Abstract: Provided is a vacuum treatment device, when a lifting pin inserted to a through hole is moved up, a substrate on a placement table is placed on a lid member which is connected to an upper end of a lifting pin and is separated from a placement surface of the placement table. Additionally, when the lifting pin is moved down, the substrate comes into contact with the placement surface so as to be placed thereon. An annular seal member surrounding a periphery of an opening of the through hole is provided in a portion which faces the lid member in a bottom surface of a depression provided in the placement surface of the placement table. The lid member annularly comes into contact with the seal member when the lifting pin is moved down, and a space inside the through hole and a space outside the through hole are separate by the seal member, thereby preventing gas from flowing into the through hole.

Abstract: An inductively coupled plasma apparatus which is capable of performing etching processing steps in a stable manner and consecutively. Shield plates are provided in a reaction tube in the vicinity of an inner surface thereof. The shield plates prevent a conductive material generated by etching a wafer from sticking to the overall inner surface of the reaction tube. A portion of the inner wall covered by the shield plate, that is, a region where no conductive material is deposited serves as a high-frequency window, through which high-frequency electric power is efficiently fed from a coil antenna into the reaction tube. The conductive materials thus stuck separately from each other exhibit the Faraday shield effect, thereby stabilizing plasma potential.

Abstract: An inductively coupled plasma apparatus which is capable of performing etching processing steps in a stable manner and consecutively. Shield plates are provided in a reaction tube in the vicinity of an inner surface thereof. The shield plates prevent a conductive material generated by etching a wafer from sticking to the overall inner surface of the reaction tube. A portion of the inner wall covered by the shield plate, that is, a region where no conductive material is deposited serves as a high-frequency window, through which high-frequency electric power is efficiently fed from a coil antenna into the reaction tube. The conductive materials thus stuck separately from each other exhibit the Faraday shield effect, thereby stabilizing plasma potential.