Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

Abstract: A chemically amplified positive resist composition is provided comprising (A) a polymer adapted to tarn soluble in alkaline aqueous solution under the action, of acid, (B) a photoacid generator, (C) a car boxy lie acid, and (D) a benzotriazole compound and/or an imidazole compound. When the resist composition is coated on a copper substrate as a thick film of 5-250 ?m thick and lithographically processed into a pattern, a high resolution is available and the pattern is of rectangular profile.

Abstract: A breast imaging apparatus includes a gantry which includes a radiation generation unit configured to generate a radiation and a radiation detection unit configured to detect the radiation generated from the radiation generation unit, and a support leg portion configured to support the gantry on a floor. The radiation generation unit and the radiation detection unit are capable of rotating in a state where the radiation generation unit and the radiation detection unit face each other. The support leg portion has a recess portion to insert feet of a subject.

Abstract: A breast imaging apparatus includes a gantry which includes a radiation generation unit configured to generate radiation and a radiation detection unit configured to detect radiation generated by the radiation generation unit, the radiation generation unit and the radiation detection unit being capable of rotating facing each other, wherein the gantry is provided with a front cover configured to protect a subject from the radiation generation unit and the radiation detection unit which rotate during CT imaging, and the front cover has an opening in which the breast of the subject is inserted, and a breast holding portion configured to hold the breast of the subject inserted in the opening.

Abstract: A chemically amplified positive resist composition is provided comprising a substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, a poly(meth)acrylate polymer having Mw of 1,000-500,000, and an acid generator in a solvent. The composition forms on a substrate a resist film of 5-100 ?m thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.

Abstract: A positive resist composition comprising an organosiloxane-modified novolak resin, a photosensitive agent, and an organic solvent is provided, the resin comprising structural units having formula (1) wherein R1 is an organosiloxy group, and R2 is hydrogen or alkyl. The composition is photosensitive, turns alkali soluble in the exposed region, eliminates any film thickness loss after development, and displays improved resistance to electrolytic plating and O2 dry etching.

Abstract: A chemically amplified positive resist dry film to be formed on a support film contains 5-40 wt % of a component having a boiling point of 55-250° C. under atmospheric pressure. The resist dry film having flexibility and dimensional stability can be prepared through simple steps. The resist dry film can be efficiently and briefly laid on an article and processed to form a pattern.

Abstract: An organosiloxane-modified novolak resin comprising structural units having formula (1) wherein R1 is an organosiloxy group having a monovalent C1-C10 hydrocarbon group bonded to silicon, and R2 is H or C1-C4 alkyl or alkoxy. The resin has high heat resistance and high strength inherent to novolak resins and low stress inherent to organosilicon compounds.

Abstract: A ceramic joined body includes a first silicon-carbide based sintered body; and a second silicon-carbide based sintered body, the first silicon-carbide based sintered body and the second silicon-carbide based sintered body being joined together by a joining layer, the joining layer being coated by a first coating layer containing metallic silicon as a main component, the first coating layer being disposed over the first silicon-carbide based sintered body and the second silicon-carbide based sintered body. Further, a flow passage body includes the ceramic joined body provided with a passage.

Abstract: A positive resist composition comprising an organosiloxane-modified novolak resin, a photosensitive agent, and an organic solvent is provided, the resin comprising structural units having formula (1) wherein R1 is an organosiloxy group, and R2 is hydrogen or alkyl. The composition is photosensitive, turns alkali soluble in the exposed region, eliminates any film thickness loss after development, and displays improved resistance to electrolytic plating and O2 dry etching.

Abstract: A chemically amplified positive resist composition is provided comprising a substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, a poly(meth)acrylate polymer having Mw of 1,000-500,000, and an acid generator in a solvent. The composition forms on a substrate a resist film of 5-100 ?m thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.

Abstract: An ultrasonic diagnostic device including: an image acquirer for acquiring an ultrasonic image of an object from ultrasonic waves received by an ultrasonic probe; an image memory for preliminary memorizing a volume data of the object, which is acquired by an image diagnostic device; a first positional detector for detecting 3-dimensional information of the ultrasonic probe; an tomogram obtainer for obtaining a tomogram of the image diagnostic device, in which positions of the tomogram and the ultrasonic image correspond, based on a positional information from the first positional detector; a display for displaying the ultrasonic image and the tomogram; wherein the ultrasonic image device further including, a selector for selecting predetermined angles of a puncture needle, where angles can be set at fixed values, and the display displays a guideline of the puncture needle on at least one of the ultrasonic image and the tomogram.

Abstract: A resin structure for the formation of a micro-structure is manufactured by (A) applying a composition comprising a polymer, a photoacid generator, an epoxy compound, and an organic solvent onto a substrate, (B) heating the composition to form a sacrificial film, (C) exposing imagewise the film to first high-energy radiation, (D) developing the film in an alkaline developer to form a sacrificial film pattern, (E) exposing the sacrificial film pattern to UV as second high-energy radiation, and (F) heating the substrate at 80-250° C. The exposure dose of first high-energy radiation in step (C) is up to 250 mJ/cm2. At the end of step (F), the sacrificial film has a sidewall angle of 80°-90° relative to the substrate.

Abstract: A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.

Abstract: A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.

Abstract: An organosiloxane-modified novolak resin comprising structural units having formula (1) wherein R1 is an organosiloxy group having a monovalent C1-C10 hydrocarbon group bonded to silicon, and R2 is H or C1-C4 alkyl or alkoxy. The resin has high heat resistance and high strength inherent to novolak resins and low stress inherent to organosilicon compounds.

Abstract: A resin structure for the formation of a micro-structure is manufactured by (A) applying a composition comprising a polymer, a photoacid generator, and an organic solvent onto a substrate, (B) heating the composition to form a sacrificial film, (C) exposing imagewise the film to first high-energy radiation, (D) developing the film in an alkaline developer to form a sacrificial film pattern, (E) exposing the sacrificial film pattern to UV as second high-energy radiation, and (F) heating the substrate at 100-250° C. The exposure dose of first high-energy radiation in step (C) is up to 250 mJ/cm2. At the end of step (F), the sacrificial film has a sidewall angle of 80°-90° relative to the substrate.

Abstract: A mobile ultrasonic diagnostic device comprising: a battery (30); a storage processing unit (38) that performs storage processing of data used by the mobile ultrasonic diagnostic device; a high-speed storage unit (80) that performs storage processing faster than the storage processing unit (38); and a storage processing determination unit (36) that determines the storage processing on the basis of the temperature or remaining power of the battery (30). Data can be safely used without loss even when there is the possibility that power cannot be supplied from the battery, as a result of the storage processing unit (38) and the high-speed storage unit (80) performing storage processing on the basis of the storage processing determined by the storage processing determination unit (36).

Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.