Patents by Inventor Yoshio Morishige

Yoshio Morishige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8559000
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: October 15, 2013
    Assignees: Hitachi High-Technologies Corporation, Hitachi, Ltd.
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 8422009
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Grant
    Filed: July 12, 2011
    Date of Patent: April 16, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
  • Publication number: 20120312104
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: August 23, 2012
    Publication date: December 13, 2012
    Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 8274651
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: September 25, 2012
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Publication number: 20120006131
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: September 16, 2011
    Publication date: January 12, 2012
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Publication number: 20110267605
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Application
    Filed: July 12, 2011
    Publication date: November 3, 2011
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
  • Patent number: 8040503
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: January 5, 2010
    Date of Patent: October 18, 2011
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 7986405
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: July 26, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
  • Patent number: 7940383
    Abstract: A method for detecting defects on an object includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the object and white-color, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the object and passed through a filter which blocks diffraction light resulting from patterns formed on the object, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the object, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: May 10, 2011
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuyai Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Publication number: 20100195095
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Application
    Filed: April 12, 2010
    Publication date: August 5, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki YAMASHITA, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
  • Publication number: 20100140474
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: January 5, 2010
    Publication date: June 10, 2010
    Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 7719671
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Grant
    Filed: February 23, 2007
    Date of Patent: May 18, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima
  • Publication number: 20100088042
    Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the specimen, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks diffraction light resulting from patterns formed on the specimen, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the specimen, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
    Type: Application
    Filed: December 3, 2009
    Publication date: April 8, 2010
    Inventors: Minori NOGUCHI, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuyai Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Patent number: 7692779
    Abstract: An apparatus for detecting defects on a specimen including an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: April 6, 2010
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuya Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Patent number: 7643138
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: January 5, 2010
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 7639350
    Abstract: A method for detecting defects on a specimen includes mounting a specimen on a table with which is movable, obliquely projecting a laser as a line onto a surface of the specimen, detecting with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks scattered light resulting from repetitive patterns formed on the specimen, processing a signal outputted from the image sensor to extract defects of the specimen, and a displaying information of defects extracted by the signal processor.
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: December 29, 2009
    Assignees: Hitachi, Ltd, Hitachi High-Technologies Corporation
    Inventors: Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuya Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Publication number: 20080291437
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: July 30, 2008
    Publication date: November 27, 2008
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 7443496
    Abstract: A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: October 28, 2008
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuya Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Patent number: 7417723
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: August 26, 2008
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Publication number: 20070201019
    Abstract: In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
    Type: Application
    Filed: February 23, 2007
    Publication date: August 30, 2007
    Inventors: Hiroyuki Yamashita, Mamoru Kobayashi, Eiji Imai, Yoshio Morishige, Koichi Nagoya, Hideki Fukushima