Abstract: A vacuum processing apparatus includes: a stage on which a substrate is placed; and a shutter configured to be able to move between a shielding position at which the stage is covered and a retracted position that is retracted from the shielding position, wherein the shutter arranged at the shielding position forms a processing space between the shutter and the stage, and includes: a gas supplier configured to supply a gas into the processing space; and a gas exhauster provided closer to a center side of the processing space than the gas supplier and configured to exhaust the gas from the processing space.

Abstract: A state determination apparatus includes: an acquisition unit acquiring first questionnaire information indicating an answer to a first questionnaire in which the answer does not indicate an individuality of an answerer, first physiological information indicating a physiological state of the answerer, second questionnaire information indicating an answer to a second questionnaire in which the answer indicates an individuality of the answerer, and second physiological information indicating a physiological state of the answerer; a membership cluster estimation unit estimating to which cluster a determination target person belongs on the basis of the second physiological information or the second questionnaire information provided by the target person, and a membership condition; and a state determination unit determining a state of the target person on the basis of state relationship information indicating a relationship between the first questionnaire information and the first physiological information in a c

Abstract: A microwave heating apparatus includes a phase control unit configured to change a phase of a standing wave of microwave introduced into the process chamber by the microwave introduction unit. The phase control unit includes a recessed portion with respect to an inner surface of the bottom wall. The phase control unit is formed of a bottom portion and a fixing plate installed at a lower surface of the bottom portion from the outer side of the process chamber. The phase of the standing wave in the process chamber is changed by the incidence and reflection of the microwave in the recessed portion of the phase control unit surrounded by metallic wall.