Patents by Inventor Yuki Togashi

Yuki Togashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210140943
    Abstract: It is intended to reveal a polynucleotide serving as a novel causative gene of a cancer and, on the basis of this finding, to provide a method for detecting the polynucleotide or a polypeptide encoded thereby, a kit and a primer set for the detection, a method for screening for a substance that inhibits the polypeptide, and a pharmaceutical composition for the treatment of a cancer, containing the inhibiting substance. The detection method of the present invention detects a BRAF fusion protein or a fusion gene encoding the fusion protein, or a PXN or GMDS fusion protein or a fusion gene encoding the fusion protein in a digestive organ-derived sample obtained from a subject.
    Type: Application
    Filed: January 8, 2021
    Publication date: May 13, 2021
    Inventors: Kengo Takeuchi, Seiji Sakata, Yuki Togashi, Naoya Fujita, Ryohei Katayama
  • Patent number: 10921311
    Abstract: It is intended to reveal a polynucleotide serving as a novel causative gene of a cancer and, on the basis of this finding, to provide a method for detecting the polynucleotide or a polypeptide encoded thereby, a kit and a primer set for the detection, a method for screening for a substance that inhibits the polypeptide, and a pharmaceutical composition for the treatment of a cancer, containing the inhibiting substance. The detection method of the present invention detects a BRAF fusion protein or a fusion gene encoding the fusion protein, or a PXN or GMDS fusion protein or a fusion gene encoding the fusion protein in a digestive organ-derived sample obtained from a subject.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: February 16, 2021
    Assignee: JAPANESE FOUNDATION FOR CANCER RESEARCH
    Inventors: Kengo Takeuchi, Seiji Sakata, Yuki Togashi, Naoya Fujita, Ryohei Katayama
  • Patent number: 10705087
    Abstract: A polynucleotide, which is a novel causative gene for cancer, is elucidated, and, based on this finding, provided are a method for detecting the polynucleotide, or a polypeptide encoded by the polynucleotide; a kit and a primer set for the detection; a method for screening an inhibitor of the polypeptide; and a pharmaceutical composition for treating a cancer containing the inhibitor. In the detection method of the present invention, an NTRK3 fusion protein, or a fusion gene encoding the fusion protein, or an ETV6 fusion protein, or a fusion gene encoding the fusion protein, in a sample derived from the digestive system obtained from a subject, is detected.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: July 7, 2020
    Assignee: JAPANESE FOUNDATION FOR CANCER RESEARCH
    Inventors: Kengo Takeuchi, Yuki Togashi, Seiji Sakata, Satoko Baba
  • Publication number: 20190033293
    Abstract: It is intended to reveal a polynucleotide serving as a novel causative gene of a cancer and, on the basis of this finding, to provide a method for detecting the polynucleotide or a polypeptide encoded thereby, a kit and a primer set for the detection, a method for screening for a substance that inhibits the polypeptide, and a pharmaceutical composition for the treatment of a cancer, containing the inhibiting substance. The detection method of the present invention detects a BRAF fusion protein or a fusion gene encoding the fusion protein, or a PXN or GMDS fusion protein or a fusion gene encoding the fusion protein in a digestive organ-derived sample obtained from a subject.
    Type: Application
    Filed: January 13, 2017
    Publication date: January 31, 2019
    Inventors: Kengo Takeuchi, Seiji Sakata, Yuki Togashi, Naoya Fujita, Ryohei Katayama
  • Patent number: 9496267
    Abstract: In one device, a first space partitioned by first and second line patters is filled with a multilayer film that is composed of a first silicon film having a high impurity concentration relative to a standard plug impurity concentration and a second silicon film having a low impurity concentration relative to the standard plug impurity concentration, and is divided by forming a groove using a mask film on the side wall of the second line pattern. As a result, expansion of a seam, which is formed only on the second silicon film having a low impurity concentration, is suppressed. After that, an isolation insulating film is embedded in the groove and impurity diffusion is carried out by a heat treatment, so that divided plugs as a whole are made to have the standard plug impurity concentration.
    Type: Grant
    Filed: May 9, 2014
    Date of Patent: November 15, 2016
    Assignee: LONGITUDE SEMICONDUCTOR S.A.R.L.
    Inventors: Kazuaki Tonari, Yuki Togashi
  • Publication number: 20160305943
    Abstract: A polynucleotide, which is a novel causative gene for cancer, is elucidated, and, based on this finding, provided are a method for detecting the polynucleotide, or a polypeptide encoded by the polynucleotide; a kit and a primer set for the detection; a method for screening an inhibitor of the polypeptide; and a pharmaceutical composition for treating a cancer containing the inhibitor. In the detection method of the present invention, an NTRK3 fusion protein, or a fusion gene encoding the fusion protein, or an ETV6 fusion protein, or a fusion gene encoding the fusion protein, in a sample derived from the digestive system obtained from a subject, is detected.
    Type: Application
    Filed: July 25, 2014
    Publication date: October 20, 2016
    Applicant: JAPANESE FOUNDATION FOR CACER RESEARCH
    Inventors: Kengo TAKEUCHI, Yuki TOGASHI, Seiji SAKATA, Satoko BABA
  • Publication number: 20160118388
    Abstract: A first space partitioned by first and second line patters (52, 53) is filled with a multilayer film that is composed of a first silicon film (55) having a high impurity concentration (a first concentration) relative to a standard plug impurity concentration (a third concentration) and a second silicon film (57) having a low impurity concentration (a second concentration) relative to the standard plug impurity concentration, and is divided by forming a groove (59) using a mask film (58) on the side wall of the second line pattern (53). As a result, expansion of a seam, which is formed only on the second silicon film (57) having a low impurity concentration, is suppressed. After that, an isolation insulating film is embedded in the groove and impurity diffusion is carried out by a heat treatment, so that divided plugs (60) as a whole are made to have the third concentration.
    Type: Application
    Filed: May 9, 2014
    Publication date: April 28, 2016
    Inventors: Kazuaki TONARI, Yuki TOGASHI
  • Patent number: 8847400
    Abstract: A semiconductor device comprises a material layer including a first surface and a trench with an opening in the first surface. The trench is formed in the material layer. The trench comprises a tapered portion and a vertical portion. The tapered portion is in contact with the opening and comprises a scalloping-forming trench. The vertical portion has a substantially vertical sidewall. A width of the scalloping-forming trench is larger than a width of the vertical portion.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: September 30, 2014
    Assignee: PS4 Luxco S.A.R.L.
    Inventors: Osamu Fujita, Yuki Togashi
  • Publication number: 20120199984
    Abstract: A semiconductor device comprises a material layer including a first surface and a trench with an opening in the first surface. The trench is formed in the material layer. The trench comprises a tapered portion and a vertical portion. The tapered portion is in contact with the opening and comprises a scalloping-forming trench. The vertical portion has a substantially vertical sidewall. A width of the scalloping-forming trench is larger than a width of the vertical portion.
    Type: Application
    Filed: February 29, 2012
    Publication date: August 9, 2012
    Applicant: Elpida Memory, Inc.
    Inventors: Osamu FUJITA, Yuki TOGASHI
  • Publication number: 20110189828
    Abstract: A silicon layer is formed on a silicon substrate by an epitaxial growth, and, then a surface of the silicon layer is oxidized. The surface of the silicon layer is cleaned, to remove foreign material generated on the surface of the silicon layer during the epitaxial growth.
    Type: Application
    Filed: December 13, 2010
    Publication date: August 4, 2011
    Applicant: Elpida Memory, Inc.
    Inventors: Nobuyuki Sako, Eiji Hasunuma, Yuki Togashi
  • Patent number: 7888737
    Abstract: A semiconductor device includes: a monocrystalline substrate; an inter-layer film formed on the monocrystalline substrate; a contact hole penetrating the inter-layer film and partially exposing an upper surface of the monocrystalline substrate; a sidewall formed on an inner surface of the contact hole; a plurality of first monocrystalline layers which include few defects, fill the contact hole, and cover the inter-layer film; and a plurality of second monocrystalline layers which include many defects and cover the sidewall and an upper surface of the inter-layer film so as to be sandwiched between the first monocrystalline layers and the inter-layer film.
    Type: Grant
    Filed: January 27, 2009
    Date of Patent: February 15, 2011
    Assignee: Elpida Memory, Inc.
    Inventors: Hiroyuki Fujimoto, Yuki Togashi
  • Publication number: 20090212365
    Abstract: A semiconductor device includes: a monocrystalline substrate; an inter-layer film formed on the monocrystalline substrate; a contact hole penetrating the inter-layer film and partially exposing an upper surface of the monocrystalline substrate; a sidewall formed on an inner surface of the contact hole; a plurality of first monocrystalline layers which include few defects, fill the contact hole, and cover the inter-layer film; and a plurality of second monocrystalline layers which include many defects and cover the sidewall and an upper surface of the inter-layer film so as to be sandwiched between the first monocrystalline layers and the inter-layer film.
    Type: Application
    Filed: January 27, 2009
    Publication date: August 27, 2009
    Applicant: ELPIDA MEMORY, INC.
    Inventors: Hiroyuki FUJIMOTO, Yuki TOGASHI
  • Patent number: 7500386
    Abstract: A sample injection apparatus and a liquid chromatography apparatus including the sample injection apparatus are provided. The sample injection apparatus includes a sampling vessel into which a sample is supplied, a sampling needle for aspirating and ejecting the sample, a cleaning part into which a cleaning liquid for cleaning at least the sampling needle is supplied, a sample injection part for injecting the sample ejected from the sampling needle into a moving liquid, and a needle transfer part for transferring the sampling needle among the sampling vessel, the cleaning part and the sample injection part, wherein the cleaning part includes an ultrasonic vibrator for generating an ultrasonic wave in the cleaning liquid.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: March 10, 2009
    Assignee: Shiseido Company, Ltd.
    Inventors: Yuki Togashi, Osamu Shirota, Aya Ohkubo
  • Publication number: 20080141762
    Abstract: A sample injection apparatus and a liquid chromatography apparatus including the sample injection apparatus are provided. The sample injection apparatus includes a sampling vessel into which a sample is supplied, a sampling needle for aspirating and ejecting the sample, a cleaning part into which a cleaning liquid for cleaning at least the sampling needle is supplied, a sample injection part for injecting the sample ejected from the sampling needle into a moving liquid, and a needle transfer part for transferring the sampling needle among the sampling vessel, the cleaning part and the sample injection part, wherein the cleaning part includes an ultrasonic vibrator for generating an ultrasonic wave in the cleaning liquid.
    Type: Application
    Filed: February 4, 2008
    Publication date: June 19, 2008
    Applicant: Shiseido Company, Ltd.
    Inventors: Yuki Togashi, Osamu Shirota, Aya Ohkubo
  • Patent number: 7337653
    Abstract: A sample injection apparatus and sample injection method capable of sufficiently reducing carry-over, having simple cleaning means for a short cleaning time period, a small influence of vibration of the cleaning means, and a small error in the amount of injected sample and preventing the durability of a sampling needle from being lowered, and a liquid chromatography apparatus having the sample injection apparatus are provided.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: March 4, 2008
    Assignee: Shiseido Company, Ltd.
    Inventors: Yuki Togashi, Osamu Shirota, Aya Ohkubo
  • Patent number: 7298002
    Abstract: A semiconductor device includes cylindrical capacitors each including corresponding cylindrical electrodes. Each cylindrical electrode includes hemispherical silicon grains. The hemispherical silicon grains protruding from an upper region of the cylindrical electrode have a large size, and the hemispherical silicon grains protruding from a lower region of the cylindrical electrode have a small size or the lower region of the cylindrical electrode has no hemispherical silicon grains.
    Type: Grant
    Filed: June 24, 2005
    Date of Patent: November 20, 2007
    Assignee: Elpida Memory Inc.
    Inventors: Hiroyuki Kitamura, Yuki Togashi, Hiroyasu Kitajima, Noriaki Ikeda, Yoshitaka Nakamura, Eiichiro Kakehashi
  • Publication number: 20070210365
    Abstract: A semiconductor device includes a cylindrical capacitor. A size of hemispherical silicon grains (HSGs) formed in a straight portion of the cylindrical capacitor is smaller than a size of HSGs formed in a bowing portion of the cylindrical capacitor.
    Type: Application
    Filed: February 27, 2007
    Publication date: September 13, 2007
    Applicant: ELPIDA MEMORY, INC.
    Inventors: Yuki TOGASHI, Hiroyuki KITAMURA
  • Publication number: 20060213257
    Abstract: A sample injection apparatus and sample injection method capable of sufficiently reducing carry-over, having simple cleaning means for a short cleaning time period, a small influence of vibration of the cleaning means, and a small error in the amount of injected sample and preventing the durability of a sampling needle from being lowered, and a liquid chromatography apparatus having the sample injection apparatus are provided.
    Type: Application
    Filed: May 14, 2004
    Publication date: September 28, 2006
    Applicant: Shiseido Company, Ltd.
    Inventors: Yuki Togashi, Osamu Shirota, Aya Ohkubo
  • Publication number: 20060022251
    Abstract: A semiconductor device includes cylindrical capacitors each including corresponding cylindrical electrodes. Each cylindrical electrode includes hemispherical silicon grains. The hemispherical silicon grains protruding from an upper region of the cylindrical electrode have a large size, and the hemispherical silicon grains protruding from a lower region of the cylindrical electrode have a small size or the lower region of the cylindrical electrode has no hemispherical silicon grains.
    Type: Application
    Filed: June 24, 2005
    Publication date: February 2, 2006
    Inventors: Hiroyuki Kitamura, Yuki Togashi, Hiroyasu Kitajima, Noriaki Ikeda, Yoshitaka Nakamura, Eiichiro Kakehashi