Patents by Inventor Young Geon Kwon

Young Geon Kwon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8298865
    Abstract: A method for manufacturing a substrate for a semiconductor package includes the steps of attaching first and second insulation layers which have first surfaces and second surfaces and are formed with conductive layers on the first surfaces, by the medium of a release film which has adhesives attached to both surfaces thereof, such that the second surfaces of the first and second insulation layers face each other; forming first conductive patterns on the first surfaces of the first and second insulation layers by patterning the conductive layers; forming solder masks on the first surfaces of the first and second insulation layers including the first conductive patterns to open portions of the first conductive patterns; and separating the first and second insulation layers from each other by removing the release film.
    Type: Grant
    Filed: January 25, 2012
    Date of Patent: October 30, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventors: Young Berm Jung, Hong Bum Park, Young Geon Kwon, Seong Kwon Chin, Byeung Ho Kim, Seok Koo Jung
  • Publication number: 20120118495
    Abstract: A method for manufacturing a substrate for a semiconductor package includes the steps of attaching first and second insulation layers which have first surfaces and second surfaces and are formed with conductive layers on the first surfaces, by the medium of a release film which has adhesives attached to both surfaces thereof, such that the second surfaces of the first and second insulation layers face each other; forming first conductive patterns on the first surfaces of the first and second insulation layers by patterning the conductive layers; forming solder masks on the first surfaces of the first and second insulation layers including the first conductive patterns to open portions of the first conductive patterns; and separating the first and second insulation layers from each other by removing the release film.
    Type: Application
    Filed: January 25, 2012
    Publication date: May 17, 2012
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Young Berm JUNG, Hong Bum PARK, Young Geon KWON, Seong Kwon CHIN, Byeung Ho KIM, Seok Koo JUNG
  • Patent number: 8125086
    Abstract: A method for manufacturing a substrate for a semiconductor package includes the steps of attaching first and second insulation layers which have first surfaces and second surfaces and are formed with conductive layers on the first surfaces, by the medium of a release film which has adhesives attached to both surfaces thereof, such that the second surfaces of the first and second insulation layers face each other; forming first conductive patterns on the first surfaces of the first and second insulation layers by patterning the conductive layers; forming solder masks on the first surfaces of the first and second insulation layers including the first conductive patterns to open portions of the first conductive patterns; and separating the first and second insulation layers from each other by removing the release film.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: February 28, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventors: Young Berm Jung, Hong Bum Park, Young Geon Kwon, Seong Kwon Chin, Byeung Ho Kim, Seok Koo Jung
  • Publication number: 20090294972
    Abstract: A method for manufacturing a substrate for a semiconductor package includes the steps of attaching first and second insulation layers which have first surfaces and second surfaces and are formed with conductive layers on the first surfaces, by the medium of a release film which has adhesives attached to both surfaces thereof, such that the second surfaces of the first and second insulation layers face each other; forming first conductive patterns on the first surfaces of the first and second insulation layers by patterning the conductive layers; forming solder masks on the first surfaces of the first and second insulation layers including the first conductive patterns to open portions of the first conductive patterns; and separating the first and second insulation layers from each other by removing the release film.
    Type: Application
    Filed: May 26, 2009
    Publication date: December 3, 2009
    Inventors: Young Berm JUNG, Hong Bum PARK, Young Geon KWON, Seong Kwon CHIN, Byeung Ho KIM, Seok Koo JUNG