Patents by Inventor Yu-Wen Chen

Yu-Wen Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240004526
    Abstract: The present disclosure provides a method and electronic apparatus for modifying pages of an electronic document, and the method is performed by the electronic apparatus and comprises the following steps: opening a first user operation interface; detecting whether a first input region is selected; when it is detected that the first input region is selected, displaying a plurality of first pages of a first electronic document on a page preview region and determining a first page change position located in the plurality of first pages according to a first operation event; detecting whether a second input region is selected; when it is detected that the second input region is selected, displaying a plurality of second pages of a second electronic document on the page preview region and determining at least one second page of the plurality of second pages according to a second operation event; and adding the at least one second page to the first page change position according to a third operation event.
    Type: Application
    Filed: June 27, 2023
    Publication date: January 4, 2024
    Inventors: YU-WEN CHEN, KAI-LIN SHIH
  • Publication number: 20240005103
    Abstract: This disclosure provides a method and a user apparatus for generating and applying a translation marker, and the method is performed by the user apparatus and comprises: opening an electronic document on a user operation interface; selecting at least one text string in the electronic document according to a first triggering event; and when a translation option is detected to be selected, performing the following steps: generating a code corresponding to the selected text string by using an operation function; and displaying a first translated text string of the first translation record on the user operation interface and generating a first translation marker associated with the first translated text string on the electronic document when it is determined that a first translation record associated with the code exists in the user apparatus.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 4, 2024
    Inventors: YU-WEN CHEN, CHIA-TING LEE, WEN-WEI LIN, KAI-LIN SHIH, CHING-YI CHIANG
  • Publication number: 20230402315
    Abstract: Double patterning techniques described herein may reduce corner rounding, etch loading, and/or other defects that might otherwise arise during formation of a deep trench isolation (DTI) structure in a pixel array. The double patterning techniques include forming a first set of trenches in a first direction and forming a second set of trenches in a second direction in a plurality of patterning operations such that minimal to no etch loading and/or corner rounding is present at and/or near the intersections of the first set of trenches and the second set of trenches.
    Type: Application
    Filed: August 10, 2023
    Publication date: December 14, 2023
    Inventors: Wei-Chao CHIU, Yu-Wen CHEN, Yong-Jin LIOU, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20230290637
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 14, 2023
    Inventors: Wei-Chao CHIU, Yong-Jin LIOU, Yu-Wen CHEN, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20230201291
    Abstract: A method for extracting flavone aglycones in Chrysanthemum morifolium is provided. The method includes: (a) immersing a Chrysanthemum morifolium raw material in water or an aqueous solution to perform an immersion procedure for 3.5 hours or more to obtain an immersion sample; and (b) adding an extraction solvent to the immersion sample to perform an extraction procedure 5-60 minutes to obtain an extract. The Chrysanthemum morifolium raw material includes at least one of the following parts of Chrysanthemum morifolium: whole plant, roots, stems, leaves and flowers.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 29, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hsin Jan YAO, Yu-Wen CHEN, Chu-Hsun LU, I-Hong PAN, Wen-Yin CHEN, Tsung-Lin YANG, Angela GOH
  • Patent number: 11658031
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Grant
    Filed: June 1, 2021
    Date of Patent: May 23, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chao Chiu, Yong-Jin Liou, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu
  • Patent number: 11603458
    Abstract: A black resin composition, a cured film, and a black filter are provided. The black resin composition includes: a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), a photoinitiator (E), a UV absorber (F), and a surfactant (G). The resin (D) includes a first resin having a weight-average molecular weight of 2,000 to 20,000. The first resin includes a structural unit having a fluorene ring and two or more ethylenically-polymerizable groups. The UV absorber (F) includes a benzylidene-based derivative.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: March 14, 2023
    Assignee: eChem Solutions Corp.
    Inventors: Chin-Chen Huang, Yu-Wen Chen, Yu-Lun Li, Chen-Wen Chiu
  • Publication number: 20230064879
    Abstract: A nanodrug particle includes alginate and a camptothecin compound. The camptothecin compound is grafted onto the alginate, and the alginate and the camptothecin compound self-assemble and form a nanosphere. The disclosure also provides a method for preparing a nanodrug particle; the method includes: modifying alginate to form alginate having amine groups; modifying a camptothecin compound to form a camptothecin compound having a carboxyl group; forming a camptothecin-alginate polymer by reacting the alginate having amine groups with the camptothecin compound having a carboxyl group, wherein the camptothecin-alginate polymer self-assembles in an aqueous solution and forms a nanosphere.
    Type: Application
    Filed: January 31, 2022
    Publication date: March 2, 2023
    Inventors: Dean-Mo LIU, Yung-Hsin CHANG, Yu-Wen CHEN
  • Publication number: 20230008235
    Abstract: A fixing assembly for mounting UV lamps includes a base, a first gear and a plurality of mounting modules. The first gear is arranged on one side of the base; the mounting modules are arranged around the first gear. The mounting module includes a first driving assembly, a second driving assembly and a support frame. The first driving assembly is used to drive the second driving assembly and the support frame to move circumferentially around the first gear in a considerably horizontal plane, and the second driving component is used to drive the support to move back in a considerably vertical direction. The support frame is used for mounting UV lamp. The flexibility of the fixing assembly is improved. The UV lamp may comprehensively irradiate and cure the photosensitive adhesive.
    Type: Application
    Filed: June 28, 2022
    Publication date: January 12, 2023
    Inventors: YEN-SHENG LIN, YU-WEN CHEN
  • Publication number: 20220285203
    Abstract: Double patterning techniques described herein may reduce corner rounding, etch loading, and/or other defects that might otherwise arise during formation of a deep trench isolation (DTI) structure in a pixel array. The double patterning techniques include forming a first set of trenches in a first direction and forming a second set of trenches in a second direction in a plurality of patterning operations such that minimal to no etch loading and/or corner rounding is present at and/or near the intersections of the first set of trenches and the second set of trenches.
    Type: Application
    Filed: June 1, 2021
    Publication date: September 8, 2022
    Inventors: Wei-Chao CHIU, Yu-Wen CHEN, Yong-Jin LIOU, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20220285155
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Application
    Filed: June 1, 2021
    Publication date: September 8, 2022
    Inventors: Wei-Chao CHIU, Yong-Jin LIOU, Yu-Wen CHEN, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU
  • Publication number: 20220277344
    Abstract: A targeted advertising method used in an electronic device targets and obtains a user posting on a social platform, wherein the target posting includes image information and text information. A first analysis of the image information, and a second analysis of the text information are carried out. The electronic device further generates an advertising message corresponding to the tone and emotional content as extracted by an AI process carried out in relation to the words used in and extracted from the target posting according to the results of the first and/or second analysis and publishes the advertising message at a relevant position in the target posting.
    Type: Application
    Filed: February 24, 2022
    Publication date: September 1, 2022
    Inventors: PO-CHENG CHEN, YU-TE LEE, YU-WEN CHEN
  • Patent number: 11341772
    Abstract: A device verification system includes an operation panel, a computer coupled to the operation panel, and a server coupled to the computer. The operation panel includes an image acquisition unit. The computer receives an image of an operator acquired by the image acquisition unit and acquires a facial image of the operator from the image. The server receives the facial image from the computer. The server stores a facial image of an authorized operator and is configured to compare the received facial image to the stored facial image to determine whether the operator is verified.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: May 24, 2022
    Assignee: Fulian Precision Electronics (Tianjin) Co., LTD.
    Inventors: Cheng-Yu Wang, Shih Chun Wang, Yu-Wen Chen
  • Publication number: 20220098398
    Abstract: A black resin composition, a cured film, and a black filter are provided. The black resin composition includes: a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), a photoinitiator (E), a UV absorber (F), and a surfactant (G). The resin (D) includes a first resin having a weight-average molecular weight of 2,000 to 20,000. The first resin includes a structural unit having a fluorene ring and two or more ethylenically-polymerizable groups. The UV absorber (F) includes a benzylidene-based derivative.
    Type: Application
    Filed: August 26, 2021
    Publication date: March 31, 2022
    Applicant: eChem Solutions Corp.
    Inventors: Chin-Chen Huang, Yu-Wen Chen, Yu-Lun Li, Chen-Wen Chiu
  • Publication number: 20210221946
    Abstract: A resin composition and a filter element are provided. The resin composition includes a black coloring agent (A), an ethylenically-unsaturated monomer (B), a solvent (C), a resin (D), and a photoinitiator (E). The black coloring agent (A) includes a titanium black (A-1) and a carbon black (A-2). Based on a total usage amount of 100 parts by weight of the titanium black (A-1) and the carbon black (A-2), a usage amount of the titanium black (A-1) is 50 parts by weight to 75 parts by weight.
    Type: Application
    Filed: January 7, 2021
    Publication date: July 22, 2021
    Applicant: eChem Solutions Corp.
    Inventors: Yu-Wen Chen, Yi-Lun Chiu, Chia-Hao Lou, Chen-Wen Chiu
  • Patent number: 10990844
    Abstract: A method for retrieving an object which becomes lost receives an image of an object from a camera device and analyzes the image to obtain features of the object. The features information comprises category of the object and other details such as serial number. Supplementary information of the object is input on a displayer, the supplemental information comprises time and location of a lost property office or other responsible authority in receiving an object apparently lost. Information according to the features of the object and the supplementary information is broadcast. A device facilitating the retrieval of such object is also disclosed.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: April 27, 2021
    Assignee: HONGFUJIN PRECISION ELECTRONICS(TIANJIN)CO., LTD.
    Inventors: Yu-Wen Chen, Cheng-Yu Wang, Shih-Yin Tseng
  • Publication number: 20210065195
    Abstract: A credit card transaction device fortified against fraudulent use includes a display screen and a processor. A method disclosed for the device and for a server in communication with the device includes obtaining basic information of a credit card and an image of a user; analyzing whether the image includes a face; extracting facial features from the image when the image includes the face; determining whether the facial features and the basic information are consistent with a basic information and facial features of a legitimate user which are stored. When the facial features and the basic information are consistent with the stored data, a password verification interface is provided and an entered password is verified with the stored password for consistency. The credit card transaction is performed when the entered password matches the stored password.
    Type: Application
    Filed: December 13, 2019
    Publication date: March 4, 2021
    Inventors: SHIH CHUN WANG, YU-WEN CHEN, PO-CHENG CHEN
  • Patent number: 10921119
    Abstract: A three dimensional image measurement system including a first optical system and a second optical system is provided. The first optical system is adapted to output a structural light beam and a zero order light beam. There is an angle between the structural light beam and the zero order light beam. The first optical system performs an optical operation to project the structural light beam to a three dimensional object to obtain three dimensional information of the three dimensional object. The second optical system is adapted to receive the zero order light beam and perform another optical operation by using the zero order light beam. The first optical system includes a plurality of optical elements. The value of the angle between the structural light beam and the zero order light beam is determined according to position parameters of the optical elements.
    Type: Grant
    Filed: October 25, 2017
    Date of Patent: February 16, 2021
    Assignee: Industrial Technology Research Institute
    Inventors: Yu-Wen Chen, Te-Mei Wang
  • Publication number: 20210027047
    Abstract: A device verification system includes an operation panel, a computer coupled to the operation panel, and a server coupled to the computer. The operation panel includes an image acquisition unit. The computer receives an image of an operator acquired by the image acquisition unit and acquires a facial image of the operator from the image. The server receives the facial image from the computer. The server stores a facial image of an authorized operator and is configured to compare the received facial image to the stored facial image to determine whether the operator is verified.
    Type: Application
    Filed: October 15, 2019
    Publication date: January 28, 2021
    Inventors: CHENG-YU WANG, SHIH CHUN WANG, YU-WEN CHEN
  • Publication number: 20200387738
    Abstract: A method for retrieving an object which becomes lost receives an image of an object from a camera device and analyzes the image to obtain features of the object. The features information comprises category of the object and other details such as serial number. Supplementary information of the object is input on a displayer, the supplemental information comprises time and location of a lost property office or other responsible authority in receiving an object apparently lost. Information according to the features of the object and the supplementary information is broadcast. A device facilitating the retrieval of such object is also disclosed.
    Type: Application
    Filed: July 22, 2019
    Publication date: December 10, 2020
    Inventors: YU-WEN CHEN, CHENG-YU WANG, SHIH-YIN TSENG