Patents by Inventor Yuki Bessho
Yuki Bessho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180319798Abstract: [Problem] Provided is a novel 1,3,4,8-tetrahydro-2H-pyrido[1,2-a]pyrazine derivative or a pharmaceutically acceptable salt thereof, or a solvate thereof, which is useful as an anti-HIV agent. [Solving Means] The present invention provides a compound represented by the following formula [I] wherein each symbol is as defined in the specification, or a pharmaceutically acceptable salt thereof, or a solvate thereof.Type: ApplicationFiled: July 25, 2018Publication date: November 8, 2018Applicant: Japan Tobacco Inc.Inventors: Susumu Miyazaki, Yuki Bessho, Kaoru Adachi, Seiji Kawashita, Hirotaka Isoshima, Kengo Oshita, Shunichi Fukuda
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Patent number: 10065950Abstract: [Problem] Provided is a novel 1,3,4,8-tetrahydro-2H-pyrido[1,2-a]pyrazine derivative or a pharmaceutically acceptable salt thereof, or a solvate thereof, which is useful as an anti-HIV agent. [Solving Means] The present invention provides a compound represented by the following formula [I] wherein each symbol is as defined in the specification, or a pharmaceutically acceptable salt thereof, or a solvate thereof.Type: GrantFiled: February 25, 2011Date of Patent: September 4, 2018Assignee: Japan Tobacco Inc.Inventors: Susumu Miyazaki, Yuki Bessho, Kaoru Adachi, Seiji Kawashita, Hirotaka Isoshima, Kengo Oshita, Shunichi Fukuda
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Publication number: 20120108564Abstract: [Problem] Provided is a novel 1,3,4,8-tetrahydro-2H-pyrido[1,2-a]pyrazine derivative or a pharmaceutically acceptable salt thereof, or a solvate thereof, which is useful as an anti-HIV agent. [Solving Means] The present invention provides a compound represented by the following formula [I] wherein each symbol is as defined in the specification, or a pharmaceutically acceptable salt thereof, or a solvate thereof.Type: ApplicationFiled: February 25, 2011Publication date: May 3, 2012Inventors: Susumu MIYAZAKI, Yuki BESSHO, Kaoru ADACHI, Seiji KAWASHITA, Hirotaka ISOSHIMA, Kengo OSHITA, Shunichi FUKUDA
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Patent number: 8038929Abstract: A method of manufacturing a sintered body is provided. A molding powder, a gel-forming material powder and a solvent are mixed at a temperature not higher than a dissolving point of the gel-forming material. A treatment of pulverizing agglomerates containing the molding powder, gel-forming material powder and solvent absorbed in the gel-forming material powder is carried out. The mixture is then heated to a temperature not lower than the dissolving point thereby forming a sol. The sol is then cooled to a temperature not higher than the gel point, thereby forming a molding material. The molding material is used for producing a sintering body.Type: GrantFiled: November 28, 2007Date of Patent: October 18, 2011Assignee: NGK Insulators, Ltd.Inventors: Yuki Bessho, Hiroyuki Shindo
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Patent number: 7824781Abstract: A metal phosphate composite having a composition represented by the formula M1xM21-x(HwPyOz) (wherein M1 represents at least one element selected from the group consisting of tin, titanium, zirconium, silicon, and germanium, M2 represents an element having a valence of 3, and x, w, y, and z satisfy the following relationship, 0.5?x<1, 0?w, 2<y<10, and 0<z<35).Type: GrantFiled: July 11, 2008Date of Patent: November 2, 2010Assignee: NGK Insulators, Ltd.Inventors: Hiroki Fujita, Yosuke Sato, Yuki Bessho
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Patent number: 7518131Abstract: An electron beam irradiating apparatus includes a chamber being kept under vacuum, and housing a planar electron emitting element and a positioning unit and an object to be irradiated is directly irradiated with an electron beam emitted from the element. The planar electron emitting element includes: an emitter portion composed of a dielectric material; and a first electrode and a second electrode applied with a driving voltage for emitting electrons, and the first electrode is formed on a first surface of the emitter portion and has a plurality of through-holes where the emitter portion is exposed, a surface of the first electrode facing to the emitter portion around the through-holes is separated from the emitter portion, and the electron beam is emitted from the first surface of the emitter portion through the through-holes.Type: GrantFiled: March 21, 2006Date of Patent: April 14, 2009Assignee: NGK Insulators, Ltd.Inventors: Tsutomu Nanataki, Iwao Ohwada, Yuki Bessho, Takayoshi Akao
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Patent number: 7504070Abstract: A micro reactor comprising: a first substrate comprising a predetermined number each of micro channels, reactors connected to micro channels at respective connection points, injection ports for feeding/receiving a sample solution, and discharge ports for recovering a sample solution after reaction from respective reactors; and a second substrate in which at least one micro pump is disposed so as to be faced to the injection ports and the discharge ports, the at least one micro pump being provided with a substrate including a cavity made of a ceramic in the inner surface thereof; a piezoelectric/electrostrictive operation section formed on the outer surface of the substrate, and at least two connection ports for feeding/receiving a sample solution in the cavity; and the micro reactor being formed integrally by laminating the first substrate and the second substrate.Type: GrantFiled: July 6, 2004Date of Patent: March 17, 2009Assignee: NGK Insulators, Ltd.Inventors: Yuki Bessho, Yukihisa Takeuchi
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Publication number: 20090022972Abstract: A metal phosphate composite having a composition represented by the formula M1xM21-x(HwPyOz) (wherein M1 represents at least one element selected from the group consisting of tin, titanium, zirconium, silicon, and germanium, M2 represents an element having a valence of 3, and x, w, y, and z satisfy the following relationship, 0.5?x<1, 0?w, 2<y<10, and 0<z<35).Type: ApplicationFiled: July 11, 2008Publication date: January 22, 2009Applicant: NGK Insulators, Ltd.Inventors: Hiroki FUJITA, Yosuke SATO, Yuki BESSHO
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Patent number: 7473391Abstract: A method of manufacturing a sintered body is provided. A molding powder, a gel-forming material powder and a solvent are mixed at a temperature not higher than a dissolving point of the gel-forming material. A treatment of pulverizing agglomerates containing the molding powder, gel-forming material powder and solvent absorbed in the gel-forming material powder is carried out. The mixture is then heated to a temperature not lower than the dissolving point thereby forming a sol. The sol is then cooled to a temperature not higher than the gel point, thereby forming a molding material. The molding material is used for producing a sintering body.Type: GrantFiled: March 12, 2002Date of Patent: January 6, 2009Assignee: NGK Insulators, Ltd.Inventors: Yuki Bessho, Hiroyuki Shindo
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Publication number: 20080117713Abstract: A method of manufacturing a sintered body is provided. A molding powder, a gel-forming material powder and a solvent are mixed at a temperature not higher than a dissolving point of the gel-forming material. A treatment of pulverizing agglomerates containing the molding powder, gel-forming material powder and solvent absorbed in the gel-forming material powder is carried out. The mixture is then heated to a temperature not lower than the dissolving point thereby forming a sol. The sol is then cooled to a temperature not higher than the gel point, thereby forming a molding material. The molding material is used for producing a sintering body.Type: ApplicationFiled: November 28, 2007Publication date: May 22, 2008Applicant: NKG Insulators, Ltd.Inventors: Yuki Bessho, Hiroyuki Shindo
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Patent number: 7267840Abstract: A method is provided for manufacturing a piezoelectric/electrostrictive film device including a ceramic substrate and a piezoelectric/electrostrictive operation portion including a lower electrode, a piezoelectric/electrostrictive layer, and upper electrode stacked on the substrate. The piezoelectric/electrostrictive layer is formed to extend beyond at least one of electrodes to form projected portions at its ends.Type: GrantFiled: July 30, 2003Date of Patent: September 11, 2007Assignee: NGK Insulators, Ltd.Inventors: Takao Ohnishi, Masahiro Murasato, Yuki Bessho, Nobuo Takahashi
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Publication number: 20070202023Abstract: A reactor RT1 comprises a flow passage forming member (10) having been formed by laminating a plurality of ceramic plates (11 to 13) and firing the resultant laminate and, provided inside the flow passage (R1) of the member, a porous body (20) having a three dimensional net-like structure and carrying a catalytic material. In the reactor, when a fluid before reaction flows through the flow passage (R1), the fluid inevitably passes through the inside of the porous body (20). Accordingly, the flow is contacted frequently with the catalytic material, and thus a reaction by the catalytic material with good efficiency is occurred, which allows the use of the reactor (RT1) having a smaller size.Type: ApplicationFiled: July 26, 2005Publication date: August 30, 2007Applicant: NGK INSULATORS, LTD.Inventors: Yuki Bessho, Fumitake Takahashi
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Publication number: 20070040130Abstract: An electron beam irradiating apparatus includes a chamber being kept under vacuum, and housing a planar electron emitting element and a positioning unit and an object to be irradiated is directly irradiated with an electron beam emitted from the element. The planar electron emitting element includes: an emitter portion composed of a dielectric material; and a first electrode and a second electrode applied with a driving voltage for emitting electrons, and the first electrode is formed on a first surface of the emitter portion and has a plurality of through-holes where the emitter portion is exposed, a surface of the first electrode facing to the emitter portion around the through-holes is separated from the emitter portion, and the electron beam is emitted from the first surface of the emitter portion through the through-holes.Type: ApplicationFiled: March 21, 2006Publication date: February 22, 2007Applicant: NGK Insulators, Ltd.Inventors: Tsutomu Nanataki, Iwao Ohwada, Yuki Bessho, Takayoshi Akao
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Patent number: 7067961Abstract: There is disclosed a piezoelectric/electrostrictive film device which has a flexural displacement and durability equal to or more than those of a related-art piezoelectric/electrostrictive film device and which has a remarkably high resonance frequency and which is superior in high-speed response. The piezoelectric/electrostrictive film device comprises: a substrate formed of ceramic; and a piezoelectric/electrostrictive operation portion including a lower electrode, piezoelectric/electrostrictive layer, and upper electrode which are successively stacked on the substrate and including a projecting end of the piezoelectric/electrostrictive layer with which an upper surface of the lower electrode and a lower surface of the upper electrode are coated, and a projecting portion of the piezoelectric/electrostrictive layer is a coupling member constituted of a hybrid material in which inorganic particles are scattered in a matrix of a polymer compound, and is coupled to the substrate.Type: GrantFiled: July 8, 2003Date of Patent: June 27, 2006Assignee: NGK Insulators, Ltd.Inventors: Nobuo Takahashi, Yuki Bessho, Nobuyuki Kobayashi, Masahiro Murasato
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Patent number: 7019438Abstract: A piezoelectric/electrostrictive film device is provided, including a ceramic substrate, and a piezoelectric/electrostrictive actuator including a lower electrode, a piezoelectric/electrostrictive layer and an upper electrode that are sequentially layered on the substrate. The piezoelectric/electrostrictive layer covers an upper surface of the lower electrode and a lower surface of the upper electrode and protrudes over edges thereof. The protruded portions of the piezoelectric/electrostrictive layer are coupled to the substrate via a coupling member.Type: GrantFiled: June 17, 2003Date of Patent: March 28, 2006Assignee: NGK Insulators, Ltd.Inventors: Nobuo Takahashi, Yuki Bessho
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Publication number: 20050008545Abstract: A micro reactor comprising: a first substrate comprising a predetermined number each of micro channels, reactors connected to micro channels at respective connection points, injection ports for feeding/receiving a sample solution, and discharge ports for recovering a sample solution after reaction from respective reactors; and a second substrate in which at least one micro pump is disposed so as to be faced to the injection ports and the discharge ports, the at least one micro pump being provided with a substrate including a cavity made of a ceramic in the inner surface thereof; a piezoelectric/electrostrictive operation section formed on the outer surface of the substrate, and at least two connection ports for feeding/receiving a sample solution in the cavity; and the micro reactor being formed integrally by laminating the first substrate and the second substrate.Type: ApplicationFiled: July 6, 2004Publication date: January 13, 2005Applicant: NGK Insulators, Ltd.Inventors: Yuki Bessho, Yukihisa Takeuchi
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Patent number: 6761028Abstract: A drive device includes ceramic pumps which alternately pressurize and depressurize fluid within a fluid chamber on opposite sides of a movable body, to thereby move the movable body within the flow chamber. The flow chamber is connected via micro flow passages to an internal-pressure buffering chamber, which accommodates a compressible gas. When the pressure of the fluid is increased and decreased at high speed by the ceramic pumps, the micro flow passages exhibit a high passage resistance, so that the pressure within the channel does not escape to the internal-pressure buffering chamber, and the movable body moves freely. When the pressure of the fluid increases slowly due to the expansion of the fluid, the micro flow passages exhibit a low passage resistance, so that the fluid is led to the internal-pressure buffering chamber, and the pressure increase of the fluid is suppressed.Type: GrantFiled: October 11, 2002Date of Patent: July 13, 2004Assignee: NGK Insulators, Ltd.Inventors: Yukihisa Takeuchi, Nobuo Takahashi, Yuki Bessho
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Publication number: 20040076531Abstract: A circuit changeover switch 60, which includes a drive device 10, includes ceramic pumps 18a and 18b, which alternately pressurize and depressurize operation fluid 100 within a fluid chamber 13a on opposite sides of an electrically conductive movable body 110, to thereby move the movable body 110 within the flow chamber 13a, whereby one of changeover electrodes 62a and 62b is electrically connected to a common electrode 61. When the pressure of the operation fluid is increased and decreased at high speed by the ceramic pumps, micro channels 16a and 16b exhibit a high passage resistance, so that the pressure within the channel does not escape to an internal-pressure buffering chamber 15a, and the movable body moves without fail.Type: ApplicationFiled: November 18, 2002Publication date: April 22, 2004Applicant: NGK Insulators, Ltd.Inventors: Yukihisa Takeuchi, Nobuo Takahashi, Iwao Ohwada, Yuki Bessho
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Publication number: 20040037708Abstract: A working-fluid moving device is a laminate of ceramic sheets, which constitute a channel. One of the ceramic sheets is formed to serve as a diaphragm. A piezoelectric/electrostrictive film is formed on the diaphragm. The channel houses first and second working fluids. The first working fluid is inferior to the second working fluid in wettability to the inner wall surface of the channel. When voltage is applied to the piezoelectric/electrostrictive film, the diaphragm is deformed, and the cross-sectional area of the channel at the central portion is reduced. The first working fluid which is present in the form of a single fluid mass at the central portion of the channel receives a repulsive force from the wall surface of the channel due to inferior wettability. As a result, the first working fluid is split into two fluid masses, which then move in the channel.Type: ApplicationFiled: July 25, 2003Publication date: February 26, 2004Applicant: NGK Insulators, Ltd.Inventors: Masahiro Murasato, Ritsu Tanaka, Yuki Bessho
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Publication number: 20040032186Abstract: There is provided a piezoelectric/electrostrictive film type device which has flexural displacement and durability equal to or more than those of a conventional piezoelectric/electrostrictive film type device and has a relatively high resonance frequency and is superior in high-speed response. The piezoelectric/electrostrictive film type device includes a substrate formed of a ceramic and a piezoelectric/electrostrictive operation portion 78 in which at least one piezoelectric/electrostrictive layer and at least one pair of electrodes electrically connected to the piezoelectric/electrostrictive layer are stacked on the substrate. In the device, an outer surface of the piezoelectric/electrostrictive layer is subjected to surface modification to obtain a highly water repellent surface for inhibiting infiltration of moisture into micro-pores opened in the outer surface or into a gap between the substrate and the piezoelectric/electrostrictive layer.Type: ApplicationFiled: July 17, 2003Publication date: February 19, 2004Applicant: NGK Insulators, Ltd,Inventors: Masahiro Murasato, Yuki Bessho