Abstract: A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pushes up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.

Abstract: The peeling-off of a deposited film caused by a carrier is restrained, and the exchange period of the carrier is prolonged. In a carrier 1 including a slider 7 having a mechanism for conveying a substrate holder 3 that supports a substrate 2, a deposition shield 20a, 20b that can cover the substrate holder 3 and has an opening equivalent to or larger than the substrate 2 on which a film is formed is installed on both surfaces of the substrate holder 3. At this time, the substrate holder 3, supporting claws 4, and fixing parts 6 are arranged so as to be hidden by the deposition shield 20. In a film forming chamber, to form a predetermined film on the substrate 2, the carrier 1 covered by the deposition shield 20 is exposed to a plasma space in the film forming chamber, and the film is formed. The deposition of film onto the substrate holder 3, the supporting claws 4, and the fixing parts 6 that are covered by the deposition shield 20 can be restrained.

Abstract: A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pulls up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.

Abstract: The present invention is to provide a sputtering apparatus and a thin film formation method which make it possible to form respective layers of a multilayer film having a clean interface at a optimum temperature, or which make it possible to continuously carry out the film formation and the surface processing. Another object of this invention is to provide a small sputtering apparatus for forming a multilayer film as compared with prior art apparatus. A sputtering apparatus of this invention comprises a main shaft around which at least one target and at least one surface processing mechanism are installed, a substrate holder holding a substrate or a plurality of substrates arranged facing the target and the surface processing mechanism, and a rotation mechanism to rotate the main shaft or the substrate holder.

Abstract: Disclosed is a telephone circuit in which two simultaneously available telephones are connected by use of a pair of twisted-paired cables. A PBX 1 and a digital multi-function telephone 2 are connected by a pair of twisted-paired cables, a digital signal channel of 2B+D is established bidirectionally between the PBX 1 and the digital multi-function telephone 2, and user information and a control signal are sent and received therebetween. The digital multi-function telephone 2 and an analog telephone 3 are connected by a pair of twisted-paired cables, and a signal is sent and received between the digital multi-function telephone 2 and an analog telephone 3 by an analog signal of a voice band and a DC/AC control signal. A B1-channel on a 2-wire digital line 4 is allocated for user information transmission of the digital multi-function telephone 2, and a B2-channel is allocated for user information transmission of the analog telephone 3.

Abstract: The present invention is to provide a sputtering apparatus and a thin film formation method which make it possible to form respective layers of a multilayer film having a clean interface at a optimum temperature, or which make it possible to continuously carry out the film formation and the surface processing. Another object of this invention is to provide a small sputtering apparatus for forming a multilayer film as compared with prior art apparatus. A sputtering apparatus of this invention comprises a main shaft around which at least one target and at least one surface processing mechanism are installed, a substrate holder holding a substrate or a plurality of substrates arranged facing the target and the surface processing mechanism, and a rotation mechanism to rotate the main shaft or the substrate holder.

Abstract: A substrate holder for holding a circular substrate in a vertical position during processing of the substrate. The substrate holder is provided with a vertical base plate and three support claws which are mounted on the base plate and which hold the peripheral edge of a substrate. One of the three support claws is a fixed support claw which holds the edge of the substrate at the bottom to support and whose position does not change when the weight of the substrate is supported. The other two support claws are moveable and may be actuated to hold the edge of the substrate at its sides to restrain motion of the substrate. The moveable support claws can be opened and closed for substrate mounting and removal. The two movable support claws are installed on the base plate in a manner so that when the substrate is supported by the fixed support claw they contact the side edge at locations which are higher than the height of the center of the substrate.

Abstract: A substrate holder for holding a circular substrate in a vertical position during processing of the substrate. The substrate holder is provided with a vertical base plate and three support claws which are mounted on the base plate and which hold the peripheral edge of a substrate. One of the three support claws is a fixed support claw which holds the edge of the substrate at the bottom to support and whose position does not change when the weight of the substrate is supported. The other two support claws are moveable and may be actuated to hold the edge of the substrate at its sides to restrain motion of the substrate. The moveable support claws can be opened and closed for substrate mounting and removal. The two movable support claws are installed on the base plate in a manner so that when the substrate is supported by the fixed support claw they contact the side edge at locations which are higher than the height of the center of the substrate.

Abstract: A substrate holder to support a substrate in a vertical position in a substrate processing device that performs a process on the substrate, where the process involves forming a plasma in the space around the substrate. The substrate holder includes a base plate and a plurality of supporting claws that are attached to the base plate and arranged so as to come into contact with the outer edge of the substrate and provide vertical support for the substrate. At least one of the plurality of supporting claws is a movable supporting claw that can be brought into contact with and separated from the outer edge of the substrate. When a substrate has been loaded into the holder, the space around the substrate is substantially filled by the base plate or by a member attached to the base plate.

Abstract: To provide a magnetic transfer system capable of smoothly delivering a carrier between chambers by providing a independently-rotating carrier-feed driving shaft for each chamber without using a synchronous control mechanism and used for a semiconductor fabrication equipment or the like provided with a plurality of chambers. The magnetic transfer system is provided with a rotational driving member which is divided into two portions serving as a fixed driving shaft and a movable driving shaft in the axial direction and in which the fixed driving shaft is secured to a shaft core member and the movable driving shaft is set to the shaft core member so as to be limited in the rotational direction but so as to be freely movable in the axial direction at a certain width, and spiral magnetic coupling sections are formed on the surface of each driving shaft at the same pitch.

Abstract: A switching matrix equipment is disclosed for use in a telecommunication switching system. Each crosspoint comprises a series circuit of a relay coil and a self-holding diode. First and second switch groups cooperate to select a crosspoint and to fire a self-holding diode of the cross point. After the self-holding diode is fired, the crosspoint related is held or sustained by means of a third switch group with a lower voltage than the threshold voltage of the self-holding diode.