Patents by Inventor Yu NAKAMURA

Yu NAKAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190226118
    Abstract: A silicon carbide epitaxial substrate includes a silicon carbide single-crystal substrate of one conductivity type, a first silicon carbide layer of the above-mentioned one conductivity type, a second silicon carbide layer of the above-mentioned one conductivity type, and a third silicon carbide layer of the above-mentioned one conductivity type. The silicon carbide single-crystal substrate has first impurity concentration. The first silicon carbide layer is provided on the silicon carbide single-crystal substrate, and has second impurity concentration that is lower than the first impurity concentration. The second silicon carbide layer is provided on the first silicon carbide layer, and has third impurity concentration that is higher than the first impurity concentration. The third silicon carbide layer is provided on the second silicon carbide layer, and has fourth impurity concentration that is lower than the second impurity concentration.
    Type: Application
    Filed: April 4, 2019
    Publication date: July 25, 2019
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yu Nakamura, Kazuya Konishi
  • Patent number: 10345725
    Abstract: An electrophotographic photoreceptor includes a conductive substrate and a single-layer-type photosensitive layer on the conductive substrate. The single-layer-type photosensitive layer contains a binder resin, a charge generating material, an electron transporting material, and two hole transporting materials having different redox potentials. The two hole transporting materials are a hole transporting material A and a hole transporting material B that has a redox potential lower than that of the hole transporting material A. The ratio A/B of a weight of the hole transporting material A to a weight of the hole transporting material B is about 12/1 or more and about 36/1 or less.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: July 9, 2019
    Assignee: FUJI XEROX CO., LTD.
    Inventor: Yu Nakamura
  • Publication number: 20190145021
    Abstract: An epitaxial substrate includes a single-crystal substrate of silicon carbide, and an epitaxial layer of silicon carbide disposed on the single-crystal substrate. The epitaxial layer includes a first epitaxial layer disposed on the single-crystal substrate, a second epitaxial layer disposed on the first epitaxial layer, and a third epitaxial layer disposed on the second epitaxial layer. The first epitaxial layer has a basal-plane-dislocation conversion rate of less than 95%. The second epitaxial layer has a basal-plane-dislocation conversion rate of more than 98%.
    Type: Application
    Filed: May 9, 2017
    Publication date: May 16, 2019
    Applicant: Mitsubishi Electric Corporation
    Inventors: Takanori TANAKA, Shigehisa YAMAMOTO, Yu NAKAMURA, Yasuhiro KIMURA, Shuhei NAKATA, Yoichiro MITANI
  • Publication number: 20190040545
    Abstract: A silicon carbide epitaxial substrate includes a silicon carbide single-crystal substrate of one conductivity type, a first silicon carbide layer of the above-mentioned one conductivity type, a second silicon carbide layer of the above-mentioned one conductivity type, and a third silicon carbide layer of the above-mentioned one conductivity type. The silicon carbide single-crystal substrate has first impurity concentration. The first silicon carbide layer is provided on the silicon carbide single-crystal substrate, and has second impurity concentration that is lower than the first impurity concentration. The second silicon carbide layer is provided on the first silicon carbide layer, and has third impurity concentration that is higher than the first impurity concentration. The third silicon carbide layer is provided on the second silicon carbide layer, and has fourth impurity concentration that is lower than the second impurity concentration.
    Type: Application
    Filed: November 30, 2016
    Publication date: February 7, 2019
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yu NAKAMURA, Kazuya KONISHI
  • Patent number: 10152013
    Abstract: An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer of a single-layer type disposed on the conductive substrate. The photosensitive layer has an absorption coefficient of 0.008 or less at a wavelength of 1000 nm and contains a binder resin, a charge generating material, an electron transporting material, and a hole transporting material. The charge generating material is at least one selected from a hydroxygallium phthalocyanine pigment and a chlorogallium phthalocyanine pigment and is contained in an amount of 0.9% by weight or more and 1.8% by weight or less relative to the binder resin.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: December 11, 2018
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Keisuke Kusano, Yu Nakamura
  • Publication number: 20180088516
    Abstract: An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer of a single-layer type disposed on the conductive substrate. The photosensitive layer has an absorption coefficient of 0.008 or less at a wavelength of 1000 nm and contains a binder resin, a charge generating material, an electron transporting material, and a hole transporting material. The charge generating material is at least one selected from a hydroxygallium phthalocyanine pigment and a chlorogallium phthalocyanine pigment and is contained in an amount of 0.9% by weight or more and 1.8% by weight or less relative to the binder resin.
    Type: Application
    Filed: March 8, 2017
    Publication date: March 29, 2018
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Keisuke KUSANO, Yu NAKAMURA
  • Publication number: 20180052400
    Abstract: An electrophotographic photoreceptor includes a conductive substrate and a single-layer-type photosensitive layer on the conductive substrate. The single-layer-type photosensitive layer contains a binder resin, a charge generating material, an electron transporting material, and two hole transporting materials having different redox potentials. The two hole transporting materials are a hole transporting material A and a hole transporting material B that has a redox potential lower than that of the hole transporting material A. The ratio A/B of a weight of the hole transporting material A to a weight of the hole transporting material B is about 12/1 or more and about 36/1 or less.
    Type: Application
    Filed: March 6, 2017
    Publication date: February 22, 2018
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Yu NAKAMURA
  • Patent number: 9891579
    Abstract: A cleaning member includes a base member comprised of a first material that has a peak temperature of tan ? less than approximately zero degrees Celsius and a contact portion comprised of a second material that has a higher hardness than the first material and a tear strength of approximately 49 kilonewtons per meter or higher, the contact portion contacting an image carrier and cleaning the image carrier.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: February 13, 2018
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Noriaki Kojima, Yu Nakamura
  • Patent number: 9804552
    Abstract: A cleaning blade that contacts a cleaning target member having a cleaning target surface which moves, and cleans the cleaning target surface, includes a blade body; and a blade protrusion that is present at an end portion of a lower surface of the blade body near a distal end surface of the blade body, has a shape protruding outward in a thickness direction with respect to the lower surface, and has an inclined surface being a surface continued from the distal end surface and inclined outward in the thickness direction with respect to the lower surface and inward in a height direction with respect to the distal end surface from an end of the distal end surface near the lower surface. At least a portion of the incline surface is a contact surface that contacts the cleaning target member.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: October 31, 2017
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Daisuke Tano, Yu Nakamura
  • Publication number: 20170285553
    Abstract: A cleaning blade that contacts a cleaning target member having a cleaning target surface which moves, and cleans the cleaning target surface, includes a blade body; and a blade protrusion that is present at an end portion of a lower surface of the blade body near a distal end surface of the blade body, has a shape protruding outward in a thickness direction with respect to the lower surface, and has an inclined surface being a surface continued from the distal end surface and inclined outward in the thickness direction with respect to the lower surface and inward in a height direction with respect to the distal end surface from an end of the distal end surface near the lower surface. At least a portion of the incline surface is a contact surface that contacts the cleaning target member.
    Type: Application
    Filed: August 8, 2016
    Publication date: October 5, 2017
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Daisuke TANO, Yu NAKAMURA
  • Patent number: 9709946
    Abstract: A cleaning blade includes a polyurethane member that constitutes at least a contact portion that comes in contact with a member to be cleaned. The polyurethane member contains a polyurethane containing a hard segment component and a soft segment component. The hard segment component has a domain particle size of about 45 nm or more and about 100 nm or less.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: July 18, 2017
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Daisuke Tano, Yu Nakamura, Noriaki Kojima, Kei Tanaka, Shintaro Kikuchi, Yuko Kawase
  • Publication number: 20170068206
    Abstract: A cleaning blade includes a polyurethane member that constitutes at least a contact portion that comes in contact with a member to be cleaned. The polyurethane member contains a polyurethane containing a hard segment component and a soft segment component. The hard segment component has a domain particle size of about 45 nm or more and about 100 nm or less.
    Type: Application
    Filed: February 12, 2016
    Publication date: March 9, 2017
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Daisuke TANO, Yu NAKAMURA, Noriaki KOJIMA, Kei TANAKA, Shintaro KIKUCHI, Yuko KAWASE
  • Patent number: 9488953
    Abstract: A cleaning blade includes a polyurethane member that contains a polyurethane, the polyurethane member constituting at least a contact portion that comes in contact with a member to be cleaned. An infrared absorption spectrum obtained by infrared spectroscopy of the polyurethane member has a peak intensity ratio (A/B) of about 1.1 or more, where A represents an intensity of a spectral peak due to a carbonyl group that does not form a hydrogen bond, the spectral peak appearing in a range of about 1,730 cm?1 or more and about 1,740 cm?1 or less, and B represents an intensity of a spectral peak due to a carbonyl group that forms a hydrogen bond, the spectral peak appearing in a range of about 1,670 cm?1 or more and about 1,720 cm?1 or less.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: November 8, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Yu Nakamura, Daisuke Tano, Kei Tanaka
  • Patent number: 9405233
    Abstract: A sliding member includes a base material including a contact area which contacts with a member to be slid, wherein a Young's modulus E1 with respect to the thickness of the contact area from a surface of the contact area is from 10 MPa to 200,000 MPa and a thickness T of the contact area is from 10 nm to 500 nm.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: August 2, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Yu Nakamura, Daisuke Tano, Masato Ono, Daisuke Tanaka, Masayuki Seko
  • Publication number: 20160187814
    Abstract: A sliding member includes a base material including a contact area which contacts with a member to be slid, wherein a Young's modulus E1 with respect to the thickness of the contact area from a surface of the contact area is from 10 MPa to 200,000 MPa and a thickness T of the contact area is from 10 nm to 500 nm.
    Type: Application
    Filed: May 27, 2015
    Publication date: June 30, 2016
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Yu NAKAMURA, Daisuke TANO, Masato ONO, Daisuke TANAKA, Masayuki SEKO
  • Publication number: 20160161250
    Abstract: The purpose of the present invention is to more quickly and easily measure the shape of an object to be measured.
    Type: Application
    Filed: July 17, 2014
    Publication date: June 9, 2016
    Inventor: Yu NAKAMURA
  • Patent number: 9354559
    Abstract: Disclosed is a cleaning blade of which a contact portion brought into contact with at least a member to be cleaned is formed of a polyurethane member that includes a polyurethane material containing a hard segment and a soft segment and has a ratio of an area occupied by a hard segment aggregate having a diameter of 0.3 ?m to 0.7 ?m in a cross section being in a range of 2% to 10%.
    Type: Grant
    Filed: January 27, 2015
    Date of Patent: May 31, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Yu Nakamura, Daisuke Tano, Masato Ono, Shintaro Kikuchi, Yuko Kawase, Noriaki Kojima, Tsutomu Sugimoto
  • Publication number: 20160147192
    Abstract: A cleaning member includes a base member comprised of a first material that has a peak temperature of tan ? less than approximately zero degrees Celsius and a contact portion comprised of a second material that has a higher hardness than the first material and a tear strength of approximately 49 kilonewtons per meter or higher, the contact portion contacting an image carrier and cleaning the image carrier.
    Type: Application
    Filed: May 22, 2015
    Publication date: May 26, 2016
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Noriaki KOJIMA, Yu NAKAMURA
  • Patent number: 9291985
    Abstract: A cleaning blade includes a member in which, in thermal analysis with a differential scanning calorimeter, a heat of crystal fusion ?H1 (mJ/mg) in a crystal fusion peak 1 in a range of about 70° C. or higher and lower than about 110° C., a heat of crystal fusion ?H2 (mJ/mg) in a crystal fusion peak 2 in a range of about 110° C. or higher and lower than about 170° C., and a heat of crystal fusion ?H3 (mJ/mg) in a crystal fusion peak 3 in a range of about 170° C. or higher and about 200° C. or lower satisfy formulae (1) to (4), the member constituting at least a contact portion that comes in contact with a member to be cleaned. ?H1+?H2>?H3??Formula (1) 0.0??H1?5.0??Formula (2) 0.1??H2??Formula (3) 0.0??H3?2.
    Type: Grant
    Filed: September 10, 2014
    Date of Patent: March 22, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Yu Nakamura, Daisuke Tano, Masato Ono
  • Publication number: 20160004190
    Abstract: Disclosed is a cleaning blade of which a contact portion brought into contact with at least a member to be cleaned is formed of a polyurethane member that includes a polyurethane material containing a hard segment and a soft segment and has a ratio of an area occupied by a hard segment aggregate having a diameter of 0.3 ?m to 0.7 ?m in a cross section being in a range of 2% to 10%.
    Type: Application
    Filed: January 27, 2015
    Publication date: January 7, 2016
    Inventors: Yu NAKAMURA, Daisuke TANO, Masato ONO, Shintaro KIKUCHI, Yuko KAWASE, Noriaki KOJIMA, Tsutomu SUGIMOTO