Patents by Inventor Yoshio Takahashi
Yoshio Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240133442Abstract: A spring member is provided between two pressed bodies facing each other in a first direction and includes base plates stacked in the first direction. Each base plate is provided with spring protrusions protruding toward either one pressed body of the two pressed bodies and pressing the two pressed bodies in directions such that the pressed bodies move away from each other in the first direction. Between two base plates adjacent to each other in the first direction, a base plate positioned closer to the one pressed body is provided with an insertion hole into which a spring protrusion of the other base plate is inserted in a state of penetrating therethrough in the first direction. Among portions in an along-plane direction along a plane orthogonal to the first direction provided with the spring protrusions, the spring constant of at least one portion is different from that of another portion.Type: ApplicationFiled: February 25, 2022Publication date: April 25, 2024Inventors: Yoshio YAMADA, Hironobu IMAIZUMI, Norihiro TAJIMA, Shuji TAKAHASHI
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Publication number: 20240043704Abstract: The anti-fog coating according to one aspect of the present invention contains a resin component (A) having a structural unit based on a (meth)acrylamide-based monomer represented by CH2?CH—CO—NR1R2 and a structural unit based on at least one hydrophobic monomer selected from the group consisting of (meth)acrylate-based monomers having a hydrocarbon group and styrene-based monomers, and an amorphous silica (B) having an average primary particle size of not more than 60 nm, wherein the proportion of structural units based on the (meth)acrylamide-based monomer relative to the total of all the structural units that constitute the resin component (A) is within a range from 30 to 75% by mass, and the proportion of the amorphous silica (B) relative to the total mass of the resin component (A) and the amorphous silica (B) is within a range from 74 to 87% by mass.Type: ApplicationFiled: January 24, 2022Publication date: February 8, 2024Inventors: Yoshio Takahashi, Hidenobu Hirosawa
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Publication number: 20240021406Abstract: There is provided a phase-image processing apparatus and a phase-image processing method capable of highly accurately correcting a phase singularity included in a phase image. A phase-image processing apparatus that applies image processing to a phase image includes: a fringe pattern-creating unit that creates a plurality of fringe patterns based on a first interference fringe image corresponding to a first phase image including a phase singularity; a patch image-creating unit that creates a patch image based on the fringe pattern; an interference fringe image correcting unit that pastes the patch image to an area of the first interference fringe image corresponding to the phase singularity, corrects the first interference fringe image, and creates a second interference fringe image; and a phase image correcting unit that creates a second phase image from the second interference fringe image.Type: ApplicationFiled: February 8, 2023Publication date: January 18, 2024Inventors: Yoshio TAKAHASHI, Tetsuya AKASHI, Toshiaki TANIGAKI
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Publication number: 20210110992Abstract: In an image collection system using a transmission electron microscope, a useless collection time to be spent collecting images in each of which particles overlap each other or no particle is contained, and a date volume are reduced. The image collection system includes: a control unit that moves an observation field of view in the transmission electron microscope and overlaps each other electron waves that propagate through spatially different portions within the observation field of view; a photographing unit that acquires the overlapped electron waves as an observation image; and a determination unit that determines whether a particle is present within the observation field of view.Type: ApplicationFiled: October 2, 2020Publication date: April 15, 2021Applicant: HITACHI, LTD.Inventors: Yoshio TAKAHASHI, Tetsuya AKASHI
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Patent number: 10872743Abstract: Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.Type: GrantFiled: July 9, 2018Date of Patent: December 22, 2020Assignee: HITACHI, LTD.Inventors: Akira Sugawara, Yoshio Takahashi, Tetsuya Akashi, Toshiaki Tanigaki
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Patent number: 10323785Abstract: A holder for a tablet, comprising a plate having a flat, planar front side for placing a tablet thereon, and a backside. The plate is generally rectangular in shape and having four corners with rotatable retention members disposed at three of the four corners. Each of the retention members are seated in a notch of the plate and all the retention members are rotatable to a position to form a continuous, flat surface along the plate and are rotatable to positions to retain a tablet on the holder.Type: GrantFiled: May 19, 2017Date of Patent: June 18, 2019Inventor: Yoshio Takahashi
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Publication number: 20190027338Abstract: Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.Type: ApplicationFiled: July 9, 2018Publication date: January 24, 2019Applicant: HITACHI, LTD.Inventors: Akira SUGAWARA, Yoshio TAKAHASHI, Tetsuya AKASHI, Toshiaki TANIGAKI
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Patent number: 9773640Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.Type: GrantFiled: July 28, 2015Date of Patent: September 26, 2017Assignee: Hitachi, Ltd.Inventors: Tomokazu Shimakura, Yoshio Takahashi, Hideo Kashima
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Patent number: 9601306Abstract: A sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.Type: GrantFiled: March 9, 2015Date of Patent: March 21, 2017Assignee: Hitachi, Ltd.Inventors: Naruo Watanabe, Yoshio Takahashi
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Patent number: 9404013Abstract: The object of the present invention is to provide a coating composition which can provide a coating film having excellent adhesion to a chromium thin film under various conditions, and sufficient scratch resistance, and the present invention provides a coating composition for a chromium thin film formed on a substrate, wherein the coating composition includes: an acrylic copolymer (A) having a phosphate group and a hydroxyl group other than a hydroxyl group in the phosphate group; isocyanate (B); and a metal chelate (C).Type: GrantFiled: August 9, 2012Date of Patent: August 2, 2016Assignee: Fujikura Kasei Co., Ltd.Inventors: Yoshio Takahashi, Toshiaki Okazaki
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Publication number: 20160035535Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.Type: ApplicationFiled: July 28, 2015Publication date: February 4, 2016Inventors: Tomokazu SHIMAKURA, Yoshio TAKAHASHI, Hideo KASHIMA
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Patent number: 9208990Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.Type: GrantFiled: May 22, 2012Date of Patent: December 8, 2015Assignee: Hitachi High-Technologies CorporationInventors: Hirokazu Tamaki, Yoshio Takahashi, Hiroto Kasai, Hiroyuki Kobayashi
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Publication number: 20150255246Abstract: Provided is a sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism is also provided. In the charged particle device, the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.Type: ApplicationFiled: March 9, 2015Publication date: September 10, 2015Inventors: Naruo Watanabe, Yoshio Takahashi
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Patent number: 9070532Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: GrantFiled: April 24, 2014Date of Patent: June 30, 2015Assignee: Hitachi, Ltd.Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Publication number: 20140319371Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: ApplicationFiled: April 24, 2014Publication date: October 30, 2014Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Publication number: 20140224988Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.Type: ApplicationFiled: May 22, 2012Publication date: August 14, 2014Inventors: Hirokazu Tamaki, Yoshio Takahashi, Hiroto Kasai, Hiroyuki Kobayashi
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Patent number: 8785851Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.Type: GrantFiled: May 23, 2013Date of Patent: July 22, 2014Assignees: Hitachi, Ltd., RikenInventors: Toshiaki Tanigaki, Shinji Aizawa, Tsuyoshi Matsuda, Ken Harada, Yoshio Takahashi
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Patent number: 8772715Abstract: An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on an objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen.Type: GrantFiled: April 25, 2013Date of Patent: July 8, 2014Assignees: Hitachi, Ltd., RikenInventors: Toshiaki Tanigaki, Shinji Aizawa, Tsuyoshi Matsuda, Ken Harada, Yoshio Takahashi
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Publication number: 20140121317Abstract: The object of the present invention is to provide a coating composition which can provide a coating film having excellent adhesion to a chromium thin film under various conditions, and sufficient scratch resistance, and the present invention provides a coating composition for a chromium thin film formed on a substrate, wherein the coating composition includes: an acrylic copolymer (A) having a phosphate group and a hydroxyl group other than a hydroxyl group in the phosphate group; isocyanate (B); and a metal chelate (C).Type: ApplicationFiled: August 9, 2012Publication date: May 1, 2014Applicant: FUJIKURA KASEI CO., LTD.Inventors: Yoshio Takahashi, Toshiaki Okazaki
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Publication number: 20130313432Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.Type: ApplicationFiled: May 23, 2013Publication date: November 28, 2013Inventors: Toshiaki TANIGAKI, Shinji AIZAWA, Tsuyoshi MATSUDA, Ken HARADA, Yoshio TAKAHASHI