Abstract: A developed impact mark analysis apparatus includes: an image acquisition unit configured to obtain at least one first image by photographing impact marks that are developed, and to obtain a second image of impact marks at a crime scene that are developed from evidence at the crime scene; an outliner configured to outline the at least one first image to obtain at least one first outline image, and to outline the second image to obtain a second outline image; a database configured to store the first outline image corresponding to related tool characteristic information; a matching unit configured to search the database for the first outline image determined to be similar to the second outline image and match them with each other; a display unit; and a user input unit.

Abstract: An anode active material for a secondary battery according to an embodiment includes a plurality of a silicon-based active material particle being doped with a metal element and including pores. An average of porosity values measured for each of 10 different silicon-based active material particles among the plurality of the silicon-based active material particle is in a range from 0.2% to 9.0%.

Abstract: A hydrogen supply method includes a two-side heat exchange mode in which both introducing a second fluid into a hydrogen storage part after the second fluid exchanges heat with a first fluid in a second heat exchanger in a state in which a compressor is driven to compress the first fluid and introducing the second fluid into the hydrogen storage part after the second fluid is heated or cooled in a thermal device are performed. The method also includes a one-side heat exchange mode in which one of introducing the second fluid into the hydrogen storage part after the second fluid exchanges heat with the first fluid in the second heat exchanger in a state in which the compressor is driven to compress the first fluid and introducing the second fluid into the hydrogen storage part after the second fluid is heated or cooled in the thermal device is performed.

Abstract: A hydrogen compression system includes: a heat pump part including a heat pump line configured to allow a refrigerant to circulate therethrough, a hydrogen compression part configured to compress hydrogen by being repeatedly heated and cooled, a first circulation line connected to the heat pump line while passing through the hydrogen compression part and configured to allow the refrigerant introduced from the heat pump line to circulate therethrough, a second circulation line provided to pass through the hydrogen compression part and configured to allow a cooling fluid to circulate therethrough, and a cooling unit provided in the second circulation line and configured to cool the cooling fluid, in which the hydrogen compression part is heated by the refrigerant or cooled by the cooling fluid, thereby minimizing electric power consumption and improving energy efficiency.

Abstract: A hydrogen storage system is disclosed and includes a storage unit including a plurality of unit storage containers, in which metal hydride materials are respectively provided in an interior thereof and which are connected to each other in parallel, and a thermal fluid line defining a thermal fluid passage, which passes via the plurality of unit storage containers continuously and through which a thermal fluid flows for heating or cooling the unit storage containers, thereby enhancing a storage performance and an efficiency of the hydrogen.

Abstract: A hydrogen storage device includes a storage container having an accommodation space in an interior thereof, a first metal hydride material provided in the interior of the storage container and that stores hydrogen, and a second metal hydride material provided in the interior of the storage container and that stores the hydrogen at a pressure that is different from that of the first metal hydride material. An advantageous effect of restraining an excessive rise of a pressure of the storage container and enhancing safety and reliability may be obtained.

Abstract: An apparatus for assembling a solid hydrogen storage system includes a lower support installed to support a lower side of material blocks to be assembled, split covers assembled in multiple stages on an upper side of the lower support and forming therein a closed space in which the material blocks are capable of being assembled, the split covers being configured to be separated in a horizontal direction, and gas injection ports provided in the split covers to inject an inert gas into an inner space of the split covers.

Abstract: A positive electrode active material particle includes a core that contains lithium cobalt oxide represented by the following Chemical Formula LiaCo(1-x)MxO2-yAy and a shell that is coated on the surface of the core and contains composite metal oxide of a metal with an oxidation number of +2 and a metal with an oxidation number of +3. In particular, M is at least one selected from the group consisting of Ti, Mg, Zn, Si, Al, Zr, V, Mn, Nb and Ni. A is oxygen-substitutional halogen and 1.00?a?1.05, 0?x?0.05, and 0?y?0.001.

Abstract: An infusion flow regulator includes: a main body having an inlet through which fluid is introduced and an outlet through which the fluid is discharged; and a rotary dial rotatably coupled to the main body, with a sealing member interposed therebetween, so as to regulate a flow rate of the fluid, in which the rotary dial includes a regulating flow path having a shape of a recessed groove in cross section with a first width and a first height, and the regulating flow path includes a first region in which the first width is constant and the first height is decreased, and a second region in which both the first width and the first height are decreased. By the aforementioned configuration, the infusion flow regulator for the fluid can accurately regulate the flow rate even in a region where the flow rate of the fluid is very small.

Abstract: A semiconductor package and manufacturing method is disclosed. The semiconductor package includes a semiconductor chip having a plurality of chip terminals formed on one surface thereof, a redistribution layer electrically connected to the chip terminal and extending outwardly from a side surface of the chip to electrically connect the chip terminal to an external device, an external pad provided on the insulating layer, formed to be in contact with the redistribution layer exposed from the insulating layer to be electrically connected to the redistribution layer, and exposed to an upper side of the insulating layer; an external connection terminal formed on the external pad and contacting an external device, a protective layer formed to surround at least one surface and a side surface of the chip, and an insulating layer formed to cover the redistribution layer.

Abstract: The present invention relates to a method of manufacturing a hyaluronate film and a hyaluronate film manufactured thereby, and more particularly to a method of manufacturing a hyaluronate film through a solvent-casting process or using an automatic film applicator that facilitates mass production and to a hyaluronate film manufactured thereby, which is useful as a mask pack for cosmetics, a patch for medicaments and medical devices, a film-type adhesion inhibitor, etc. Unlike conventional liquid products, the hyaluronate film according to the present invention has a dry surface and thus entails no concern about microbial contamination, is easy to produce/manage/distribute/use, and has superior mechanical properties, whereby it can be utilized for various applications such as packs, patches, artificial skin and the like for cosmetics, medicaments, and medical devices.

Abstract: A semiconductor package includes a semiconductor chip including a chip pad on a first surface thereof, an external pad electrically connected to the chip pad of the semiconductor chip, an external connection terminal covering the external pad, and an intermediate layer between the external pad and the external connection terminal, the intermediate layer including a third metal material that is different from a first metal material included in the external pad and a second metal material included in the external connection terminal.

Abstract: A semiconductor package includes a semiconductor chip including a chip pad on a first surface thereof, an external pad electrically connected to the chip pad of the semiconductor chip, an external connection terminal covering the external pad, and an intermediate layer between the external pad and the external connection terminal, the intermediate layer including a third metal material that is different from a first metal material included in the external pad and a second metal material included in the external connection terminal.

Abstract: The present invention relates to a method of manufacturing a hyaluronate film and a hyaluronate film manufactured thereby, and more particularly to a method of manufacturing a hyaluronate film through a solvent-casting process or using an automatic film applicator that facilitates mass production and to a hyaluronate film manufactured thereby, which is useful as a mask pack for cosmetics, a patch for medicaments and medical devices, a film-type adhesion inhibitor, etc. Unlike conventional liquid products, the hyaluronate film according to the present invention has a dry surface and thus entails no concern about microbial contamination, is easy to produce/manage/distribute/use, and has superior mechanical properties, whereby it can be utilized for various applications such as packs, patches, artificial skin and the like for cosmetics, medicaments, and medical devices.

Abstract: A polyamide/hybrid carbon filler composite is disclosed. The composite includes a polyamide as a matrix and a hybrid carbon filler dispersed in and bonded to the polyamide matrix. The hybrid carbon filler is composed of a nano carbon and a carbon fiber. Also disclosed is a method for preparing the polyamide/hybrid carbon filler. The method includes simultaneously subjecting a mixture of a polyamide and a hybrid carbon filler to mechanofusion and plasma treatments.

Abstract: A polyamide/hybrid carbon filler composite is disclosed. The composite includes a polyamide as a matrix and a hybrid carbon filler dispersed in and bonded to the polyamide matrix. The hybrid carbon filler is composed of a nano carbon and a carbon fiber. Also disclosed is a method for preparing the polyamide/hybrid carbon filler. The method includes simultaneously subjecting a mixture of a polyamide and a hybrid carbon filler to mechanofusion and plasma treatments.

Abstract: A blank mask includes a substrate having a first surface and a second surface which are opposite to each other. The substrate includes a trench having a predetermined depth from the second surface. A reflection layer is disposed on the first surface of the substrate to reflect extreme ultraviolet (EUV) rays. An absorption layer is disposed on the reflection layer opposite to the substrate to absorb EUV rays. A conductive layer is disposed in the trench to expose portions of the substrate. The conductive layer includes first conductive lines and second conductive lines intersecting the first conductive lines, and the exposed portions of the substrate are two dimensionally arrayed to have island shapes.

Abstract: A blank mask includes a substrate having a first surface and a second surface which are opposite to each other. The substrate includes a trench having a predetermined depth from the second surface. A reflection layer is disposed on the first surface of the substrate to reflect extreme ultraviolet (EUV) rays. An absorption layer is disposed on the reflection layer opposite to the substrate to absorb EUV rays. A conductive layer is disposed in the trench to expose portions of the substrate. The conductive layer includes first conductive lines and second conductive lines intersecting the first conductive lines, and the exposed portions of the substrate are two dimensionally arrayed to have island shapes.

Abstract: Blank masks for extreme ultraviolet (EUV) photolithography are provided. The blank mask includes a substrate having a first surface and a second surface which are opposite to each other, a reflection layer disposed on the first surface of the substrate to reflect extreme ultraviolet (EUV) rays, an absorption layer disposed on the reflection layer opposite to the substrate to absorb extreme ultraviolet (EUV) rays, and a conductive layer disposed on the second surface of the substrate to expose portions of the substrate. Related methods are also provided.

Abstract: Blank masks for extreme ultraviolet (EUV) photolithography are provided. The blank mask includes a substrate having a first surface and a second surface which are opposite to each other, a reflection layer disposed on the first surface of the substrate to reflect extreme ultraviolet (EUV) rays, an absorption layer disposed on the reflection layer opposite to the substrate to absorb extreme ultraviolet (EUV) rays, and a conductive layer disposed on the second surface of the substrate to expose portions of the substrate. Related methods are also provided.