Patents by Inventor Youri Johannes Laurentius Maria Van Dommelen

Youri Johannes Laurentius Maria Van Dommelen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
    Publication number: 20120038929
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: September 30, 2011
    Publication date: February 16, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273679
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Patent number: 8054467
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: November 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20110007314
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: August 20, 2010
    Publication date: January 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Patent number: 7791732
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: September 7, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100157260
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 24, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes KNAAPEN, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Method of inspecting a substrate and method of preparing a substrate for lithography
    Publication number: 20080292780
    Abstract: A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer.
    Type: Application
    Filed: May 22, 2007
    Publication date: November 27, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rik Teodoor Vangheluwe, Youri Johannes Laurentius Maria Van Dommelen, Johannes Anna Quaedackers, Cedric Desire Grouwstra, Thijs Egidius Johannes Knaapen, Ralf Martinus Marinus Daverveld, Jeroen Hubert Rommers
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080068570
    Abstract: A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.
    Type: Application
    Filed: September 20, 2006
    Publication date: March 20, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Youri Johannes Laurentius Maria Van Dommelen, Richard Moerman, Cedric Desire Grouwstra