Patents by Inventor Yu-Wei Tu
Yu-Wei Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240119667Abstract: A reconstruction method of a three dimensional (3D) model and a computing apparatus are provided. In the method, multiple structures in the 3D model are determined. An object in the 3D model is separated from an original location to form a hollow. The hollow is adjacent to at least two neighboring structures among the structures. The neighboring structures are respectively extended to cover the hollow. A similarity of an extended part covering the hollow is determined. The similarity is a compared result of an adjacent structure of the extended part. A target structure of the hollow is determined according to the similarity. The target structure is used for compensating the hollow.Type: ApplicationFiled: August 24, 2023Publication date: April 11, 2024Inventor: Yu-Wei Tu
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Publication number: 20240119622Abstract: An object recognition method of a three-dimensional (3D) space and a computing apparatus are provided. In the method, multiple sensing points in the 3D space are allocated to multiple areas. The 3D space is established by the sensing points generated by scanning a space. Multiple 2D images of each of the areas are captured. The 2D images of each of the areas are recognized. One or more objects in the 3D space are determined according to a recognized result of the 2D images of the areas. Accordingly, the object in the 3D space may be recognized.Type: ApplicationFiled: August 23, 2023Publication date: April 11, 2024Inventor: Yu-Wei Tu
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Publication number: 20240119316Abstract: An arrangement recommendation method of a three-dimensional (3D) space and a computing apparatus are provided. In the method, a 3D space is obtained, and the 3D space is established by scanning a space. Attribute information of the 3D space is identified, and the attribute information includes appearance measurement, space type, furniture type, and/or furniture style. Recommendation information of the 3D space is provided according to the attribute information, and the recommendation information includes a style recommendation and/or a furniture recommendation. Accordingly, the decision-making time for recommendation may be reduced.Type: ApplicationFiled: August 24, 2023Publication date: April 11, 2024Inventor: Yu-Wei Tu
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Publication number: 20240077762Abstract: A display is disclosed. The display comprises a display panel, and an optical film disposed on a viewing side of the display panel. The optical film has a total haze ranging from 15% to 60%, an inner haze less than or equal to 10%, and a reflectivity satisfying the relationships of 0.35%?(RSCI-RSCE)?1.50% and RSCE?1.50%, wherein RSCI is an average reflectivity of diffuse component and specular component, and RSCE is an average reflectivity of diffuse component. By adjusting the total haze, inner haze and reflectivity of the optical film to satisfy the above relationship, the display can have good anti-glare properties, and the contrast ratio of the display will not be reduced too much to avoid the display quality be affected.Type: ApplicationFiled: April 10, 2023Publication date: March 7, 2024Applicant: BenQ Materials CorporationInventors: Yu-Wei Tu, Chih-Wei Lin, Kuo-Hsuan Yu
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Publication number: 20240027669Abstract: An optical film applied for a viewing side of a display is disclosed. The optical film comprises a birefringent substrate with a birefringence difference not greater than 0.10 having a slow axis and a fast axis perpendicular to each other and an diffusing layer disposed on the birefringent substrate, wherein the total haze of the optical film ranges between 30% and 80% and the reflectivity of the optical film satisfies the relationship (RSCI?RSCE)?1.0%, and RSCE/(RSCI?RSCE)?1.6, wherein RSCI is an average reflectivity of diffuse component and specular component of the optical film, and RSCE is an average reflectivity of diffuse component of the optical film.Type: ApplicationFiled: April 10, 2023Publication date: January 25, 2024Applicant: BenQ Materials CorporationInventors: Yu-Wei Tu, Chih-Wei Lin, Kuo-Hsuan Yu
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Publication number: 20240027667Abstract: A polarizer applied for a viewing side of a display is disclosed. The polarizer comprises a polarizing layer with an absorption axis, and a protective film disposed on the viewing side surface of the polarizing layer. The protective film includes a birefringent substrate adjacent to the polarizing layer having a birefringence difference not greater than 0.10 and having a slow axis and a fast axis perpendicular to each other, wherein the slow axis is parallel to the absorption axis of the polarizing layer, and an interference elimination layer disposed on a display side surface of the birefringent substrate, wherein the interference elimination layer has a diffusing layer disposed on the birefringent substrate, and a refractive-index-matching layer disposed on the diffusing layer, wherein with the total haze of the protective film is between 30% and 75% and the reflectivity of the protective film satisfies the relationship (RSCI-RSCE)?1.0% and RSCE/(RSCI-RSCE)?1.Type: ApplicationFiled: April 10, 2023Publication date: January 25, 2024Applicant: BenQ Materials CorporationInventors: Yu-Wei Tu, Chih-Wei Lin, Kuo-Hsuan Yu
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Publication number: 20240029350Abstract: A computing apparatus and a model generation method are provided. In the method, multiple sensing data are fused to determine depth information of multiple sensing points, moving trajectories of one or more pixels in the image data are tracked according to the image data and the inertial measurement data through the visual inertial odometry (VIO) algorithm, and those sensing points are mapped into a coordinate system according to the depth information and the moving trajectories through the simultaneous localization and mapping (SLAM) algorithm, to generate a three-dimensional environment model. An object is set on the three-dimensional environment model through a setting operation. The shopping information of the object is provided.Type: ApplicationFiled: July 17, 2023Publication date: January 25, 2024Inventor: Yu-Wei Tu
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Patent number: 11639445Abstract: A high-haze anti-glare film is disclosed. The high-haze anti-glare film comprises a transparent substrate and an anti-glare layer on the substrate. The anti-glare layer comprises acrylate binder, amorphous silica microparticles and spherical organic polymer microparticles, wherein the spherical organic polymer microparticles are monodispersity and the average particle size thereof is smaller than that of the amorphous silica microparticles. The total haze (Ht) of the anti-glare film is more than 40%, and the total haze is the sum of the surface haze (Hs) and the inner haze (Hi) of the anti-glare film, and the inner haze (Hi) and the total haze (Ht) satisfy the relation 0.25<Hi/Ht<0.75. The present high-haze anti-glare film provides high anti-glare and anti-sparkling properties.Type: GrantFiled: January 3, 2022Date of Patent: May 2, 2023Assignee: BenQ Materials CorporationInventors: Che-Yu Ying, Yu-Wei Tu, Kuo-Hsuan Yu
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Publication number: 20230086813Abstract: A high-haze anti-glare film is disclosed. The high-haze anti-glare film comprises a transparent substrate and an anti-glare layer on the substrate. The anti-glare layer comprises acrylate binder, amorphous silica microparticles and spherical organic polymer microparticles, wherein the spherical organic polymer microparticles are monodispersity and the average particle size thereof is smaller than that of the amorphous silica microparticles. The total haze (Ht) of the anti-glare film is more than 40%, and the total haze is the sum of the surface haze (Hs) and the inner haze (Hi) of the anti-glare film, and the inner haze (Hi) and the total haze (Ht) satisfy the relation 0.25<Hi/Ht<0.75. The present high-haze anti-glare film provides high anti-glare and anti-sparkling properties.Type: ApplicationFiled: January 3, 2022Publication date: March 23, 2023Applicant: BenQ Materials CorporationInventors: Che-Yu Ying, Yu-Wei Tu, Kuo-Hsuan Yu
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Publication number: 20230092571Abstract: A high-haze anti-glare film is disclosed. The high-haze anti-glare film comprises a transparent substrate and an anti-glare layer on the substrate. The anti-glare layer comprises acrylate binder resin and amorphous silica microparticles. The total haze (Ht) of the anti-glare film is more than 20%, and the total haze is the sum of the surface haze (Hs) and the inner haze (Hi) of the anti-glare film, and the inner haze (Hi) and the total haze (Ht) satisfy the relation 0.01<Hi/Ht<0.25. The present high-haze anti-glare film provides high anti-glare and anti-sparkling properties.Type: ApplicationFiled: January 3, 2022Publication date: March 23, 2023Applicant: BenQ Materials CorporationInventors: Che-Yu Ying, Yu-Wei Tu, Kuo-Hsuan Yu
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Patent number: 8486729Abstract: A semiconductor light-emitting device having a thinned structure comprises a thinned structure formed between a semiconductor light-emitting structure and a carrier. The manufacturing method comprises the steps of forming a semiconductor light-emitting structure above a substrate; attaching the semiconductor light-emitting structure to a support; thinning the substrate to form a thinned structure; forming or attaching a carrier to the thinned substrate; and removing the support.Type: GrantFiled: May 23, 2012Date of Patent: July 16, 2013Assignee: Epistar CorporationInventors: Min-Hsun Hsieh, Chih-Chiang Lu, Chien-Yuan Wang, Yen-Wen Chen, Jui-Hung Yeh, Shih-Chin Hung, Yu-Wei Tu, Chun-Yi Wu, Wei-Chih Peng
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Publication number: 20120231560Abstract: A semiconductor light-emitting device having a thinned structure comprises a thinned structure formed between a semiconductor light-emitting structure and a carrier. The manufacturing method comprises the steps of forming a semiconductor light-emitting structure above a substrate; attaching the semiconductor light-emitting structure to a support; thinning the substrate to form a thinned structure; forming or attaching a carrier to the thinned substrate; and removing the support.Type: ApplicationFiled: May 23, 2012Publication date: September 13, 2012Inventors: Min-Hsun Hsieh, Chih-Chiang Lu, Chien-Yuan Wang, Yen-Wen Chen, Jui-Hung Yeh, Shih-Chin Hung, Yu-Wei Tu, Chun-Yi Wu, Wei-Chih Peng
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Patent number: 8207539Abstract: A semiconductor light-emitting device having a thinned structure comprises a thinned structure formed between a semiconductor light-emitting structure and a carrier. The manufacturing method comprises the steps of forming a semiconductor light-emitting structure above a substrate; attaching the semiconductor light-emitting structure to a support; thinning the substrate to form a thinned structure; forming or attaching a carrier to the thinned substrate; and removing the support.Type: GrantFiled: June 9, 2009Date of Patent: June 26, 2012Assignee: Epistar CorporationInventors: Min-Hsun Hsieh, Chih-Chiang Lu, Chien-Yuan Wang, Yen-Wen Chen, Jui-Hung Yeh, Shih-Chin Hung, Yu-Wei Tu, Chun-Yi Wu, Wei-Chih Peng
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Publication number: 20100308355Abstract: A semiconductor light-emitting device having a thinned structure comprises a thinned structure formed between a semiconductor light-emitting structure and a carrier. The manufacturing method comprises the steps of forming a semiconductor light-emitting structure above a substrate; attaching the semiconductor light-emitting structure to a support; thinning the substrate to form a thinned structure; forming or attaching a carrier to the thinned substrate; and removing the support.Type: ApplicationFiled: June 9, 2009Publication date: December 9, 2010Inventors: Min-Hsun HSIEH, Chih-Chiang LU, Chien-Yuan WANG, Yen-Wen CHEN, Jui-Hung YEH, Shih-Chin HUNG, Yu-Wei TU, Chun-Yi WU, Wei-Chih PENG
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Patent number: D571743Type: GrantFiled: October 10, 2007Date of Patent: June 24, 2008Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Yu-Wei Tu
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Patent number: D573969Type: GrantFiled: July 24, 2007Date of Patent: July 29, 2008Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Yu-Wei Tu
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Patent number: D575258Type: GrantFiled: September 3, 2007Date of Patent: August 19, 2008Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Yu-Wei Tu
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Patent number: D618192Type: GrantFiled: October 26, 2009Date of Patent: June 22, 2010Assignee: Hon Hai Precision Industry Co., Ltd.Inventors: Chien-Ju Huang, Chi-Hsiang Kao, Yu-Wei Tu
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Patent number: D623154Type: GrantFiled: November 4, 2009Date of Patent: September 7, 2010Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Yu-Wei Tu