Patents by Inventor Yuji Tashiro

Yuji Tashiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972910
    Abstract: An electrolytic capacitor includes an electrode foil and a lead member connected to the electrode foil. The electrode foil has a first principal surface and a second principal surface opposite to the first principal surface. The electrode foil and the lead member are connected by a caulking part in an overlapping part in which the first principal surface of the electrode foil and the lead member overlap each other. The caulking part has a through-hole penetrating the electrode foil and the lead member. The electrode foil in the caulking part includes a first folded part that is folded back at a peripheral edge portion of the through-hole to be disposed on the second principal surface. The lead member in the caulking part includes (i) a penetrating part that penetrates the electrode foil and (ii) a second folded part that is folded back at an end portion of the penetrating part to be disposed on the second principal surface. The penetrating part includes an inner wall of the through-hole.
    Type: Grant
    Filed: October 15, 2022
    Date of Patent: April 30, 2024
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Yuji Otsuka, Masahiro Aburaya, Tatsuji Aoyama, Tomoyuki Tashiro
  • Patent number: 11466127
    Abstract: [Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: October 11, 2022
    Assignee: MERCK PATENT GMBH
    Inventors: Takashi Fujiwara, Yuji Tashiro
  • Publication number: 20220316534
    Abstract: A power transmission system is provided, which includes a biasing member configured to bias a second power-transmission member in a rotational direction with respect to a first power-transmission member by a spline part of the biasing member being engaged with a spline part of the second power-transmission member while the biasing member is locked by the first power-transmission member and a spring part thereof is in a first elastically displaced state, and a temporarily fixing member having a temporarily fixing part which temporarily fixes the biasing member to the first power-transmission member in a second elastically displaced state with greater elastic displacement than in the first state. The second power-transmission member is provided, on a first axial side of the spline part, with a canceling part configured to cancel the temporary fixing of the biasing member to the first power-transmission member by the temporarily fixing part.
    Type: Application
    Filed: February 18, 2022
    Publication date: October 6, 2022
    Inventors: Kotaro Suzuki, Koichi Ando, Nobuyuki Matsubara, Yuji Tashiro
  • Publication number: 20210230374
    Abstract: [Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.
    Type: Application
    Filed: May 29, 2019
    Publication date: July 29, 2021
    Inventors: Takashi FUJIWARA, Yuji TASHIRO
  • Patent number: 10859733
    Abstract: An optical functional film containing a siliceous material, wherein a refractive index nA of one surface A of said optical functional film to light is larger than a refractive index nb of the other side surface B to light, and the refractive index to light gradually decreases from said surface A to said surface B and wherein when a refractive index of a medium X coming into contact with said surface A is nx and a refractive index of a medium Y coming into contact with said surface B is ny, the relation ny<nb<na<nx is satisfied and wherein the film is manufactured by the steps of a first layer forming step and a second layer forming step; and a heating step of heating to cure said first layer and said second layer, wherein the contacting parts of said first layer and said second layer are compatibilized.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: December 8, 2020
    Assignee: Merck Patent GmbH
    Inventors: Toshiakai Nonaka, Naofumi Yoshida, Yuji Tashiro
  • Patent number: 10435513
    Abstract: An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: October 8, 2019
    Assignee: Ridgefield Acquisition
    Inventors: Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Toshiaki Nonaka
  • Publication number: 20180179337
    Abstract: [Problem] An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. [Means for Solution] Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.
    Type: Application
    Filed: February 21, 2018
    Publication date: June 28, 2018
    Inventors: Naofumi YOSHIDA, Yuji TASHIRO, Daishi YOKOYAMA, Toshiaki NONAKA
  • Publication number: 20180149774
    Abstract: [Problem] To provide an optical functional film having less light reflection and having less wavelength dependency of transmittance, and a method for manufacturing the same. [Means for Solution] An optical functional film, wherein a refractive index nA of one surface A of the optical functional film to light is larger than a refractive index nB of the other side surface B to light, and the refractive indices to light decreases gradually from the surface A to the surface B. The optical functional film can be manufactured by conducting multi-layer coating using compositions comprising two kinds of polysiloxane and of solvent on a substrate, compatibilizing the contacting parts of two layers, and thereafter heating them to cure.
    Type: Application
    Filed: April 13, 2016
    Publication date: May 31, 2018
    Inventors: Toshiakai NONAKA, Naofumi YOSHIDA, Yuji TASHIRO
  • Patent number: 9817312
    Abstract: A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: R1nSi(X)4-n (wherein R1 represents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein R2 to R7 independently represent an alkyl group or the like; M1 and M2 independently represent an arylene group, an alkylene group or the like; and Y1 to Y6 independently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film. When the composition is coated onto a substrate, is then heated or exposed to light, is then developed if necessary, and is then heated and cured at a low temperature, a cured film can be formed.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: November 14, 2017
    Assignee: AZ Electronic Materials (Luxembourg) S.à r.l.
    Inventors: Naofumi Yoshida, Yuji Tashiro
  • Patent number: 9684240
    Abstract: To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: June 20, 2017
    Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.
    Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 9580567
    Abstract: A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 ?/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
    Type: Grant
    Filed: November 14, 2013
    Date of Patent: February 28, 2017
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Toshiaki Nonaka, Daishi Tokoyama, Takashi Fuke, Yuji Tashiro
  • Patent number: 9505888
    Abstract: [Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed. [Means for Solution] Provided are: a method of producing a composite of metal oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal, or a silane monomer with metal oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in an aqueous solvent in the presence of a phase transfer catalyst; and a composite produced by the method.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: November 29, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Toshiaki Nonaka
  • Publication number: 20160266490
    Abstract: A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: R1nSi (X) 4-. (wherein R1 represents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein R2 to R7 independently represent an alkyl group or the like; M1 and M2 independently represent an arylene group, an alkylene group or the like; and Y1 to Y6 independently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film.
    Type: Application
    Filed: October 14, 2014
    Publication date: September 15, 2016
    Inventors: Naofumi YOSHIDA, Yuji TASHIRO
  • Publication number: 20160194451
    Abstract: [Problem] An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. [Means for Solution] Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.
    Type: Application
    Filed: December 19, 2013
    Publication date: July 7, 2016
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Naofumi YOSHIDA, Yuji TASHIRO, Daishi YOKOYAMA, Toshiaki NONAKA
  • Publication number: 20150329679
    Abstract: [Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed. [Means for Solution] Provided are: a method of producing a composite of metal oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal, or a silane monomer with metal oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in an aqueous solvent in the presence of a phase transfer catalyst; and a composite produced by the method.
    Type: Application
    Filed: December 19, 2013
    Publication date: November 19, 2015
    Inventors: Naofumi YOSHIDA, Yuji TASHIRO, Daishi YOKOYAMA, Yasuaki TANAKA, Takashi FUKE, Megumi TAKAHASHI, Toshiaki NONAKA
  • Publication number: 20150331319
    Abstract: [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.
    Type: Application
    Filed: April 5, 2013
    Publication date: November 19, 2015
    Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 9164386
    Abstract: [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having a pKa of 2.0 to 15.7, a photo-polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, developed with an inorganic developer, and heated, so that a cured film can be obtained.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: October 20, 2015
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
  • Publication number: 20150291749
    Abstract: A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 ?/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
    Type: Application
    Filed: November 14, 2013
    Publication date: October 15, 2015
    Inventors: Toshiaki Nonaka, Daishi Tokoyama, Takashi Fuke, Yuji Tashiro
  • Patent number: 8993214
    Abstract: A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 ?/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 ?/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 ?/sec relative to a 2.38 weight % TMAH aqueous solution.
    Type: Grant
    Filed: May 15, 2012
    Date of Patent: March 31, 2015
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Daishi Yokoyama, Takashi Fuke, Yuji Tashiro, Takashi Sekito, Toshiaki Nonaka
  • Publication number: 20150064613
    Abstract: [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having a pKa of 2.0 to 15.7, a photo-polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, developed with an inorganic developer, and heated, so that a cured film can be obtained.
    Type: Application
    Filed: April 5, 2013
    Publication date: March 5, 2015
    Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka