Patents by Inventor Yoshitaka Imabayashi

Yoshitaka Imabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8685631
    Abstract: A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: April 1, 2014
    Assignee: Panasonic Liquid Crystal Display Co., Ltd.
    Inventors: Yoshihiro Daito, Ryuuta Watanabe, Yoshitaka Imabayashi
  • Publication number: 20100323304
    Abstract: A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction.
    Type: Application
    Filed: June 17, 2010
    Publication date: December 23, 2010
    Inventors: Yoshihiro DAITO, Ryuuta Watanabe, Yoshitaka Imabayashi
  • Patent number: 7248330
    Abstract: In a liquid crystal display device having a pair of substrates that are opposite to and bonded to each other, a liquid crystal layer is sealed between the pair of substrates, and columnar spacers are formed on one of the pair of substrates and in contact with the other substrate to maintain a gap between the pair of substrates. The surfaces of support columns of the columnar spacers are made to be rough to enhance the friction force between the pair of substrates and to prevent the other of the pair of substrates from diverging from the one of the pair of substrates, so that display quality of the liquid crystal display device is improved.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: July 24, 2007
    Assignee: Hitachi Displays, Ltd.
    Inventors: Akira Ishii, Yoshitaka Imabayashi
  • Publication number: 20050012889
    Abstract: In a liquid crystal display device having a pair of substrates that are opposite to and bonded to each other, a liquid crystal layer is sealed between the pair of substrates, and columnar spacers are formed on one of the pair of substrates and in contact with the other substrate to maintain a gap between the pair of substrates. The surfaces of support columns of the columnar spacers are made to be rough to enhance the friction force between the pair of substrates and to prevent the other of the pair of substrates from diverging from the one of the pair of substrates, so that display quality of the liquid crystal display device is improved.
    Type: Application
    Filed: July 14, 2004
    Publication date: January 20, 2005
    Inventors: Akira Ishii, Yoshitaka Imabayashi