Abstract: A contactless charging coil unit includes a base member with an upper surface having a coil housing portion formed therein in a spiral shape in a direction from the central portion to the outer periphery side; a coil formed by winding a litz wire along the coil housing portion, the litz wire having been obtained by twisting together a plurality of round wires each having a circular cross-section and covered with an insulating film; a covering member adapted to cover an upper portion of the base member, the covering member having a lower surface with a projection corresponding to and fittable into the coil housing portion of the base member; and a sealing material for firmly fixing the coil between the base member and the covering member to form a watertight seal.

Abstract: A manufacturing method of a rectangular wire bundle product includes a bending step of bending an assembled wire composed of a plurality of strand wires having an insulating film into a predetermined shape, a rectangular shape formation step of forming the assembled wire bent into the predetermined shape in the bending step into a rectangular shape so that a cross section becomes a rectangular shape, and an integration step of integrating at least a part of the assembled wire formed into the rectangular shape in the rectangular shape formation step by thermal bonding.

Abstract: A method of forming a patterned thin film and a method of forming a magnetic pole of a thin-film magnetic head according to the invention comprise the steps of: forming a convex first patterned layer made of a first material on an electrode film that serves as a conductive base; forming a second patterned layer to be a frame, made of a nonconductive second material different from the first material, on the electrode film around the first patterned layer; making the second patterned layer into a frame by removing the first patterned layer, the frame having a groove formed by the removal of the first patterned layer; and forming a patterned thin film (pole portion layer) in the groove of the frame.

Abstract: Multiple exposure of a photoresist layer having an exposure depth depending upon the amount of exposure energy applied are executed at different respective exposure energy amounts through a plurality of respective photomasks with different respective opening patterns. The photoresist layer is then processed for image reversal.

Abstract: Multiple exposes of a photoresist layer of which exposure depth is controllable depending upon exposure amount are executed at different exposure amounts via a plurality of photomasks with different opening patterns, respectively.

Abstract: A method of forming a patterned thin film and a method of forming a magnetic pole of a thin-film magnetic head according to the invention comprise the steps of: forming a convex first patterned layer made of a first material on an electrode film that serves as a conductive base; forming a second patterned layer to be a frame, made of a nonconductive second material different from the first material, on the electrode film around the first patterned layer; making the second patterned layer into a frame by removing the first patterned layer, the frame having a groove formed by the removal of the first patterned layer; and forming a patterned thin film (pole portion layer) in the groove of the frame.

Abstract: Upon forming a metal film pattern having a desired shape, a first resist frame having a shape corresponding to said desired pattern is first formed on a substrate at least a surface of which is electrically conductive, a metal-plated film is deposited around the first resist frame by an electroplating process using the electrically conductive surface of the substrate as an electrode, and then said first resist frame is removed while said metal-plated film is remained to form, in the metal-plated film, a depressed portion having a shape which is a duplication of the pattern of the first resist frame. After forming, on the metal-plated film, a second resist frame having an opening which is communicated with said depressed portion, a metal film is formed by plating within a space defined by the depressed portion and the opening.

Abstract: A method for forming a photoresist film on a substrate, comprising: mounting a substrate on a supporting surface of a supporter so that a stepped portion is produced between the supporting surface and a top surface of the substrate; coating a photoresist on the top surface and a side surface of the substrate, the side surface showing up at the stepped portion; and then; blowing gas over the photoresist on the top surface to make the photoresist filmy.

Abstract: A method for forming a photoresist film on a substrate, includes mounting a substrate on a supporting surface of a supporter so that a stepped portion is produced between the supporting surface and a top surface of the substrate; coating a photoresist on the top surface and a side surface of the substrate, the side surface showing up at the stepped portion; and then; blowing gas over the photoresist on the top surface to make the photoresist a uniform film.