Abstract: The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.

Abstract: The present invention is aimed to perform precise monitoring of the processed amount by which a workpiece is processed, and includes a measurement unit that measures a concentration or a partial pressure of a reaction product generated while the workpiece is being processed, and an operation unit that calculates the processed amount of the workpiece using an output value of the measurement unit. The measurement unit includes: a laser light source that irradiates target gas containing the reaction product with a laser beam; a photodetector that detects a laser beam having passed through the target gas; and a signal processing unit that calculates the concentration or the partial pressure of the reaction product based on a detection signal of the photodetector. The operation unit includes a time integration unit; a relationship data storage unit; and a processed amount calculation unit.

Abstract: The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.

Abstract: In order to provide an absorbance analysis apparatus for DCR gas that can measure a concentration of a DCR gas by separating absorbance of the DCR gas alone even in a mixed gas consisting of the DCR gas and CO gas whose absorption spectrum overlaps each other, the absorbance analysis apparatus for DCR gas comprises a DCR filter 31 that is configured to transmit a light in a first wavenumber domain including an absorbance peak of the DCR gas, a CO filter 32 that is configured to transmit a light in a second wavenumber domain that is different from the first wavenumber domain, and a DCR gas volume calculator 4 that is configured to calculate volume of the DCR gas based on a first absorbance measured by the light transmitted through the DCR filter 31 and a second absorbance measured by the light transmitted through the CO filter 32.

Abstract: Provided are a gas cell into which a gas is introduced, a temperature control block configured to control a temperature of the gas cell, and a pressure sensor configured to measure a pressure inside the gas cell. The pressure sensor is built into the temperature control block and/or the gas cell.

Abstract: In order to prevent cracking of a window material in manufacturing an optical measurement cell that satisfies various performances required for airtightness, heat resistance, and the like by atomic diffusion bonding, an optical measurement cell into which a sample is introduced includes a light transmission window through which light is transmitted, and includes a window material forming the light transmission window, and a flange member to which the window material is bonded via a metal thin film, and a ratio of a thermal expansion coefficient of the flange member to a thermal expansion coefficient of the window material is 0.5 times or more and 1.5 times or less.

Abstract: In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure—absorbance relation storing part that stores a partial pressure—absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.

Abstract: In order to provide an absorbance analysis apparatus for DCR gas that can measure a concentration of a DCR gas by separating absorbance of the DCR gas alone even in a mixed gas consisting of the DCR gas and CO gas whose absorption spectrum overlaps each other, the absorbance analysis apparatus for DCR gas comprises a DCR filter 31 that is configured to transmit a light in a first wavenumber domain including an absorbance peak of the DCR gas, a CO filter 32 that is configured to transmit a light in a second wavenumber domain that is different from the first wavenumber domain, and a DCR gas volume calculator 4 that is configured to calculate volume of the DCR gas based on a first absorbance measured by the light transmitted through the DCR filter 31 and a second absorbance measured by the light transmitted through the CO filter 32.

Abstract: An absorption spectroscopic system is provided with a detector that detects an intensity of light transmitted through a gas, a total pressure sensor that measures a total pressure of the gas, an interference gas partial pressure-absorbance relationship storage unit that stores interference gas partial pressure-absorbance relationship data, an interference gas partial pressure estimation unit that estimates the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor, an interference gas absorbance conversion unit that converts an estimated partial pressure of the interference gas estimated by the interference gas partial pressure estimation unit into an absorbance of the interference gas based on the interference gas partial pressure-absorbance relationship data, and a target gas absorbance calculation unit that calculates an absorbance of the target gas based on output values from the detector and on the absorbance of the interference gas.

Abstract: The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.

Abstract: An absorption spectroscopic system is provided with a detector that detects an intensity of light transmitted through a gas, a total pressure sensor that measures a total pressure of the gas, an interference gas partial pressure-absorbance relationship storage unit that stores interference gas partial pressure-absorbance relationship data, an interference gas partial pressure estimation unit that estimates the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor, an interference gas absorbance conversion unit that converts an estimated partial pressure of the interference gas estimated by the interference gas partial pressure estimation unit into an absorbance of the interference gas based on the interference gas partial pressure-absorbance relationship data, and a target gas absorbance calculation unit that calculates an absorbance of the target gas based on output values from the detector and on the absorbance of the interference gas.

Abstract: In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure—absorbance relation storing part that stores a partial pressure—absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.

Abstract: The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

Abstract: Obtained is an absorbance meter capable of, when measuring high-temperature sample gas, without increasing the distance from a light source part to a light receiving part, protecting the light source part and the light receiving part from the heat of the sample gas and keeping measurement accuracy high. A sample accommodation part including an accommodation space for accommodating the sample gas, the light source part for radiating light into the accommodation space, the light receiving part for receiving light exiting from inside the accommodation space, a first insulation part disposed adjacent to the light source part side of the sample accommodation part, a second insulation part disposed adjacent to the light receiving part side of the sample accommodation part, a first cooling part disposed adjacent to the first insulation part, and a second cooling part disposed adjacent to the second insulation part are provided.

Abstract: The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.

Abstract: The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

Abstract: The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 ?m and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.

Abstract: The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 ?m and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.

Abstract: A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

Abstract: A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.