Patents by Inventor Yoshio Shimura
Yoshio Shimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8492466Abstract: A friction material including: an amorphous resin that has a chain-like polymer structure; and other components that constitute the friction material and that are components other than the amorphous resin, wherein dispersion treatment is preliminarily carried out in which the amorphous resin is dispersed in at least one of the other components, and a manufacturing method of the friction material.Type: GrantFiled: October 8, 2009Date of Patent: July 23, 2013Assignee: Toyota Jidosha Kabushiki KaishaInventors: Kenji Abe, Masaaki Nishiwaki, Hiroshi Isono, Hiroyuki Fujikawa, Satoshi Wakamatsu, Yoshio Shimura, Yuji Nagasawa
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Patent number: 8469161Abstract: A friction couple including: a first friction member that contains a metallic material and includes a first friction surface; and a second friction member that includes a second friction surface that contacts the first friction surface and that contains an oxidation film developer that accelerates formation of an oxidation film on at least one of the first friction surface and the second friction surface by oxidizing the metallic material when the first friction surface and the second friction surface contact each other.Type: GrantFiled: October 9, 2009Date of Patent: June 25, 2013Assignees: Toyota Jidosha Kabushiki Kaisha, Advics Co., Ltd.Inventors: Kenji Abe, Masaaki Nishiwaki, Hiroshi Isono, Hiroyuki Fujikawa, Satoshi Wakamatsu, Yoshio Shimura, Yuji Nagasawa
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Patent number: 8247472Abstract: A friction material including: an amorphous resin that has a chain-like polymer structure; and other components that constitute the friction material and that are components other than the amorphous resin, wherein dispersion treatment is preliminarily carried out in which the amorphous resin is dispersed in at least one of the other components, and a manufacturing method of the friction material.Type: GrantFiled: July 29, 2011Date of Patent: August 21, 2012Assignee: Toyota Jidosha Kabushiki KaishaInventors: Kenji Abe, Masaaki Nishiwaki, Hiroshi Isono, Hiroyuki Fujikawa, Satoshi Wakamatsu, Yoshio Shimura, Yuji Nagasawa
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Publication number: 20110281962Abstract: A friction material including: an amorphous resin that has a chain-like polymer structure; and other components that constitute the friction material and that are components other than the amorphous resin, wherein dispersion treatment is preliminarily carried out in which the amorphous resin is dispersed in at least one of the other components, and a manufacturing method of the friction material.Type: ApplicationFiled: July 29, 2011Publication date: November 17, 2011Applicant: Toyota Jidosha Kabushiki KaishaInventors: Kenji Abe, Masaaki Nishiwaki, Hiroshi Isono, Hiroyuki Fujikawa, Satoshi Wakamatsu, Yoshio Shimura, Yuji Nagasawa
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Publication number: 20100174010Abstract: A friction material including: an amorphous resin that has a chain-like polymer structure; and other components that constitute the friction material and that are components other than the amorphous resin, wherein dispersion treatment is preliminarily carried out in which the amorphous resin is dispersed in at least one of the other components, and a manufacturing method of the friction material.Type: ApplicationFiled: October 8, 2009Publication date: July 8, 2010Applicant: Toyota Jidosha Kabushiki KaishaInventors: Kenji ABE, Masaaki NISHIWAKI, Hiroshi ISONO, Hiroyuki FUJIKAWA, Satoshi WAKAMATSU, Yoshio SHIMURA, Yuji NAGASAWA
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Publication number: 20100163353Abstract: A friction couple including: a first friction member that contains a metallic material and includes a first friction surface; and a second friction member that includes a second friction surface that contacts the first friction surface and that contains an oxidation film developer that accelerates formation of an oxidation film on at least one of the first friction surface and the second friction surface by oxidizing the metallic material when the first friction surface and the second friction surface contact each other.Type: ApplicationFiled: October 9, 2009Publication date: July 1, 2010Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, ADVICS CO., LTD.Inventors: Kenji ABE, Masaaki Nishiwaki, Hiroshi Isono, Hiroyuki Fujikawa, Satoshi Wakamatsu, Yoshio Shimura, Yuji Nagasawa
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Patent number: 7368168Abstract: A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 ?m or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.Type: GrantFiled: April 27, 2005Date of Patent: May 6, 2008Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Hiroyuki Mori, Fumio Shimizu, Hideo Tachikawa, Toshihide Ohmori, Hiroshi Moritani, Mamoru Tohyama, Yoshio Shimura, Shigeru Hotta, Takashi Iseki
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Publication number: 20060283672Abstract: A friction device includes at least one pair of sliding surfaces which are brought into contact with each other. The friction device comprises a friction material containing silicon carbide, and a mate material in which a cermet layer containing tungsten carbide is formed in a sliding surface of the mate material.Type: ApplicationFiled: November 16, 2005Publication date: December 21, 2006Applicants: Toyota Jidosha Kabushiki Kaisha, Advics Co., Ltd.Inventors: Satoru Tsurubuchi, Hitoshi Ikeuchi, Masaaki Nishiwaki, Shigeru Ichikawa, Hiroyuki Fujikawa, Satoshi Wakamatsu, Tatsuhisa Kubota, Yuji Nagasawa, Kazunori Yoshida, Yoshio Shimura, Shigeru Hotta
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Publication number: 20050238877Abstract: A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 ?m or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.Type: ApplicationFiled: April 27, 2005Publication date: October 27, 2005Applicant: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHOInventors: Hiroyuki Mori, Fumio Shimizu, Hideo Tachikawa, Toshihide Ohmori, Hiroshi Moritani, Mamoru Tohyama, Yoshio Shimura, Shigeru Hotta, Takashi Iseki
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Patent number: 6844444Abstract: There is disclosed a 1H-pyrrole-[1,2-b][1,2,4]triazole compound represented by formula (I): wherein R is an alkyl group; R1, R2, R3, R1?, R2?, and R3? each are a hydrogen atom or an alkyl group; R1 and R2, and R1? and R2? may bond together to form a ring, respectively; R4 is a hydrogen atom or an alkyl group, and X is heterocyclic group, a substituted amino group, or an aryl group. The compound is useful as a photographic cyan coupler. There is also disclosed synthetic intermediates of the compound and a production method of the intermediates.Type: GrantFiled: February 4, 2002Date of Patent: January 18, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuhiro Shimada, Hideki Maeta, Yoshio Shimura
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Patent number: 6492100Abstract: A silver halide color photographic lightsensitive material comprising at least one photosensitive silver halide emulsion layer on a support, wherein the emulsion layer contains a magenta coupler represented by formula (M-1) below: wherein R1 represents a substituted or nonsubstituted alkyl group, each of L1 and L2 independently represents a substituted or nonsubstituted alkylene group, or substituted or nonsubstituted arylene group, in —L3—G, L3 represents —NH—SO2— or —SO2—NH—CO— (in these representations, bonding direction is not defined) and G represents a substituted or nonsubstituted alkyl group or substituted or nonsubstituted aryl group, alternatively —L3—G represents —COOH or OH, X represents a hydrogen atom or a group which splits off when coupling with an oxidized form of a developing agent, n represents 1 or 2, when L2 is an alkylene group, or n represents an integer from 1 to 5, when L2 is an arylene group, anType: GrantFiled: August 8, 2001Date of Patent: December 10, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Hisashi Mikoshiba, Yoshio Shimura, Naoto Matsuda, Hiroshi Fukuzawa
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Patent number: 6468729Abstract: Disclosed is a silver halide color photographic light-sensitive material comprising at least one silver halide emulsion layer on a support, said at least one emulsion layer containing a magenta coupler represented by formula (M-1): where R1 represents a substituted or unsubstituted alkyl group, each of L1 and L2 independently represents a substituted or unsubstituted alkylene group, or a substituted or unsubstituted arylene group, and A represents a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkyl group, with the proviso that A is neither a 2-octyloxy-5-tert-octylphenyl group nor a 2-(4-methylphenoxy)ethoxy-5-tert-octylphenyl group.Type: GrantFiled: March 7, 2001Date of Patent: October 22, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Yoshio Shimura, Hiroshi Fukuzawa, Hisashi Mikoshiba
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Patent number: 6451517Abstract: A silver halide color photographic lightsensitive material includes at least one emulsion layer on a support. At least one of the emulsion layers contains a coupler represented by formula (1) below and a coupler represented by formula (2) below at a molar ratio of 1:9 to 9:1. In formulas (1) and (2), each of R1, R2, R3, and R4 independently represents a hydrogen atom or a substituent. Each of X1 and X2 represents a hydrogen atom or a group capable splitting off by coupling with the oxidized form of a developing agent. At least one of X1 and X2 is a hydrogen atom.Type: GrantFiled: November 17, 2000Date of Patent: September 17, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Hiroshi Fukuzawa, Hisashi Mikoshiba, Yoshio Shimura
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Publication number: 20020107399Abstract: There is disclosed a 1H-pyrrolo-[1,2-b] [1,2,4]triazole compound represented by formula (I): 1Type: ApplicationFiled: February 4, 2002Publication date: August 8, 2002Applicant: Fuji Photo Film Co., Ltd.Inventors: Yasuhiro Shimada, Hideki Maeta, Yoshio Shimura
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Publication number: 20020081540Abstract: A silver halide color photosensitive material comprising each at least one blue-, green-, and red-sensitive emulsion layer on a support.Type: ApplicationFiled: July 3, 2001Publication date: June 27, 2002Applicant: Fuji Photo Film Co., Ltd.Inventors: Hisashi Mikoshiba, Yoshio Shimura, Naoto Matsuda
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Patent number: 6391533Abstract: A silver halide color photosensitive material comprising each at least one blue-, green-, and red-sensitive emulsion layer on a support.Type: GrantFiled: July 3, 2001Date of Patent: May 21, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Hisashi Mikoshiba, Yoshio Shimura, Naoto Matsuda
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Patent number: 6384219Abstract: There is disclosed a 1H-pyrrolo-[1,2-b][1,2,4]triazole compound represented by formula (I): wherein R is an alkyl group; R1, R2, R3, R1′, R2′, and R3′ each are a hydrogen atom or an alkyl group; R1 and R2, and R1′ and R2′ may bond together to form a ring, respectively; R4 is a hydrogen atom or an alkyl group, and X is heterocyclic group, a substituted amino group, or an aryl group. The compound is useful as a photographic cyan coupler. There is also disclosed synthetic intermediates of the compound and a production method of the intermediates.Type: GrantFiled: January 7, 1998Date of Patent: May 7, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuhiro Shimada, Hideki Maeta, Yoshio Shimura
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Publication number: 20020051948Abstract: A silver halide color photographic lightsensitive material comprising at least one photosensitive silver halide emulsion layer on a support, wherein the emulsion layer contains a magenta coupler represented by formula (M-1) below: 1Type: ApplicationFiled: August 8, 2001Publication date: May 2, 2002Inventors: Hisashi Mikoshiba, Yoshio Shimura, Naoto Matsuda, Hiroshi Fukuzawa
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Patent number: 6379878Abstract: A silver halide color photosensitive material having at least one blue-sensitive emulsion layer, at least one green-sensitive emulsion layer, and at least one red-sensitive emulsion layer on a support, wherein the red-sensitive emulsion layer has the maximum value of sensitivity in a wavelength region of 580 nm to 650 nm, and the green-sensitive emulsion layer contains at least one magenta coupler represented by formula (MC-1) below: wherein the substituent are defined herein the specification.Type: GrantFiled: May 26, 2000Date of Patent: April 30, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Naoto Matsuda, Yoshio Shimura, Tetsuo Nakamura, Hisashi Mikoshiba
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Patent number: 6309759Abstract: A sliding bearing, which comprises a lining and a bismuth or bismuth-alloy overlay having improved compatibility and fatigue resistance is provided. The overlay is characterized by the following orientation. The relative ratio of the X-ray diffraction intensity I[hkl] of the bismuth or bismuth-alloy overlay defined below satisfies the following conditions (a) and (b): (a) the relative ratio of the X-ray diffraction intensity I[hkl] of planes other than the {012} planes is from 0.2 to 5 times as high as the ratio of the X-ray diffraction intensity I[012], namely, 0.2I[012]≦I[hkl]≦5I[012] (b) the relative ratio of the X-ray diffraction intensity I[hkl] of three or more planes other than {012} planes ranges from 0.5 to 2 times as high as the ratio of the X-ray diffraction intensity I[012], namely, 0.5I[012]≦2I[012].Type: GrantFiled: July 7, 2000Date of Patent: October 30, 2001Inventors: Takashi Tomikawa, Hirofumi Michioka, Yoshio Fuwa, Yoshio Shimura, Shigeru Hotta