Patents by Inventor Yoshitomo Shimazu
Yoshitomo Shimazu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220050125Abstract: This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.Type: ApplicationFiled: March 3, 2020Publication date: February 17, 2022Applicant: SHOWA DENKO K.K.Inventors: Tsuyoshi KATO, Hiroyuki TOMITA, Takuya MINAMI, Shohei NISHIZAWA, Yoshitomo SHIMAZU, Gohei KUROKAWA, Katsumi MUROFUSHI, Naoya FUKUMOTO
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Patent number: 8592314Abstract: The present invention aims to provide a polishing composition which allows high-speed polishing of a barrier film and an inter-layer dielectric film along with a wiring metal at the same time, while preventing dishing and erosion, and particularly maintaining the flatness of metal film. The chemical-mechanical polishing composition of the present invention comprises a dicarboxylic acid having 7 to 13 carbon atoms, an oxidizing agent, an abrasive and water.Type: GrantFiled: January 24, 2006Date of Patent: November 26, 2013Assignee: Showa Denko K.K.Inventors: Ayako Nishioka, Yuji Itoh, Yoshitomo Shimazu
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Patent number: 8425276Abstract: The present invention provides a polishing composition for polishing copper or copper alloy, comprising: an oxidizing agent (A); at least one acids (B) selected from amino acids, carboxylic acids of 8 or less carbon atoms, or inorganic acids; a sulfonic acid (C) having an alkyl group of 8 or more carbon atoms; a fatty acid (D) having an alkyl group of 8 or more carbon atoms; and an N-substituted imidazole (E) represented by the following general formula (1). (In the formula (1), Ra, Rb, and Rc represent H or an alkyl group of 1 to 4 carbon atoms, and Rd represents a group selected from the group consisting of a benzyl group, a vinyl group, an alkyl group of 1 to 4 carbon atoms, and a group in which a portion of H of these groups has been substituted with OH or NH2.Type: GrantFiled: November 12, 2008Date of Patent: April 23, 2013Assignee: Showa Denko K.K.Inventors: Takashi Sato, Hiroshi Takahashi, Yoshitomo Shimazu, Yuji Itoh
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Patent number: 7901474Abstract: The present invention provide a chemical-mechanical polishing composition for inhibiting dishing and erosion as well as rapidly polishing an insulating film and barrier film at the same time while maintaining the flatness of the substrate surface polished. The present chemical-mechanical polishing composition comprises methanesulfonic acid, an alkali metal ion, an oxidizing agent, a silica abrasive and water, and has a pH of 8 to 12.Type: GrantFiled: December 22, 2005Date of Patent: March 8, 2011Assignee: Showa Denko K.K.Inventors: Ayako Nishioka, Yuji Itoh, Yoshitomo Shimazu
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Publication number: 20100267315Abstract: The present invention provides a polishing composition for polishing copper or copper alloy, comprising: an oxidizing agent (A); at least one acids (B) selected from amino acids, carboxylic acids of 8 or less carbon atoms, or inorganic acids; a sulfonic acid (C) having an alkyl group of 8 or more carbon atoms; a fatty acid (D) having an alkyl group of 8 or more carbon atoms; and an N-substituted imidazole (E) represented by the following general formula (1). (In the formula (1), Ra, Rb, and Rc represent H or an alkyl group of 1 to 4 carbon atoms, and Rd represents a group selected from the group consisting of a benzyl group, a vinyl group, an alkyl group of 1 to 4 carbon atoms, and a group in which a portion of H of these groups has been substituted with OH or NH2.Type: ApplicationFiled: November 12, 2008Publication date: October 21, 2010Applicant: SHOWA DENKO K.K.Inventors: Takashi Sato, Hiroshi Takahashi, Yoshitomo Shimazu, Yuji Itoh
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Publication number: 20090289217Abstract: A polishing composition which achieves surfaces with high planarity and the reduction of corrosions in the wiring metal surface at the same time is provided. Such compositions include (A) an oxidizing agent; (B) at least one acid selected from an amino acid, a carboxylic acid of no more than 8 carbon atoms, and an inorganic acid; (C) a sulfonic acid having a concentration of 0.01% by mass or more and having an alkyl group of 8 or more carbon atoms; (D) a fatty acid having a concentration of 0.001% by mass or more and having an alkyl group of 8 or more carbon atoms; and (E) at least one compound selected from a pyridine carbonyl compound, a nonionic water-soluble polymer, 2-pyrrolidone, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, gramine, adenine, N,N?-diisopropylethylenediamine, N,N?-bis(2-hydroxyethyl)ethylenediamine, N,N?-dibenzylethylenediamine, and N,N?-diphenylethylenediamine.Type: ApplicationFiled: July 26, 2007Publication date: November 26, 2009Applicant: SHOWA DENKO K.K.Inventors: Takashi Sato, Hiroshi Takahashi, Yoshitomo Shimazu, Yuji Ito
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Publication number: 20090194504Abstract: The present invention provides a method for producing an abrasive composition, which can control dishing, a method for polishing a substrate using the abrasive composition, and a method for producing a substrate. In the method for producing an abrasive composition, two kinds of preliminary compositions (A) and (B) having different compositions are mixed in different mixing ratios to produce plural kinds of abrasive compositions, wherein a composition containing (a) an abrasive grain, (b) an oxidizing agent, (c) one or more acids selected from the group consisting of amino acids, organic acids and inorganic acids, and (d) a surfactant is used as the preliminary composition (A); and a composition containing (a) an abrasive grain and (b) an oxidizing agent is used as the preliminary composition (B). The preliminary composition (B) may contain the foregoing acid (c) and surfactant (d).Type: ApplicationFiled: May 14, 2007Publication date: August 6, 2009Applicant: SHOWA DENKO K.K.Inventors: Takashi Sato, Hiroshi Takahashi, Yoshitomo Shimazu, Yuji Ito
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Publication number: 20080138990Abstract: The present invention provide a chemical-mechanical polishing composition for inhibiting dishing and erosion as well as rapidly polishing an insulating film and barrier film at the same time while maintaining the flatness of the substrate surface polished. The present chemical-mechanical polishing composition comprises methanesulfonic acid, an alkali metal ion, an oxidizing agent, a silica abrasive and water, and has a pH of 8 to 12.Type: ApplicationFiled: December 22, 2005Publication date: June 12, 2008Applicant: SHOWA DENKO K.KInventors: Ayako Nishioka, Yuji Itoh, Yoshitomo Shimazu
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Publication number: 20080087644Abstract: The present invention aims to provide a polishing composition which allows high-speed polishing of a barrier film and an inter-layer dielectric film along with a wiring metal at the same time, while preventing dishing and erosion, and particularly maintaining the flatness of metal film. The chemical-mechanical polishing composition of the present invention comprises a dicarboxylic acid having 7 to 13 carbon atoms, an oxidizing agent, an abrasive and water.Type: ApplicationFiled: January 24, 2006Publication date: April 17, 2008Applicant: SHOWA DENKO K.K.Inventors: Ayako Nishioka, Yuji Itoh, Yoshitomo Shimazu
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Patent number: 6844263Abstract: The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.Type: GrantFiled: February 24, 2003Date of Patent: January 18, 2005Assignee: Showa Denko Kabushiki KaishaInventors: Yoshitomo Shimazu, Takanori Kido, Nobuo Uotani
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Patent number: 6740589Abstract: A polishing composition for polishing copper and tantalum or a tantalum compound provided on a semiconductor wafer, including an aqueous solvent and at least one amino acid having two or more nitrogen atoms.Type: GrantFiled: November 30, 2001Date of Patent: May 25, 2004Assignee: Showa Denko Kabushiki KaishaInventors: Yoshitomo Shimazu, Hajime Sato
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Publication number: 20030153188Abstract: The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.Type: ApplicationFiled: February 24, 2003Publication date: August 14, 2003Applicant: SHOWA DENKO K.K.Inventors: Yoshitomo Shimazu, Takanori Kido, Nobuo Uotani
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Patent number: 6547843Abstract: The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.Type: GrantFiled: July 2, 2001Date of Patent: April 15, 2003Assignee: Showa Denko K.K.Inventors: Yoshitomo Shimazu, Takanori Kido, Nobuo Uotani
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Publication number: 20020098697Abstract: A polishing composition for polishing copper and tantalum or a tantalum compound provided on a semiconductor wafer, including an aqueous solvent and at least one amino acid having two or more nitrogen atoms.Type: ApplicationFiled: November 30, 2001Publication date: July 25, 2002Applicant: SHOWA DENKO K.K.Inventors: Yoshitomo Shimazu, Hajime Sato
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Publication number: 20020017064Abstract: The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.Type: ApplicationFiled: July 2, 2001Publication date: February 14, 2002Inventors: Yoshitomo Shimazu, Takanori Kido, Nobuo Uotani