Patents by Inventor Youngwoon Kwon

Youngwoon Kwon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7615334
    Abstract: Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.
    Type: Grant
    Filed: September 16, 2005
    Date of Patent: November 10, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Joon Hyung Kim, Hyunsik Kim, Youngwoon Kwon, Jung Hyun Seo
  • Patent number: 7199242
    Abstract: The invention provides a process for the production of a compound of formula (I): wherein P1 and P2, which may be the same or different, are amino protecting groups, which comprises protection of a compound of formula (II) in solution phase continuous operation mode. This confers advantages over batch mode operation. The process is usually conducted in reaction equipment adapted for use in continuous processing mode, for example comprising one or more static mixers or a plug flow reactor. Preferably, the plug flow reactor comprises a jacketed tubular reactor fitted inside with internal mixing elements which continually split and remix the reaction streams promoting mass and heat transfer, whereby a uniform plug flow profile with turbulent fluid flow is achieved. The invention also provides a process for production of the antibacterial compound gemifloxacin or a pharmaceutically acceptable salt and/or hydrate thereof, comprising converting a compound of formula (I).
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: April 3, 2007
    Assignee: LG Life Sciences Limited
    Inventors: Clemens Michael Helmut Brechtelsbauer, Stephen Thomas Carpenter, Trevor John Grinter, Michael Anthony Harris, Yeongdae Kim, Youngwoon Kwon, Dongchul Lee, François Xavier Ricard, Richard Neville Saunders
  • Publication number: 20060060563
    Abstract: Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.
    Type: Application
    Filed: September 16, 2005
    Publication date: March 23, 2006
    Inventors: Joon Kim, Hyunsik Kim, Youngwoon Kwon, Jung Hyun Seo
  • Publication number: 20050043546
    Abstract: The invention provides a process for the production of a compound of formula (I): wherein P1 and P2, which may be the same or different, are amino protecting groups, which comprises protection of a compound of formula (II) in solution phase continuous operation mode. This confers advantages over batch mode operation. The process is usually conducted in reaction equipment adapted for use in continuous processing mode, for example comprising one or more static mixers or a plug flow reactor. Preferably, the plug flow reactor comprises a jacketed tubular reactor fitted inside with internal mixing elements which continually split and remix the reaction streams promoting mass and heat transfer, whereby a uniform plug flow profile with turbulent fluid flow is achieved. The invention also provides a process for production of the antibacterial compound gemifloxacin or a pharmaceutically acceptable salt and/or hydrate thereof, comprising converting a compound of formula (I).
    Type: Application
    Filed: August 2, 2002
    Publication date: February 24, 2005
    Inventors: Clemens Brechtelsbauer, Stephen Carpenter, Trevor Grinter, Michael Harris, Yeongdae Kim, Youngwoon Kwon, Dongchul Lee, Francois Ricard, Richard Saunders