Patents by Inventor Yuhao Luo

Yuhao Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Strain-silicon CMOS with dual-stressed film
    Patent number: 7214629
    Abstract: A semiconductor device has an NMOS portion and a PMOS portion. A first stress layer overlies a first channel to provide a first stress type to the channel and a first modified stress layer is formed from a portion of the first stress layer overlying a second channel. A second stress layer providing a second stress type overlies the first modified stress layer and a second modified stress layer is formed from a portion of the second stress layer overlying the first stress layer.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: May 8, 2007
    Assignee: Xilinx, Inc.
    Inventors: Yuhao Luo, Deepak Kumar Nayak