Patents by Inventor Youde SHEN

Youde SHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9079338
    Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
    Type: Grant
    Filed: May 9, 2012
    Date of Patent: July 14, 2015
    Assignee: THE HONG KONG POLYTECHNIC UNIVERSITY
    Inventors: Zijian Zheng, Youde Shen, Xuechang Zhou, Xie Zhuang
  • Publication number: 20130302464
    Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
    Type: Application
    Filed: May 9, 2012
    Publication date: November 14, 2013
    Applicant: THE HONG KONG POLYTECHNIC UNIVERSITY
    Inventors: Zijian ZHENG, Youde SHEN, Xuechang ZHOU, Xie ZHUANG