Abstract: A transmitting method includes: configuring a frame using a plurality of orthogonal frequency-division multiplexing (OFDM) symbols, by allocating time resources and frequency resources to a plurality of transmission data; and transmitting the frame, wherein the frame includes a first period in which a preamble which includes information on a frame configuration of the frame is transmitted, and a second period in which the plurality of transmission data are transmitted by at least one of time division and frequency division, and among the plurality of OFDM symbols, OFDM symbols included in the second period include pilot symbols arranged along a time axis with a predetermined spacing therebetween, and a predetermined number of data symbols.

Abstract: A transmitting method includes: configuring a frame using a plurality of orthogonal frequency-division multiplexing (OFDM) symbols, by allocating a plurality of transmission data to a plurality of areas; and transmitting the frame. The plurality of areas are each identified by at least one time resource among resources and at least one frequency resource among frequency resources. The frame includes a first period in which a preamble is transmitted, and a second period in which the plurality of transmission data are transmitted by at least one of time division and frequency division. The second period includes a first area, and the first area includes a data symbol generated from first transmission data, a data symbol generated from second transmission data and subsequent to the data symbol generated from the first transmission data, and a dummy symbol subsequent to the data symbol generated from the second transmission data.

Abstract: An actuator of an airbag device includes a main body portion, which is attached to an attachment base, and a cap including a fitting protruding portion that is inserted into a fitting recessed portion of the main body portion. The fitting protruding portion has a holding portion, which is inserted into a holding hole of a coupling member when fitted to the main body portion and holds a leading end portion of the coupling member, and a movement permitting unit that, when a ceiling portion of the cap is subjected to pressure of a combustion gas of a squib, causes the ceiling portion to move, and causes the holding portion to move from a holding position, wherein the holding portion is inserted into the holding hole of the coupling member, to a holding released position, wherein the holding portion is removed from the holding hole.

Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.

Abstract: A cell culture container characterized by being equipped with a container main body and a flat plate attached onto one surface of the container main body, wherein the container main body is equipped with an inflow port through which a liquid can flow into the container main body, a passage through which the liquid flowing into the container main body from the inflow port can pass, and an outflow port through which the liquid passing through the passage can flow out from the container main body, and wherein, on the bottom surface of the passage, multiple cell-seeding areas in which cells passing through the passage can be seeded are arranged side by side along the passage.

Abstract: A cell culture container characterized by being equipped with a container main body and a flat plate attached onto one surface of the container main body, wherein the container main body is equipped with an inflow port through which a liquid can flow into the container main body, a passage through which the liquid flowing into the container main body from the inflow port can pass, and an outflow port through which the liquid passing through the passage can flow out from the container main body, and wherein, on the bottom surface of the passage, multiple cell-seeding areas in which cells passing through the passage can be seeded are arranged side by side along the passage.

Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.

Abstract: The present invention is an imprint system including an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, the imprint system including: a substrate carry-in/out station connected to the imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of the imprint unit side; and a template carry-in/out station connected to the imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the imprint unit side at a predetermined timing.

Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.

Abstract: The present invention provides a method for inhibiting production of copper sulfide in an electrical insulating oil inside an oil-filled electrical apparatus, including adding a benzotriazole compound not having a long-chain alkyl group when the oil-filled electrical apparatus is an open-type oil-filled electrical apparatus, or adding a benzotriazole compound having a long-chain alkyl group when the oil-filled electrical apparatus is a closed-type oil-filled electrical apparatus.

Abstract: Print job data is generated in accordance with a printing instruction from an application. When encryption of the print job data is designated, the generated print job data is encrypted, and the generated or encrypted print job data is output. When a printing apparatus serving as an output destination to which the encrypted print job data is output does not have a decryption function of decrypting the encrypted print job data, the output destination is changed to a decryption apparatus having the decryption function. When designation to save the print job data in the printing apparatus is detected in encryption, the print job is canceled.

Abstract: A technique for providing a first information processing apparatus configured to acquire first identification information as information for identifying the information processing apparatus, searching for a second information processing apparatus capable of wireless communication, acquiring a second identification information as information for identifying the second information processing apparatus that was found, comparing the first identification information and the second identification information, changing the first identification information when the first identification information and the second identification information are identical, and notifying when the first identification information is changed.

Abstract: The present invention provides a method for inhibiting production of copper sulfide in an electrical insulating oil inside an oil-filled electrical apparatus, including adding a benzotriazole compound not having a long-chain alkyl group when the oil-filled electrical apparatus is an open-type oil-filled electrical apparatus, or adding a benzotriazole compound having a long-chain alkyl group when the oil-filled electrical apparatus is a closed-type oil-filled electrical apparatus.

Abstract: A print system which are capable of inhibiting simultaneous use of the encrypted print and the box storage to thereby increase the security of print data. A host computer has an encryption function of encrypting print data, and issues a print job for the print data encrypted by the encryption function. A print server receives the issued print job, and has a decryption function of decrypting the encrypted print data of the received print job. A printer has a storage function of storing the print data decrypted by the decryption function, and outputs the stored print data. At least one of the host computer and the print server inhibits simultaneous use of the encryption function and the storage function.

Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

Abstract: An actuator 10 includes a main body 14 having a displacement unit 11 and electrodes 12 and 13 configured to apply a voltage to the displacement unit 11, the displacement unit being made of a mixture of a silicone-containing elastomer and an ionic liquid, and being displaced by applying a voltage between the electrodes; and a displacement transmission unit 15 configured to be displaced in an out-of-plane direction by displacement of the displacement unit 11.