Patents by Inventor Yoshitumi Ogawa

Yoshitumi Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of holding substrate and substrate holding system
    Patent number: 6217705
    Abstract: A substrate holding system is provided for holding a substrate in a substrate etching apparatus by using electrostatic force. An electrical insulating member is also provided having a top surface approximately at the same level as the treated surface of the substrate and having an inner side surface in adjacent relationship with a surface of the substrate forming the periphery of the substrate. The inner side surface of the electrical insulating member faces the periphery of the substrate in substantially parallel relationship with a direction normal to the treated surface of the substrate. A dielectric film is formed on one surface of a metallic member having a flow passage for circulating a coolant to control the temperature of the substrate. An electrically insulating material member is placed on and in contact with a surface of the metallic member.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: April 17, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Naoyuki Tamura, Kazue Takahashi, Youichi Ito, Yoshitumi Ogawa, Hiroyuki Shichida, Tsunehiko Tsubone