Abstract: A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.

Abstract: A material for dielectric films is a polymerizable composition containing an adamantanepolycarboxylic acid represented by following Formula (1): wherein X is a hydrogen atom, a carboxyl group or a hydrocarbon group; and Y1, Y2, Y3 and Y4 are the same as or different from one another and are each a single bond or a bivalent aromatic cyclic group; an aromatic polyamine represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R1 and R2 are each a substituent bound to Ring Z, are the same as or different from each other and are each an amino group, a mono-substituted amino group, a hydroxyl group or a mercapto group; and a solvent other than ketones and aldehydes, in which the adamantanepolycarboxylic acid and aromatic polyamine are dissolved in the solvent

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: A material for dielectric films is a polymerizable composition containing an adamantanepolycarboxylic acid represented by following Formula (1): 1

Abstract: A material for dielectric films is a polymerizable composition containing an organic solvent, and an adamantanepolycarboxylic acid derivative represented by following Formula (1): 1

Abstract: A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1

Abstract: A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): 1

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: An invented method for the surface modification of a molded plastic treats a molded plastic with an oxygen-atom-containing gas such as oxygen, carbon monoxide, a nitrogen oxide, or a sulfur oxide in the presence of N-hydroxyphthalimide or another imide compound represented by the following formula (1): wherein R1 and R2 are each, identical to or different from each other, a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a cycloalkyl group, a hydroxyl group, an alkoxy group, a carboxyl group, an alkoxycarbonyl group, or an acyl group, or R1 and R2 may be combined to form a double bond or an aromatic or non-aromatic ring; X is an oxygen atom or a hydroxyl group. An invented method for modifying a polymer treats a polymer with an oxygen-atom-containing gas such as oxygen, carbon monoxide, a nitrogen oxide, or a sulfur oxide in the presence of the imide compound represented by the formula (1).

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1

Abstract: A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.

Abstract: The photoresist resin composition comprises a polymer having an adamantane skeleton represented by the following formula and a photoactive acid precursor: wherein R1 represents a hydrogen atom or a methyl group; R2, R3, and R4 are the same or different from each other, each representing a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group, a hydroxylmethyl group, a carboxyl group, a functional group which forms a hydroxyl group, a hydroxymethyl group or a carboxyl group by elimination with an acid; at least one of the substituents R2 to R4 is the functional group defined above; X represents an ester bond or an amide bond; and each of m and n is 0 or 1. The above photoresist resin composition is highly resistant to an etching solution, solubilizable by irradiation with light, and capable of giving minute patterns.

Abstract: There are disclosed a metal-organic polymer composite structure, particularly a porous metal-organic polymer composite structure, for use as functional materials such as catalysts, and a method for producing the structure. The composite structure is composed of a microphase-separated structure from a block copolymer in which a metalphilic polymer chain and a metalphobic polymer chain are bonded together at each end, and ultrafine metal particles are contained in the metalphilic polymer phase of the microphase-separated structure.

Abstract: A printing plate material producing prints with inhibited background staining is provided by formation of a photosensitive layer comprising nitrocellulose, a black coloring agent, e.g. carbon black, and an organic binder and having (1) a surface roughness of not greater than Rmax. 2.0 .mu.m or (2) a surface tension equivalent to a wettability index of not greater than 36 dyn/cm on a support. The nitrocellulose has a nitrogen content of 11 to 12.5% and a solution viscosity of about 1 to 1/8 second. The organic binder includes polyester resins such as solvent-soluble, noncrystal-line, linear, oil-free aromatic polyesters. Based on 100 parts by weight of the organic binder, the amount of nitrocellulose is about 5 to 300 parts by weight and that of the black coloring agent is about 0.5 to 50 parts by weight. The photosensitive layer may contain a crosslinking agent, e.g. melamine resin, and/or a water repellent, e.g. a silicone compound or a fluorine-containing compound.

Abstract: A cartridge case for a disk in which an optical disk is adapted to be rotatably housed in the case provided in both lateral sides thereof with openings and at an end thereof with a guide groove, and in which a slider having a shutter for opening and closing the openings of the case with the use of opening pins, is slidably disposed in the guide groove. The guide groove has a V-shape section in order to enhance the strength of the guide walls. To smoothly reciprocate the shutter, either the shutter or the slider is provided at an end thereof with a wide inclined surface which is fit for the guide groove and inclined toward the inside thereof.

Abstract: A method and device for cleaning the surface of an optical high density information recording carrier. The surface of the carrier is contacted with a fluffy material having a compression resiliency under a load of 200 g of at least 40% and the carrier and the fluffy material are moved relative to each other. The device for cleaning the surface of the carrier includes a support having a fluffy material secured thereto.