Patents by Inventor Yu-Ling Teng

Yu-Ling Teng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11990381
    Abstract: In an embodiment, a device includes: a package component including: integrated circuit dies; an encapsulant around the integrated circuit dies; a redistribution structure over the encapsulant and the integrated circuit dies, the redistribution structure being electrically coupled to the integrated circuit dies; sockets over the redistribution structure, the sockets being electrically coupled to the redistribution structure; and a support ring over the redistribution structure and surrounding the sockets, the support ring being disposed along outermost edges of the redistribution structure, the support ring at least partially laterally overlapping the redistribution structure.
    Type: Grant
    Filed: November 14, 2022
    Date of Patent: May 21, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shu-Rong Chun, Kuo Lung Pan, Tin-Hao Kuo, Hao-Yi Tsai, Pei-Hsuan Lee, Chien Ling Hwang, Yu-Chia Lai, Po-Yuan Teng, Chen-Hua Yu
  • Patent number: 4672007
    Abstract: The present invention provides an aqueous composition and process for the electrodeposition of a layer of zinc containing silicon and phosphorus on a metal substrate. The electrodeposition composition is prepared by reacting metallic silicon and zinc with phosphoric acid and an alkali metal hydroxide in the ratio of between 0.4 and 1.3 moles of alkali metal hydroxide per mole of phosphoric acid, and adjusting the solution to a pH of 2 or higher after completion of the reaction. The coating is deposited on the metal substrate by electrodeposition and comprises about 70% to about 99.5% by weight of zinc, and about 0.10% to about 10% by weight of silicon, and about 0.5% to about 20% by weight of phosphorus.The resultant zinc/silicon/phosphorus coating improves the resistance of the metal substrate to corrosion, wear, galling and stress corrosion cracking.
    Type: Grant
    Filed: July 10, 1985
    Date of Patent: June 9, 1987
    Assignee: Kollmorgen Technologies Corporation
    Inventors: Yu-Ling Teng, Charles McCoy, Francis DeFalco, Richard A. Mayernik
  • Patent number: 4533606
    Abstract: The present invention provides an aqueous composition and process for the electrodeposition of a layer of zinc containing silicon and phosphorus on a metal substrate. The electrodeposition composition is prepared by reacting metallic silicon and zinc with phosphoric acid and an alkali metal hydroxide in the ratio of between 0.4 and 1.3 moles of alkali metal hydroxide per mole of phosphoric acid, and adjusting the solution to a pH of 2 or higher after completion of the reaction. The coating is deposited on the metal substrate by electrodeposition and comprises about 70% to about 99.5% by weight of zinc, and about 0.10% to about 10% by weight of silicon, and about 0.5% to about 20% by weight of phosphorus.The resultant zinc/silicon/phosphorus coating improves the resistance of the metal substrate to corrosion, wear, galling and stress corrosion cracking.
    Type: Grant
    Filed: August 16, 1984
    Date of Patent: August 6, 1985
    Assignee: Kollmorgan Technologies Corp.
    Inventors: Yu-Ling Teng, Charles McCoy, Francis DeFalco, Richard Mayernick
  • Patent number: 4511597
    Abstract: An improved method for making conductive metal patterns involving the steps of treating a substrate with a solution comprising a reducible salt of a non-noble metal and a light radiation sensitive reducing compound, exposing said substrate to light radiant energy, fixing with a solution comprised of a complexing agent followed by electroless deposition, the improvement comprising extending the bath life of said fixing solution by maintaining the concentration of the light sensitive reducing compound on the fixing solution so that it does not exceed 0.4 m moles/liter.
    Type: Grant
    Filed: October 12, 1983
    Date of Patent: April 16, 1985
    Assignee: Kollmorgen Technologies Corporation
    Inventors: Yu-Ling Teng, Richard Mayernik