Patents by Inventor Young-Ha Yoon

Young-Ha Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11980632
    Abstract: Disclosed is fucosyllactose having antiviral activity and inhibitory activity against viral infection, and a method for preventing or treating a viral infection by administering a composition including fucosyllactose as an active ingredient to a subject in need thereof. It was found that 2?-fucosyllactose and 3-fucosyllactose, which are human milk oligosaccharides (HMOs), have antiviral activity, and in particular, 3-fucosyllactose in vitro and in vivo exhibits much higher antiviral activity and inhibitory activity against viral infection compared to 2?-fucosyllactose and is thus useful as an antiviral agent.
    Type: Grant
    Filed: November 23, 2022
    Date of Patent: May 14, 2024
    Assignee: ADVANCED PROTEIN TECHNOLOGIES CORP.
    Inventors: Dae Hyuk Kweon, Seok Oh Moon, Jung Hee Moon, Chul Soo Shin, Jong Won Yoon, Seon Min Jeon, Young Ha Song, Jong Gil Yoo
  • Publication number: 20240093254
    Abstract: The present invention relates to a method for increasing the productivity of 2?-fucosyllactose through various changes in culture medium composition and culturing on the basis of lactose, which is a substrate, wherein 2-fucosyllactose can be continuously produced in a high-yield at an optimum lactose concentration discovered by a culturing method of the present invention.
    Type: Application
    Filed: October 31, 2022
    Publication date: March 21, 2024
    Applicants: Advanced Protein Technologies Corp., SEOUL NATIONAL UNIVERSITY R&DB FORNDATION
    Inventors: Chul Soo SHIN, Jong Won YOON, Young Ha SONG, Young Sun YOO, Jeong Su BANG, Heon Hak LEE
  • Patent number: 7560712
    Abstract: An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit positioned in the process chamber, supporting a substrate and being electrically connected to a first power source for generating a high frequency pulse, a conductive unit separated from the support unit in such a manner that plasma associated with the ion implantation process is generated between the support unit and the conductive unit, wherein the conductive unit comprises a first etch prevention member preventing the conductive unit from being etched by a source gas used to generate the plasma, and a power port electrically connected to a second power source and generating radio frequency (RF) power applied to the conductive unit.
    Type: Grant
    Filed: August 27, 2007
    Date of Patent: July 14, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Il-Kyoung Kim, No-Hyun Huh, Tae-Won Lee, Sung-Wook Park, Ki-Young Yun, Won-Soon Lee, Young-Ha Yoon, Tae-Sub Im
  • Patent number: 7385207
    Abstract: There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: June 10, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Young-Ha Yoon
  • Publication number: 20080054194
    Abstract: An apparatus and method of doping ions into a substrate are disclosed and include a process chamber having an inner space in which an ion implantation process is performed, a support unit positioned in the process chamber, supporting a substrate and being electrically connected to a first power source for generating a high frequency pulse, a conductive unit separated from the support unit in such a manner that plasma associated with the ion implantation process is generated between the support unit and the conductive unit, wherein the conductive unit comprises a first etch prevention member preventing the conductive unit from being etched by a source gas used to generate the plasma, and a power port electrically connected to a second power source and generating radio frequency (RF) power applied to the conductive unit.
    Type: Application
    Filed: August 27, 2007
    Publication date: March 6, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Il-Kyoung KIM, No-Hyun HUH, Tae-Won LEE, Sung-Wook PARK, Ki-Young YUN, Won-Soon LEE, Young-Ha YOON, Tae-Sub IM
  • Publication number: 20050247889
    Abstract: There is provided a movable ion beam inclination-angle measuring apparatus that can measure the inclination angle of either a spot ion beam or a ribbon ion beam. The apparatus is provided in an X-axis direction from an ion supplying unit of an ion implantation device. The apparatus includes an ion current measuring unit which has an ion-beam receiving device for receiving the ion beam, and has an ion current measuring part for measuring an ion current induced by the received ion beam. The apparatus further includes an angle adjusting unit adapted to adjust a receiving angle of the ion beam receiving device about a Y-axis and/or Z-axis and a position adjusting unit adapted to move the ion-beam receiving device in a Z-axis direction. The inclination angle is calculated by an inclination-angle calculating unit using the variation of the measured ion current depending on the adjustment of the receiving angle of the ion beam.
    Type: Application
    Filed: April 26, 2005
    Publication date: November 10, 2005
    Inventor: Young-Ha Yoon
  • Patent number: 6940510
    Abstract: A system and method for displaying font in a wireless telephone. The system and method employ the operations of converting base font data into converted font data, wherein the converted font data has a data bits equal in number to data bits of a background screen into which the converted font data will be transcribed; generating a mask for the converted font data; storing the converted font data and the mask in a memory of the wireless telephone; retrieving the mask stored in the memory.
    Type: Grant
    Filed: June 27, 2003
    Date of Patent: September 6, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Hyun Kim, Young-Ha Yoon
  • Publication number: 20040027351
    Abstract: A system and method for displaying font in a wireless telephone. The system and method employ the operations of converting base font data into converted font data, wherein the converted font data has a data bits equal in number to data bits of a background screen into which the converted font data will be transcribed; generating a mask for the converted font data; storing the converted font data and the mask in a memory of the wireless telephone; retrieving the mask stored in the memory.
    Type: Application
    Filed: June 27, 2003
    Publication date: February 12, 2004
    Inventors: Yong-Hyun Kim, Young-Ha Yoon