Patents by Inventor Yujia ZHUANG

Yujia ZHUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface oxidation method for wafer
    Patent number: 11094534
    Abstract: A surface oxidation method for a wafer, the method comprises: raising a temperature on the wafer in an oxidation atmosphere, the temperature is raised from a start temperature to a target temperature at a temperature raising rate greater than 5° C./min, the temperature is raised in a vertical furnace tube of an annealing furnace, the vertical furnace tube includes a gas intake conduit arranged on a side wall, the gas intake conduit includes a gas inlet arranged to be proximate to a bottom of the vertical furnace tube and a gas outlet arranged to be proximate to a top of the furnace tube, the wafer overlying the vertical furnace tube; and isothermally oxidizing the wafer at the target temperature in the oxidation atmosphere.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: August 17, 2021
    Assignee: Shanghai Simgui Technology Co., Ltd.
    Inventors: Huijun Xu, Yujia Zhuang, Hao Wang, Xiangyu Li
  • SURFACE OXIDATION METHOD FOR WAFER
    Publication number: 20200343086
    Abstract: A surface oxidation method for a wafer, the method comprises: raising a temperature on the wafer in an oxidation atmosphere, the temperature is raised from a start temperature to a target temperature at a temperature raising rate greater than 5° C./min, the temperature is raised in a vertical furnace tube of an annealing furnace, the vertical furnace tube includes a gas intake conduit arranged on a side wall, the gas intake conduit includes a gas inlet arranged to be proximate to a bottom of the vertical furnace tube and a gas outlet arranged to be proximate to a top of the furnace tube, the wafer overlying the vertical furnace tube; and isothermally oxidizing the wafer at the target temperature in the oxidation atmosphere.
    Type: Application
    Filed: October 31, 2019
    Publication date: October 29, 2020
    Applicant: Shanghai Simgui Technology Co., Ltd.
    Inventors: Huijun XU, Yujia ZHUANG, Hao WANG, Xiangyu LI