Abstract: A plasma processing apparatus includes: a chamber accommodating a plurality of substrates; a plurality of substrate supports provided inside the chamber and configured to support a substrate; a plurality of radio-frequency power sources provided corresponding to the plurality of substrate supports, and configured to supply radio-frequency power to the plurality of substrate supports, respectively; and a plurality of shields configured to compart the inside of the chamber and provided corresponding to the plurality of substrate supports to define a processing space where plasma is generated. A radio-frequency current path is formed between the plurality of shields so as not to interfere with one another.

Abstract: A plasma processing apparatus includes: a chamber accommodating a plurality of substrates; a plurality of substrate supports provided inside the chamber and configured to support a substrate; a plurality of radio-frequency power sources provided corresponding to the plurality of substrate supports, and configured to supply radio-frequency power to the plurality of substrate supports, respectively; and a plurality of shields configured to compart the inside of the chamber and provided corresponding to the plurality of substrate supports to define a processing space where plasma is generated. A radio-frequency current path is formed between the plurality of shields so as not to interfere with one another.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.

Abstract: A respiration control apparatus connected to a controlled body includes a respiration circuit having an inhalation circuit and an exhalation circuit. The inhalation circuit includes a first solenoid-operated valve and a first check valve. The exhalation circuit includes a vent valve, a dehumidifying chamber, a pressure detector, a second check valve, and a second solenoid-operated valve. A central processor closes the first solenoid-operated valve and the second solenoid-operated valve based on a respiration control signal supplied from a synchronizing signal output control device, disconnecting the respiratory system of the controlled body from the outside of the respiration control apparatus.

Abstract: The level of a respiration signal obtained from a laser sensor or the like is indicated on a respiration monitor according to an output condition set by synchronizing signal output control device. While the level of the respiration signal is indicated on the respiration monitor, a synchronizing signal output device outputs a synchronizing signal according to the output condition and the respiration signal to an X-ray control device, which controls a high-voltage generating device to energize an X-ray source to apply X-rays to an examinee.

Abstract: A respiration control apparatus connected to a controlled body includes a respiration circuit having an inhalation circuit and an exhalation circuit. The inhalation circuit includes a first solenoid-operated valve and a first check valve. The exhalation circuit includes a vent valve, a dehumidifying chamber, a pressure detector, a second check valve, and a second solenoid-operated valve. A central processor closes the first solenoid-operated valve and the second solenoid-operated valve based on a respiration control signal supplied from a synchronizing signal output control device, disconnecting the respiratory system of the controlled body from the outside of the respiration control apparatus.

Abstract: The level of a respiration signal obtained from a laser sensor or the like is indicated on a respiration monitor according to an output condition set by synchronizing signal output control device. While the level of the respiration signal is indicated on the respiration monitor, a synchronizing signal output device outputs a synchronizing signal according to the output condition and the respiration signal to an X-ray control device, which controls a high-voltage generating device to energize an X-ray source to apply X-rays to an examinee.