Abstract: Disclosed is a pellicle including a pellicle membrane including a carbon-based membrane having a carbon content of 40% by mass or more and a support frame that supports the pellicle membrane, in which the pellicle membrane and the support frame are in contact with each other, and at least one of the following conditions 1 and 2 is satisfied. [Condition 1] In the support frame, a surface in contact with the pellicle membrane has a roughness Ra of 1.0 ?m or less. [Condition 2] The support frame has a width of unevenness of 10 ?m or less at an edge portion on a surface side in contact with the pellicle membrane and on an inner side of the pellicle.

Abstract: A pellicle including: a pellicle film including a carbon-based film having a carbon content rate of 40 mass % or more; a support frame that supports the pellicle film; and an adhesive layer containing an adhesive, the pellicle having the total amount of aqueous outgas of 5.0×10?4 Pa·L/sec or less in an atmosphere of 23° C. and 1×10?3 Pa or less.

Abstract: A pellicle film for photolithography including a carbon nanotube film, in which the carbon nanotube film contains carbon nanotubes; the carbon nanotube film transmits 80% or more of EUV light at a wavelength of 13.5 nm; the carbon nanotube film has a thickness from 1 nm to 50 nm; the carbon nanotube film is deposited on a silicon substrate, in which the 3? of the reflectance is 15% or less when the reflectance of the deposited carbon nanotube film is measured using a reflectance spectrophotometer-based film thickness meter under the following conditions: the diameter of measurement spots, 20 ?m; the reference measurement wavelength, 285 nm; the number of measurement spots, 121 spots; the distance between the centers of adjacent measurement spots, 40 ?m.