Abstract: A substrate processing apparatus includes a main load unit, a buffer load unit, and a distribution unit. The main load unit is disposed at a front side of the process module for receiving a plurality of containers each accommodating substrates. The buffer load unit receives a plurality of containers, and the distribution unit transfers a container between the main load unit and the buffer load unit. The substrate processing apparatus includes the buffer load unit as well as the main load unit, and the distribution unit is used to transfer a container between the main load unit and the buffer load unit. Therefore, substrates can be transferred to the substrate processing apparatus with less time, and thus productivity can be improved.

Abstract: A semiconductor manufacturing apparatus for a photolithographic process having a coating process and a developing process is described, which includes a first port, a second port, a coating member, and a developing member. The first port and second port have a constant distance from each other, where a substrate comes in and goes out. The coating member, which couples the first port to the second port, carries the substrate between the first port and the second port and carries out the coating process. The developing member, which couples the first port to the second port and is opposite to the coating member, carries the substrate therebetween and carries out the developing process. The apparatus can stably maintain an operating ratio of equipment, and be installed in a relatively small area.