Patents by Inventor Yuichiro Inatomi

Yuichiro Inatomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
    Publication number: 20060237127
    Abstract: To improve the surface roughness of a resist film formed on a wafer. In a coating and developing treatment system, a wafer W on which a resist film has been formed and subjected to exposure and developing treatment is adjusted to a predetermined temperature. A solvent gas is supplied to the surface of the temperature-adjusted wafer W to dissolve the surface of the resist film. The wafer W is then heated to volatilize the solvent in the resist film to thereby heat shrink the resist film. This levels the projections and depressions on the surface of the resist film so as to improve the surface roughness of the resist film.
    Type: Application
    Filed: May 31, 2004
    Publication date: October 26, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Yuichiro Inatomi