Patents by Inventor Yoshio Takahashi

Yoshio Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240133442
    Abstract: A spring member is provided between two pressed bodies facing each other in a first direction and includes base plates stacked in the first direction. Each base plate is provided with spring protrusions protruding toward either one pressed body of the two pressed bodies and pressing the two pressed bodies in directions such that the pressed bodies move away from each other in the first direction. Between two base plates adjacent to each other in the first direction, a base plate positioned closer to the one pressed body is provided with an insertion hole into which a spring protrusion of the other base plate is inserted in a state of penetrating therethrough in the first direction. Among portions in an along-plane direction along a plane orthogonal to the first direction provided with the spring protrusions, the spring constant of at least one portion is different from that of another portion.
    Type: Application
    Filed: February 25, 2022
    Publication date: April 25, 2024
    Inventors: Yoshio YAMADA, Hironobu IMAIZUMI, Norihiro TAJIMA, Shuji TAKAHASHI
  • Publication number: 20240043704
    Abstract: The anti-fog coating according to one aspect of the present invention contains a resin component (A) having a structural unit based on a (meth)acrylamide-based monomer represented by CH2?CH—CO—NR1R2 and a structural unit based on at least one hydrophobic monomer selected from the group consisting of (meth)acrylate-based monomers having a hydrocarbon group and styrene-based monomers, and an amorphous silica (B) having an average primary particle size of not more than 60 nm, wherein the proportion of structural units based on the (meth)acrylamide-based monomer relative to the total of all the structural units that constitute the resin component (A) is within a range from 30 to 75% by mass, and the proportion of the amorphous silica (B) relative to the total mass of the resin component (A) and the amorphous silica (B) is within a range from 74 to 87% by mass.
    Type: Application
    Filed: January 24, 2022
    Publication date: February 8, 2024
    Inventors: Yoshio Takahashi, Hidenobu Hirosawa
  • Publication number: 20240021406
    Abstract: There is provided a phase-image processing apparatus and a phase-image processing method capable of highly accurately correcting a phase singularity included in a phase image. A phase-image processing apparatus that applies image processing to a phase image includes: a fringe pattern-creating unit that creates a plurality of fringe patterns based on a first interference fringe image corresponding to a first phase image including a phase singularity; a patch image-creating unit that creates a patch image based on the fringe pattern; an interference fringe image correcting unit that pastes the patch image to an area of the first interference fringe image corresponding to the phase singularity, corrects the first interference fringe image, and creates a second interference fringe image; and a phase image correcting unit that creates a second phase image from the second interference fringe image.
    Type: Application
    Filed: February 8, 2023
    Publication date: January 18, 2024
    Inventors: Yoshio TAKAHASHI, Tetsuya AKASHI, Toshiaki TANIGAKI
  • Publication number: 20210110992
    Abstract: In an image collection system using a transmission electron microscope, a useless collection time to be spent collecting images in each of which particles overlap each other or no particle is contained, and a date volume are reduced. The image collection system includes: a control unit that moves an observation field of view in the transmission electron microscope and overlaps each other electron waves that propagate through spatially different portions within the observation field of view; a photographing unit that acquires the overlapped electron waves as an observation image; and a determination unit that determines whether a particle is present within the observation field of view.
    Type: Application
    Filed: October 2, 2020
    Publication date: April 15, 2021
    Applicant: HITACHI, LTD.
    Inventors: Yoshio TAKAHASHI, Tetsuya AKASHI
  • Patent number: 10872743
    Abstract: Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: December 22, 2020
    Assignee: HITACHI, LTD.
    Inventors: Akira Sugawara, Yoshio Takahashi, Tetsuya Akashi, Toshiaki Tanigaki
  • Patent number: 10323785
    Abstract: A holder for a tablet, comprising a plate having a flat, planar front side for placing a tablet thereon, and a backside. The plate is generally rectangular in shape and having four corners with rotatable retention members disposed at three of the four corners. Each of the retention members are seated in a notch of the plate and all the retention members are rotatable to a position to form a continuous, flat surface along the plate and are rotatable to positions to retain a tablet on the holder.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: June 18, 2019
    Inventor: Yoshio Takahashi
  • Publication number: 20190027338
    Abstract: Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.
    Type: Application
    Filed: July 9, 2018
    Publication date: January 24, 2019
    Applicant: HITACHI, LTD.
    Inventors: Akira SUGAWARA, Yoshio TAKAHASHI, Tetsuya AKASHI, Toshiaki TANIGAKI
  • Patent number: 9773640
    Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.
    Type: Grant
    Filed: July 28, 2015
    Date of Patent: September 26, 2017
    Assignee: Hitachi, Ltd.
    Inventors: Tomokazu Shimakura, Yoshio Takahashi, Hideo Kashima
  • Patent number: 9601306
    Abstract: A sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: March 21, 2017
    Assignee: Hitachi, Ltd.
    Inventors: Naruo Watanabe, Yoshio Takahashi
  • Patent number: 9404013
    Abstract: The object of the present invention is to provide a coating composition which can provide a coating film having excellent adhesion to a chromium thin film under various conditions, and sufficient scratch resistance, and the present invention provides a coating composition for a chromium thin film formed on a substrate, wherein the coating composition includes: an acrylic copolymer (A) having a phosphate group and a hydroxyl group other than a hydroxyl group in the phosphate group; isocyanate (B); and a metal chelate (C).
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: August 2, 2016
    Assignee: Fujikura Kasei Co., Ltd.
    Inventors: Yoshio Takahashi, Toshiaki Okazaki
  • Publication number: 20160035535
    Abstract: An object of the present invention is to provide a sample holder that can carry out a series of observations in which a rotational series image at arbitrary angles, namely, from ?180° to +180° around the x-axis of an observation region and a rotational series image at arbitrary angles, namely, from ?180° to +180° around the y-axis are obtained without taking a sample out of a sample chamber. A sample holder includes a power unit, a power separator, a rotational movement transmission mechanism, and a linear movement transmission mechanism. The power separator separates one movement of the power unit to be distributed to the rotational movement transmission mechanism and the linear movement transmission mechanism. The rotational movement transmission mechanism provides a rotational movement around a second rotational axis. The linear movement transmission mechanism provides a linear movement around the second rotational axis.
    Type: Application
    Filed: July 28, 2015
    Publication date: February 4, 2016
    Inventors: Tomokazu SHIMAKURA, Yoshio TAKAHASHI, Hideo KASHIMA
  • Patent number: 9208990
    Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: December 8, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hirokazu Tamaki, Yoshio Takahashi, Hiroto Kasai, Hiroyuki Kobayashi
  • Publication number: 20150255246
    Abstract: Provided is a sample micromotion mechanism adapted to minimize an influence of a disturbance and adjust a sample drift rapidly and with high accuracy, and designed so as to be a compact, easy-to-place sample micromotion mechanism of a side-entry type that suppresses the occurrence of the sample drift and generates/displays high-resolution monitoring images and precisely drawn patterns. A charged particle device employing the sample micromotion mechanism is also provided. In the charged particle device, the sample micromotion mechanism operates followed by deformation which causes a strain. A strain measuring unit measures such strain. The sample micromotion mechanism imparts micromotion so as to reduce the strain in accordance with the measured strain value, thereby reducing deformation of the sample micromotion mechanism.
    Type: Application
    Filed: March 9, 2015
    Publication date: September 10, 2015
    Inventors: Naruo Watanabe, Yoshio Takahashi
  • Patent number: 9070532
    Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: June 30, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
  • Publication number: 20140319371
    Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 30, 2014
    Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
  • Publication number: 20140224988
    Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.
    Type: Application
    Filed: May 22, 2012
    Publication date: August 14, 2014
    Inventors: Hirokazu Tamaki, Yoshio Takahashi, Hiroto Kasai, Hiroyuki Kobayashi
  • Patent number: 8785851
    Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: July 22, 2014
    Assignees: Hitachi, Ltd., Riken
    Inventors: Toshiaki Tanigaki, Shinji Aizawa, Tsuyoshi Matsuda, Ken Harada, Yoshio Takahashi
  • Patent number: 8772715
    Abstract: An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on an objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: July 8, 2014
    Assignees: Hitachi, Ltd., Riken
    Inventors: Toshiaki Tanigaki, Shinji Aizawa, Tsuyoshi Matsuda, Ken Harada, Yoshio Takahashi
  • Publication number: 20140121317
    Abstract: The object of the present invention is to provide a coating composition which can provide a coating film having excellent adhesion to a chromium thin film under various conditions, and sufficient scratch resistance, and the present invention provides a coating composition for a chromium thin film formed on a substrate, wherein the coating composition includes: an acrylic copolymer (A) having a phosphate group and a hydroxyl group other than a hydroxyl group in the phosphate group; isocyanate (B); and a metal chelate (C).
    Type: Application
    Filed: August 9, 2012
    Publication date: May 1, 2014
    Applicant: FUJIKURA KASEI CO., LTD.
    Inventors: Yoshio Takahashi, Toshiaki Okazaki
  • Publication number: 20130313432
    Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.
    Type: Application
    Filed: May 23, 2013
    Publication date: November 28, 2013
    Inventors: Toshiaki TANIGAKI, Shinji AIZAWA, Tsuyoshi MATSUDA, Ken HARADA, Yoshio TAKAHASHI