Abstract: A communication device according to an embodiment includes an interpreter, a storage, and a generator. The interpreter is configured to interpret a content of a message addressed to a target user. The storage stores information on a personal feature of the target user. The generator is configured to generate a response message simulating a response by the target user on the basis of the content of the message addressed to the target user, which is interpreted by the interpreter, and the information on the personal feature of the target user stored in the storage.

Abstract: An oxygen concentration is lowered in accordance with a set lowering process, and thereafter a heat treatment is performed. Accordingly, the heat treatment is performed to a substrate W while the oxygen concentration in a heat treating space HS is lowered. Consequently, a treatment atmosphere within the heat treating space is able to be made suitable for a heat treatment process, leading to appropriate film deposition. In addition, the oxygen concentration is lowered in accordance with a concentration level in recipes. This avoids an excessively lowered oxygen concentration, leading to prevention of reduced throughput.

Abstract: An image forming apparatus includes an image forming device and circuitry. The image forming device is configured to form an image on a medium. The circuitry is configured to detect a position of the image forming device relative to the medium. The circuitry is further configured to control the image forming device based on the position of the image forming device detected and image data. The circuitry is further configured to control a system state of the image forming device based on the position of the image forming device associated with movement of the image forming device relative to the medium.

Abstract: A nozzle is stored in a nozzle storage hole of a waiting pod. In this state, a cleaning liquid is discharged to an outer peripheral surface of the nozzle from a plurality of discharge ports. Thus, a coating liquid and its solidified matter adhering to the nozzle are dissolved and removed from the nozzle. Subsequently, a metal removal liquid is discharged from a plurality of discharge ports to the outer peripheral surface of the nozzle. Thus, a metallic component remaining on the nozzle is dissolved and removed from the nozzle. Further, pure water is discharged to the outer peripheral surface of the nozzle from the plurality of discharge ports, and the metal removal liquid adhering to the nozzle is cleaned away.

Abstract: A nozzle is stored in a nozzle storage hole of a waiting pod. In this state, a cleaning liquid is discharged to an outer peripheral surface of the nozzle from a plurality of discharge ports. Thus, a coating liquid and its solidified matter adhering to the nozzle are dissolved and removed from the nozzle. Subsequently, a metal removal liquid is discharged from a plurality of discharge ports to the outer peripheral surface of the nozzle. Thus, a metallic component remaining on the nozzle is dissolved and removed from the nozzle. Further, pure water is discharged to the outer peripheral surface of the nozzle from the plurality of discharge ports, and the metal removal liquid adhering to the nozzle is cleaned away.

Abstract: An image forming apparatus is configured to form an image on a recording medium by scanning of the image forming apparatus by a user. The image forming apparatus includes an image forming device and processing circuitry. The image forming device includes a plurality of image forming arrays. Each of the image forming arrays includes an image forming portion configured to form the image. The processing circuitry is configured to set an image forming array to be used to form the image, according to a use mode of the image forming apparatus.

Abstract: A wire harness including: a wire; a cover that covers an outer circumference of a portion of the wire in a length direction thereof; an electromagnetic wave absorber mounted on an outer circumference of the cover; and a fixing member that fixes one end of the cover in a length direction thereof to the wire, wherein: the electromagnetic wave absorber includes a ring-shaped magnetic substance core, and a ring-shaped case in which the magnetic substance core is housed, the cover includes a first latch formed on an outer circumferential surface of the cover, and the case includes a second latch that latches to the first latch in the length direction of the cover.

Abstract: An oxygen concentration is lowered in accordance with a set lowering process, and thereafter a heat treatment is performed. Accordingly, the heat treatment is performed to a substrate W while the oxygen concentration in a heat treating space HS is lowered. Consequently, a treatment atmosphere within the heat treating space is able to be made suitable for a heat treatment process, leading to appropriate film deposition. In addition, the oxygen concentration is lowered in accordance with a concentration level in recipes. This avoids an excessively lowered oxygen concentration, leading to prevention of reduced throughput.

Abstract: A storage control apparatus includes a memory to store meta-information associating a position of a logical area with a position of a physical area, and a processor to, when a first data block including data, a check code corresponding to the data, and first information related to a position within the logical area is stored in the physical area, and a second data block including the data, the check code, and second information related to a position within the logical area is written in the logical area, obtain a first position at which the first data block is present in the physical area, based on meta-information of the first data block in the meta-information, associate the first position as a position of the physical area in meta-information of the second data block in the meta-information with the position to which the second data block is written in the logical area.

Abstract: An exposure device has a cylindrical peripheral wall member. The peripheral wall member forms a processing space in which a substrate is storable and has an upper opening and a lower opening. Further, a light emitter is provided in an upper portion of the peripheral wall member to close the upper opening. A lower lid member that is provided to be movable in an up-and-down direction and configured to be capable of closing and opening the lower opening is provided below the peripheral wall member. The atmosphere in the processing space is replaced with an inert gas with the substrate stored in the processing space and the lower opening closed by the lower lid member. In this state, vacuum ultraviolet rays are emitted to the substrate from the light emitter, and the substrate is exposed.

Abstract: Exhaust of gas in the processing chamber is started by a gas exhaust section, and supply of an inert gas into the processing chamber is started by a gas supply section after a predetermined time length has elapsed since the exhaust of gas is started. Alternatively, the gas in the processing chamber in which a substrate is stored is exhausted by the gas exhaust section, the inert gas is supplied into the processing chamber by the gas supply section, and the pressure in a light emitter that has a light-transmitting plate is allowed to match or be close to the pressure in the processing chamber. The substrate in the processing chamber is irradiated with vacuum ultraviolet rays by the light emitter with an oxygen concentration in the gas in the processing chamber lowered to a predetermined concentration. Thus, the substrate is exposed.

Abstract: A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.

Abstract: Disclosed is a substrate treating method for performing a heat treatment of a substrate having a treated film formed thereon in a heat treating space of a heat treating chamber. The method includes an exhaust step of performing exhaust of gas within the heat treating space, an inert gas supply step of supplying inert gas into the heat treating space, and a heat treating step of performing the heat treatment of the substrate in the heat treating space.

Abstract: Disclosed is a substrate treating method for treating a substrate with a directed self-assembly material applied thereto. The substrate treating method includes a heating step and a cooling step. The heating step includes heating the substrate to perform phase separation of the directed self-assembly material by maintaining an interior of a treatment container in a non-oxidizing gas atmosphere and placing the substrate at a heating position. The cooling step includes cooling the substrate by maintaining the interior of the treatment container in the non-oxidizing gas atmosphere, placing the substrate at a cooling position further away from the heating unit than the heating position, supplying non-oxidizing gas into the treatment container, and exhausting gas within the treatment container.

Abstract: Disclosed is a substrate treating method for performing a heat treatment of a substrate in a heat treating space. The method includes a loading step of loading the substrate on support pins, an exhaust step of exhausting gas within the heat treating space, an inert gas supply step of supplying inert gas into the heat treating space, an under-substrate space gas discharging step of discharging gas within an under-substrate space between the substrate and the top face of the heat treating plate, and a heat treating step of retracting the support pins into the heat treating plate, and performing the heat treatment of the substrate placed on the top face of the heat treating plate in the heat treating space.

Abstract: A substrate transfer apparatus includes a base, an arm, an end effector provided at a tip of the arm and having a first tip portion and a second tip portion that are bifurcated, a light emitting unit, a light receiving unit, and a control device controlling an operation of the arm. The control device controls an operation of the arm so that light straightly traveling through a tip of the end effector scans edges of a plurality of substrates accommodated in a front opening unified pod (FOUP), unit with shape patterns of a reference waveform for comparison according to a relative positional relationship between the light and the substrate during the operation of the arm and diagnoses at least one of a state of the substrate, a state of the FOUP, and a state of the end effector based on a comparison result.

Abstract: A storage control device, includes: a memory configured to store meta information and map information, the meta information associates a logical address to identify data from an information processing device which uses a storage with a data block identifier to identify a data block used for an arrangement of the data on the storage and including a header area and a payload area and an index indicating an order of additional writing of the data, the map information associates the data block identifier with a physical identifier indicating a physical position on the storage; and a processor specifies the data block and a write position in a payload area based on the physical identifier and the index, writes the data in the specified data block and performs a write control to write a data unit header including an offset and a data length at a position designated by the index.

Abstract: A substrate is held and rotated by a spin chuck, and a coating liquid is discharged to the substrate. The coating liquid that is splashed outwardly from the substrate is received by an outer cup. A cleaning liquid that has been discharged from a cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a first guide to clean the outer cup. Thus, the coating liquid, its solidified matter and the like adhering to the outer cup are dissolved and removed from the outer cup. Subsequently, a metal removal liquid that has been discharged from the cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a second guide. Thus, a metallic component remaining on the outer cup is dissolved and removed from the outer cup.

Abstract: A light-diffuser includes a transparent resin and transparent particles dispersed in the transparent resin. The transparent resin has a refractive index different from that of the transparent particles, and at least one portion of an outer perimeter of each of the transparent particles, respectively, is made compatible with the transparent resin disposed in the vicinity of the transparent particles, respectively.

Abstract: A substrate on which a processing film made of a directed self-assembly material is formed is placed on a holding plate incorporating a preheating mechanism, and is preheated. A low oxygen atmosphere surrounds the substrate. A preheating temperature is a temperature at which the directed self-assembly material comprised of two types of polymers is phase-separated. By preheating the processing film, the two types of polymers are phase-separated to form a fine pattern. The processing film is irradiated with flashes of light from flash lamps while being preheated. This increases the fluidity of the polymers constituting the processing film to achieve the formation of a fine pattern while suppressing the occurrence of defects.