Patents by Inventor Yuki Kera

Yuki Kera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sulfonium compound, chemically amplified resist composition, and patterning process
    Patent number: 11687000
    Abstract: A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in lithography properties.
    Type: Grant
    Filed: April 3, 2020
    Date of Patent: June 27, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama, Yuki Kera
  • Salt compound, chemically amplified resist composition, and patterning process
    Patent number: 11435666
    Abstract: A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: September 6, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Emiko Ono, Masayoshi Sagehashi, Masahiro Fukushima, Yuki Kera
  • SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20200319550
    Abstract: A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in lithography properties.
    Type: Application
    Filed: April 3, 2020
    Publication date: October 8, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama, Yuki Kera
  • NOVEL SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20200159115
    Abstract: A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
    Type: Application
    Filed: October 31, 2019
    Publication date: May 21, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Emiko Ono, Masayoshi Sagehashi, Masahiro Fukushima, Yuki Kera
  • ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
    Publication number: 20200102271
    Abstract: A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern which is improved in LWR and CDU. In formula (1), R1, R2 and R3 each are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom exclusive of fluorine, and Z+ is a sulfonium, iodonium or ammonium cation.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuya Honda, Yuki Suka, Yuki Kera