeda, Fumino Momose, Yoshikazu Saitoh, Takashi Saitoh
  • Patent number: 7569881
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: August 4, 2009
    Assignees: Renesas Technology Corporation, Hitachi ULSI Systems Co., Ltd.
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20090009236
    Abstract: The present invention provides a semiconductor integrated circuit device equipped with a negative feedback amplifier circuit or a step-down circuit which realizes stabilization of an output voltage effectively in response to a variation in power supply voltage. A constant current source is used to cause a bias current for setting current consumption to flow in a differential amplifying MOSFET. A capacitor is provided between an external power supply voltage and a predetermined circuit node to thereby detect a reduction in the external power supply voltage. An operating current of the differential amplifying MOSFET is increased through the use of a current flowing in the capacitor due to such an external power variation, thereby executing the operation of stabilizing an output voltage corresponding to the reduction in the external power supply voltage.
    Type: Application
    Filed: September 2, 2008
    Publication date: January 8, 2009
    Inventor: Yoshikazu Saitoh
  • Patent number: 7436247
    Abstract: A semiconductor integrated circuit device is equipped with a negative feedback amplifier circuit or a step-down circuit which realizes stabilization of an output voltage effectively in response to a variation in power supply voltage. A constant current source is used to cause a bias current for setting current consumption to flow in a differential amplifying MOSFET. A capacitor is provided between an external power supply voltage and a predetermined circuit node to thereby detect a reduction in the external power supply voltage. An operating current of the differential amplifying MOSFET is increased through the use of a current flowing in the capacitor due to such an external power variation, thereby executing the operation of stabilizing an output voltage corresponding to the reduction in the external power supply voltage.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: October 14, 2008
    Assignees: Renesas Technology Corp., Hitachi ULSI Systems Co., Ltd.
    Inventor: Yoshikazu Saitoh
  • Publication number: 20080203437
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: April 9, 2008
    Publication date: August 28, 2008
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 7388238
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: June 14, 2006
    Date of Patent: June 17, 2008
    Assignees: Renesas Technology Corp., Hitachi ULSI Systems Co., Ltd.
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai