Patents by Inventor Yuh-Fong Hwang

Yuh-Fong Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for mask fabrication process control
    Patent number: 8082119
    Abstract: A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: December 20, 2011
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yuh-Fong Hwang, Chen-Yu Chang, Chiech-Yi Kuo, Wen-Yao Chen
  • METHOD AND SYSTEM FOR MASK FABRICATION PROCESS CONTROL
    Publication number: 20080015818
    Abstract: A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 17, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yuh-Fong Hwang, Chen-Yu Chang, Chiech-Yi Kuo, Wen-Yao Chen
  • Method and system for mask fabrication process control
    Patent number: 7260442
    Abstract: A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: August 21, 2007
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yuh-Fong Hwang, Chen-Yu Chang, Chiech-Yi Kuo, Wen-Yao Chen
  • Method and system for mask fabrication process control
    Publication number: 20050198609
    Abstract: A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.
    Type: Application
    Filed: March 3, 2004
    Publication date: September 8, 2005
    Inventors: Yuh-Fong Hwang, Chen-Yu Chang, Chiech-Yi Kuo, Wen-Yao Chen