Patents by Inventor Yu-Tse Hsieh
Yu-Tse Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240168562Abstract: Glasses with gesture recognition function include a glasses frame and a gesture recognition system. The gesture recognition system is disposed on the glasses frame and configured to detect hand gestures in front of the glasses thereby generating a control command. The gesture recognition system transmits the control command to an electronic device to correspondingly control the electronic device.Type: ApplicationFiled: January 15, 2024Publication date: May 23, 2024Inventors: HORNG-GOUNG LAI, EN-FENG HSU, MENG-HUAN HSIEH, YU-HAO HUANG, NIEN-TSE CHEN
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Publication number: 20240124350Abstract: A quantum dot composite structure and a method for forming the same are provided. The quantum dot composite structure includes: a glass particle including a glass matrix and a plurality of quantum dots located in the glass matrix, wherein at least one of the plurality of quantum dots includes an exposed surface in the glass matrix; and an inorganic protective layer disposed on the glass particle and covering the exposed surface.Type: ApplicationFiled: October 13, 2023Publication date: April 18, 2024Inventors: Ching LIU, Wen-Tse HUANG, Ru-Shi LIU, Pei Cong YAN, Chai-Chun HSIEH, Hung-Chun TONG, Yu-Chun LEE, Tzong-Liang TSAI
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Patent number: 11954259Abstract: Glasses with gesture recognition function include a glasses frame and a gesture recognition system. The gesture recognition system is disposed on the glasses frame and configured to detect hand gestures in front of the glasses thereby generating a control command. The gesture recognition system transmits the control command to an electronic device to correspondingly control the electronic device.Type: GrantFiled: March 8, 2021Date of Patent: April 9, 2024Assignee: PIXART IMAGING INC.Inventors: Horng-Goung Lai, En-Feng Hsu, Meng-Huan Hsieh, Yu-Hao Huang, Nien-Tse Chen
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Patent number: 8859044Abstract: Disclosed is a method of forming a graphene layer, including: putting a substrate in a chamber of an electron cyclotron resonance device, and then evacuating the chamber. Conducting a carbon-containing gas into the chamber, wherein the carbon-containing gas has a pressure of 10?2 torr to 10?4 torr in the chamber. Heating the substrate until the substrate has a temperature of 100° C. to 600° C., and using a microwave with an electron cyclotron resonance mechanism to excite the carbon-containing gas to deposit a graphene layer on the substrate.Type: GrantFiled: September 13, 2012Date of Patent: October 14, 2014Assignee: Industrial Technology Research InstituteInventors: Kun-Ping Huang, Chih-Chen Chang, Yu-Tse Hsieh, Po-Wen Chiu, Henry Medina
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Patent number: 8808492Abstract: A method of joining superconductor materials is described. A microwave chamber including a first heat absorption plate and a second heat absorption plate corresponding to the first absorption plate is provided. A first superconductor material and a second superconductor material are disposed between the first heat absorption plate and the second heat absorption plate in the microwave chamber. The first superconductor material and the second superconductor material have an overlapping region therebetween, and a pressure is applied to the first heat absorption plate and the second heat absorption plate. Microwave power is supplied to the microwave chamber. The first heat absorption plate and the second heat absorption plate transform the microwave power into thermal energy so as to join the first superconductor material and the second superconductor material at the overlapping region.Type: GrantFiled: June 6, 2012Date of Patent: August 19, 2014Assignee: Industrial Technology Research InstituteInventors: Kun-Ping Huang, Chih-Chen Chang, Yu-Tse Hsieh, Chih-Wei Luo, Chih-Hsiang Su, Wen-Yen Tzeng
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Publication number: 20140170057Abstract: Disclosed is an apparatus for manufacturing graphene sheets. The apparatus includes a gas tube, and a hydrocarbon gas source connected to a front part of the gas tube for providing a hydrocarbon gas through the gas tube. The apparatus also includes a microwave generator to generate a microwave passing a middle part of the gas tube through a waveguide tube to form a microwave plasma torch from the hydrocarbon gas, wherein the hydrocarbon gas is cracked by the microwave plasma torch to form graphene sheets. The apparatus includes a tube collector connected to a back part of the gas tube for collecting the graphene sheets.Type: ApplicationFiled: April 2, 2013Publication date: June 19, 2014Applicant: Industrial Technology Research InstituteInventors: Kun-Ping Huang, Chih-Chen Chang, Chwung-Shan Kou, Yu-Tse Hsieh
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Patent number: 8603402Abstract: A microwave-excited plasma device is proposed. The device comprises of a plurality of microwave plasma reaction units which are capable of generating plasma independently such that a large-area plasma is able to be generated by all of the units. Besides, the high cost of the large-area microwave coupling window and its deformation together with possible breakage caused by atmospheric pressure can be prevented. Moreover, when a plurality of permanent magnets is assembled upon each of the plasma reaction units, the microwave-excited plasma device is improved to be a large-area electron cyclotron resonance (ECR) plasma device.Type: GrantFiled: May 19, 2011Date of Patent: December 10, 2013Assignee: Industrial Technology Research InstituteInventors: Chih-Chen Chang, Kun-Ping Huang, Yu-Tse Hsieh
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Publication number: 20130168229Abstract: Disclosed is a method of forming a graphene layer, including: putting a substrate in a chamber of an electron cyclotron resonance device, and then vacuuming the chamber. Conducting a carbon-containing gas into the chamber, wherein the carbon-containing gas has a pressure of 10?2 torr to 10?4 torr in the chamber. Heating the substrate until the substrate has a temperature of 100° C. to 600° C., and using a microwave with an electron cyclotron resonance mechanism to excite the carbon-containing gas to deposit a graphene layer on the substrate.Type: ApplicationFiled: September 13, 2012Publication date: July 4, 2013Inventors: Kun-Ping HUANG, Chih-Chen CHANG, Yu-Tse HSIEH, Po-Wen Chiu, Henry Medina
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Publication number: 20130164208Abstract: Disclosed is a method of forming graphene. A graphite positive electrode (or positive electrode together with graphite material) wrapped in a semipermeable membrane and a negative electrode are dipped in an acidic electrolyte to conduct an electrolysis process. As such, a first graphene oxide having a size larger than a pore size of the semipermeable membrane is exfoliated from the graphite positive electrode (or the graphite material). The electrolysis process is continuously conducted until a second graphene oxide is exfoliated from the first graphene oxide, wherein the second graphene oxide has a size which is smaller than the pore size of the semipermeable membrane to penetrate through the semipermeable membrane. The second graphene oxide diffused into the acidic electrolyte outside of the semipermeable membrane is collected. Finally, the collected second graphene oxide is chemically reduced to obtain a graphene.Type: ApplicationFiled: July 13, 2012Publication date: June 27, 2013Inventors: Yu-Tse HSIEH, Kun-Ping HUANG, Pang LIN
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Publication number: 20130157868Abstract: A method of joining superconductor materials is described. A microwave chamber including a first heat absorption plate and a second heat absorption plate corresponding to the first absorption plate is provided. A first superconductor material and a second superconductor material are disposed between the first heat absorption plate and the second heat absorption plate in the microwave chamber. The first superconductor material and the second superconductor material have an overlapping region therebetween, and a pressure is applied to the first heat absorption plate and the second heat absorption plate. Microwave power is supplied to the microwave chamber. The first heat absorption plate and the second heat absorption plate transform the microwave power into thermal energy so as to join the first superconductor material and the second superconductor material at the overlapping region.Type: ApplicationFiled: June 6, 2012Publication date: June 20, 2013Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Kun-Ping Huang, Chih-Chen Chang, Yu-Tse Hsieh, Chih-Wei Luo, Chih-Hsiang Su, Wen-Yen Tzeng
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Publication number: 20120177542Abstract: A microwave-excited plasma device is proposed. The device comprises of a plurality of microwave plasma reaction units which are capable of generating plasma independently such that a large-area plasma is able to be generated by all of the units. Besides, the high cost of the large-area microwave coupling window and its deformation together with possible breakage caused by atmospheric pressure can be prevented. Moreover, when a plurality of permanent magnets is assembled upon each of the plasma reaction units, the microwave-excited plasma device is improved to be a large-area electron cyclotron resonance (ECR) plasma device.Type: ApplicationFiled: May 19, 2011Publication date: July 12, 2012Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chih-Chen Chang, Kun-Ping Huang, Yu-Tse Hsieh